Light emitting element, manufacturing method thereof, and display device including the light emitting element

1. A manufacturing method of a light emitting element, the method comprising:

preparing a lower substrate comprising a substrate and a buffer material layer on the substrate;

forming a separating layer on the lower substrate, the separating layer comprising at least one graphene layer;

forming an element deposition structure by depositing a first conductivity type semiconductor layer, an active material layer, and a second conductivity type semiconductor layer on the separating layer;

forming an element rod by etching the element deposition structure and the separating layer in a vertical direction; and

separating the element rod from the lower substrate to form a light emitting element,

wherein in the forming of the element rod, the separating layer is etched and patterned, and

the separating the element rod from the lower substrate comprises:

dipping the lower substrate and the element rod formed on the separating layer into a separation solution, and

separating the element rod from the lower substrate by applying a vibration to the separation solution,

wherein at least a portion of the separating layer remains on the lower substrate.

2. The manufacturing method of claim 1 , wherein an interface attractive force between the separating layer and the lower substrate at a first interface between the separating layer and the lower substrate is greater than an interface attractive force between the separating layer and the element rod at a second interface between the separating layer and the element rod.

3. The manufacturing method of claim 2 , wherein in the forming of the light emitting element, the separating layer at the second interface is peeled off, but the separating layer at the first interface is not peeled off, and the patterned separating layer remains on the lower substrate.

4. The manufacturing method of claim 3 , wherein a parting surface of the light emitting element, where the element rod is peeled off at the second interface, is substantially flat and parallel to a top surface of the second conductivity type semiconductor layer.

5. The manufacturing method of claim 4 , wherein, in the light emitting element, the parting surface has a mean surface roughness in a range of about 8 nm to about 12 nm.

6. The manufacturing method of claim 5 , wherein the forming of the element rod further comprises forming an insulating layer to surround a side surface of the element rod, and

the light emitting element further comprises the insulating layer to surround side surfaces of the first conductivity type semiconductor layer, the active material layer, and the second conductivity type semiconductor layer.

7. The manufacturing method of claim 1 , wherein the separating layer comprises a first graphene layer; and a second graphene layer on the first graphene layer,

the first graphene layer forms a third interface with the buffer material layer,

the second graphene layer forms a fifth interface with the element rod, and

the first graphene layer and the second graphene layer form a fourth interface.

8. The manufacturing method of claim 7 , wherein in the forming of the light emitting element,

the first graphene layer at the third interface is not peeled off,

at least a portion of the second graphene layer at each of the fourth interface and the fifth interface is peeled off,

the first graphene layer remains on the lower substrate, and

the second graphene layer remains on the first graphene layer at the fourth interface, or on the element rod at the fifth interface.

9. The manufacturing method of claim 8 , wherein the separating layer comprises a first sub-separating layer on the lower substrate; and

a second sub-separating layer between the substrate and the buffer material layer.

10. The manufacturing method of claim 1 , wherein the element deposition structure further comprises an electrode material layer on the second conductivity type semiconductor layer.

11. The manufacturing method of claim 10 , wherein the forming of the element rod comprises forming an etching mask layer on the element deposition structure, and an etching pattern layer comprising one or more nanopatterns separated from each other on the etching mask layer;

forming a hole by vertically etching an area between adjacent separated one or more nanopatterns; and

removing the etching mask layer and the etching pattern layer.

12. The manufacturing method of claim 11 , wherein the element deposition structure and the separating layer comprise materials different in etch selectivity, and

the forming of the hole comprises vertically etching the element deposition structure to expose at least a portion of the separating layer overlapping the area between adjacent separated one or more nanopatterns; and

etching and patterning the exposed portion of the separating layer.

13. The manufacturing method of claim 12 , wherein in the vertically etching of the element deposition structure, an etchant comprises chlorine gas (Cl 2 ) and oxygen gas (O 2 ), and

the separating layer and element deposition structure are etched concurrently.