IP Library › Granted Patent US 12,057,421
Granted Patent B2
US 12,057,421 · App. 17/470,644 · Granted Aug 6, 2024

Nonvolatile memory devices and data storage systems including the same

Inventors: Jaeho Ahn (Seoul, KR); Jiwon Kim (Seoul, KR); Sungmin Hwang (Hwaseong-si, KR); Joonsung Lim (Seongnam-si, KR); Sukkang Sung (Seongnam-si, KR)
Assignee: Samsung Electronics Co., Ltd.
H01L24/08H01L25/0657H01L25/18H01L2224/08145H01L2924/1431H01L2924/14511
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Quick Facts
Patent No.
US 12,057,421
App. No.
17/470,644
Granted
Aug 6, 2024
Kind
B2
Abstract

A nonvolatile memory device and a data storage system including the same are provided. The nonvolatile memory device includes: a first structure including at least one first memory plane; and a second structure bonded to the first structure and including at least one second memory plane, wherein the number of the at least one first memory plane included in the first structure is different from the number of the at least one second memory plane included in the second structure.

Claims (58)

1. A nonvolatile memory device comprising:

a first structure comprising at least one first memory plane; and

a second structure bonded to the first structure and comprising at least one second memory plane,

wherein a number of the at least one first memory plane included in the first structure is different from a number of the at least one second memory plane included in the second structure,

wherein each of the at least one first memory plane and the at least one second memory plane includes a cell region comprising a plurality of channel structures; and a stair region comprising a plurality of interlayer insulating layers and a plurality of gate layers having a stair shape, and

wherein the stair region of the at least one second memory plane overlaps the cell region of the at least one first memory plane in a plan view.

2. The nonvolatile memory device of claim 1 , wherein the nonvolatile memory device comprises a three-dimensional NAND flash memory device.

3. The nonvolatile memory device of claim 1 , wherein the second structure is directly bonded to the first structure.

4. The nonvolatile memory device of claim 1 , wherein each of the at least one first memory plane and the at least one second memory plane respectively comprises a plurality of blocks, and

wherein each of the plurality of blocks is a minimum unit of a delete operation.

5. The nonvolatile memory device of claim 1 , wherein a planar area of the first structure is the same as a planar area of the second structure.

6. The nonvolatile memory device of claim 1 , further comprising a third structure bonded to the first structure,

wherein the third structure comprises a peripheral circuit.

7. The nonvolatile memory device of claim 1 , wherein the number of the at least one second memory plane included in the second structure is an even number times the number of the at least one first memory plane included in the first structure.

8. The nonvolatile memory device of claim 1 , wherein the number of the at least one first memory plane included in the first structure is 1.

9. The nonvolatile memory device of claim 1 , wherein the at least one first memory plane is arranged horizontally, and the at least one second memory plane is arranged horizontally.

10. A nonvolatile memory device comprising:

a first structure; and

a second structure on the first structure,

wherein the first structure comprises:

at least one first memory plane; and

a plurality of first bonding pads on a first surface of the first structure and connected to the at least one first memory plane,

wherein the second structure comprises:

at least one second memory plane; and

a plurality of second bonding pads on a second surface of the second structure and connected to the at least one second memory plane,

wherein the plurality of first bonding pads are in contact with the plurality of second bonding pads, respectively,

wherein a number of the at least one first memory plane included in the first structure is different from a number of the at least one second memory plane included in the second structure,

wherein each of the at least one first memory plane and the at least one second memory plane comprises a plurality of interlayer insulating layers and a plurality of gate layers that are alternately stacked in a vertical direction,

wherein a plurality of channel structures passes through the plurality of interlayer insulating layers and the plurality of gate layers,

wherein each of the at least one first memory plane and the at least one second memory plane comprises: a cell region comprising the plurality of channel structures; and a stair region comprising the plurality of interlayer insulating layers and the plurality of gate layers having a stair shape, and

wherein the cell region of one of the at least one first memory plane overlaps the stair region of the at least one second memory plane in the vertical direction.

11. The nonvolatile memory device of claim 10 , further comprising a third structure on the second structure,

wherein the third structure comprises:

a peripheral circuit; and

a plurality of third bonding pads on a third surface of the third structure and connected to the peripheral circuit,

wherein the second structure further comprises a plurality of fourth bonding pads on a fourth surface of the second structure, which is opposite to the second surface of the second structure, and connected to the at least one second memory plane, and

wherein the plurality of third bonding pads are in contact with the plurality of fourth bonding pads, respectively.

12. The nonvolatile memory device of claim 10 , wherein a number of the plurality of channel structures included in each of the at least one first memory plane is different from a number of the plurality of channel structures included in each of the at least one second memory plane.

13. The nonvolatile memory device of claim 10 , wherein the at least one first memory plane comprises a plurality of first memory planes,

wherein the at least one second memory plane comprises a plurality of second memory planes,

wherein a planar area of each of the plurality of first memory planes is the same, and

wherein a planar area of each of the plurality of second memory planes is the same.

14. The nonvolatile memory device of claim 13 , wherein the planar area of each of the plurality of first memory planes is different from the planar area of each of the plurality of second memory planes.

15. The nonvolatile memory device of claim 10 , wherein the at least one first memory plane comprises first memory cells and the at least one second memory plane comprises second memory cells, and

wherein the nonvolatile memory device is configured to perform a first read operation, a first write operation, or a first delete operation on the first memory cells of the at least one first memory plane simultaneously with a second read operation, a second write operation, or a second delete operation on the second memory cells of the at least one second memory plane.

16. The nonvolatile memory device of claim 10 , wherein the number of the at least one second memory plane is greater than the number of the at least one first memory plane.

17. A data storage system comprising:

a nonvolatile memory device comprising a first structure and a second structure bonded to the first structure; and

a memory controller electrically connected to the nonvolatile memory device and configured to control the nonvolatile memory device,

wherein the first structure comprises at least one first memory plane,

wherein the second structure comprises at least one second memory plane,

wherein a number of the at least one first memory plane included in the first structure is different from a number of the at least one second memory plane included in the second structure

wherein each of the at least one first memory plane and the at least one second memory plane includes a cell region comprising a plurality of channel structures; and a stair region comprising a plurality of interlayer insulating layers and a plurality of gate layers having a stair shape, and

wherein the stair region of the at least one second memory plane overlaps the cell region of the at least one first memory plane in a vertical direction.

18. The data storage system of claim 17 , wherein a first surface of the first structure is in contact with a second surface of the second structure,

wherein the first structure further comprises a plurality of first bonding pads on the first surface of the first structure,

wherein the second structure further comprises a plurality of second bonding pads on the second surface of the second structure, and

wherein the plurality of first bonding pads are in contact with the plurality of second bonding pads, respectively.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE 5TH INVENTOR'S NAME PREVIOUSLY RECORDED AT REEL: 57449 FRAME: 949. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT . Recorded Mar 27, 2024
From: AHN, JAEHO; KIM, JIWON; HWANG, SUNGMIN; LIM, JOONSUNG; SUNG, SUKKANG
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 066925/0989 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 10, 2021
From: AHN, JAEHO; KIM, JIWON; HWANG, SUNGMIN; LIM, JOONSUNG; SUNG, SAKKANG
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 057449/0949 →
Priority Claims (1)
KR 10-2020-0165067 · Nov 30, 2020 · national
Continuity (1)
Related Publication 20220173060A1 · Jun 2, 2022
Cited By (2)
US 12,525,558 US 12,642,128