Granted Patent
B2
US 12,060,370 · App. 17/146,878 · Granted Aug 13, 2024
Molybdenum (0) precursors for deposition of molybdenum films
Inventors:
Andrea Leoncini (Singapore, SG); Paul Mehlmann (Singapore, SG); Nemanja Dordevic (Singapore, SG); Han Vinh Huynh (Singapore, SG); Doreen Wei Ying Yong (Singapore, SG); Mark Saly (Santa Clara, CA); Bhaskar Jyoti Bhuyan (San Jose, CA)
Assignee:
Applied Materials, Inc.
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Abstract
Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
Claims (2)
1. A metal coordination complex consisting of a molybdenum(0) precursor having a general formula of Mo(L) z , wherein z is 2, and L is selected from the group consisting of
and wherein each R may be independently selected from Me-, Et-, iPr-, and tBu-.
Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Apr 13, 2021
From: SALY, MARK; BHUYAN, BHASKAR JYOTI
To: APPLIED MATERIALS, INC.
Reel/Frame 055901/0290 →
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Feb 24, 2021
From: YONG, DOREEN WEI YING
To: APPLIED MATERIALS, INC.
Reel/Frame 055392/0127 →
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Feb 24, 2021
From: LEONCINI, ANDREA; MEHLMANN, PAUL; DORDEVIC, NEMANJA; HUYNH, HAN VINH
To: NATIONAL UNIVERSITY OF SINGAPORE
Reel/Frame 055392/0141 →
Continuity (1)
Cited By (1)