Gas injection for de-agglomeration in particle coating reactor
A method of coating particles includes dispensing particles into a vacuum chamber to form a particle bed in at least a lower portion of the chamber that forms a half-cylinder, evacuating the chamber through a vacuum port in an upper portion of the chamber, rotating a paddle assembly such that a plurality of paddles orbit a drive shaft to stir the particles in the particle bed, injecting a reactant or precursor gas through a plurality of channels into the lower portion of the chamber as the paddle assembly rotates to coat the particles, and injecting the reactant or precursor gas or a purge gas through the plurality of channels at a sufficiently high velocity such that the reactant or precursor a purge gas de-agglomerates particles in the particle bed.
1. A method of coating particles, comprising:
dispensing particles into a vacuum chamber to form a particle bed in at least a lower portion of the vacuum chamber that forms a half-cylinder;
evacuating the vacuum chamber through a vacuum port in an upper portion of the vacuum chamber;
rotating a paddle assembly such that a plurality of paddles orbit a horizontal drive shaft to stir the particles in the particle bed; and
alternating between injecting a first precursor or reactant gas and injecting a second inert gas through channels in a chamber wall of the lower portion of the vacuum chamber into to the lower portion of the vacuum chamber.
2. The method of claim 1 , wherein the first precursor or reactant gas is injected at a first flow rate sufficient to de-agglomerate the particles in the particle bed during a deposition process.
3. The method of claim 2 , wherein the second inert gas is injected at a second flow rate sufficient to prevent back-streaming of particles into the channels.
4. The method of claim 2 , wherein the second inert gas is injected at a second flow rate sufficient to cause de-agglomeration of the particles in the particle bed during a purging process.
5. The method of claim 1 , wherein the second inert gas is injected at a second flow rate sufficient to prevent back-streaming of particles into the channels.
6. The method of claim 1 , wherein the second inert gas is injected at a second flow rate sufficient to cause de-agglomeration of the particles in the particle bed during a purging process.
7. The method of claim 1 , wherein a direction of rotation of the plurality of paddles as the plurality of paddles orbit the drive shaft comprises a component in a same direction as respective flows of the first precursor or reactant gas and second inert gas into the lower portion of the vacuum chamber.
8. The method of claim 1 , comprising after injecting the first precursor or reactant gas and before injecting the second inert gas, delaying for a predetermined delay time without injecting gas into the vacuum chamber.
9. The method of claim 1 , comprising after injecting the second inert gas and before injecting the first precursor or reactant gas, delaying for a predetermined delay time without injecting gas into the vacuum chamber.
10. A reactor for coating particles, comprising:
a stationary vacuum chamber to hold particles to be coated in a particle bed;
a paddle assembly including a rotatable drive shaft and one or more paddles in the vacuum chamber, the one or more paddles connected to the drive shaft such that rotation of the drive shaft by a motor stirs the particles in the particle bed;
a gas injection assembly to a deliver a first precursor or reactant gas and a second inert gas into a lower portion of the vacuum chamber;
at least one flow regulator to control a first flow rate of the first precursor or reactant gas and a second flow rate of the second inert gas into the lower portion of the vacuum chamber; and
a controller configured to cause the gas injection assembly to alternate between injecting the first precursor or reactant gas and injecting the second inert gas into to the lower portion of the vacuum chamber.
11. The reactor of claim 10 , wherein the controller is configured to cause the at least one flow regulator to cause the first precursor or reactant gas to be injected at a first flow rate sufficient to de-agglomerate the particles in the particle bed during a deposition process.
12. The reactor of claim 11 , wherein the controller is configured to cause the at least one flow regulator to cause the second inert gas to be injected through channels at a second flow rate sufficient to prevent back-streaming of particles into the channels.
13. The reactor of claim 11 , wherein the controller is configured to cause the at least one flow regulator to cause the second inert gas to be injected at a second flow rate sufficient to cause de-agglomeration of the particles in the particle bed during a purging process.
14. The reactor of claim 10 , wherein the controller is configured to cause the at least one flow regulator to cause the second inert gas to be injected at a second flow rate sufficient to prevent back-streaming of particles into the channels.
15. The reactor of claim 10 , wherein the controller is configured to cause the at least one flow regulator to cause the second inert gas to be injected at a second flow rate sufficient to cause de-agglomeration of the particles in the particle bed during a purging process.
16. The reactor of claim 10 , wherein a direction of rotation of the one or more paddles as the one or more paddles orbit the drive shaft comprises a component in a same direction as respective flows of the first precursor or reactant gas and second inert gas into the lower portion of the vacuum chamber.
17. The reactor of claim 10 , wherein the controller is configured to cause the at least one flow regulator to, after injecting the first precursor or reactant gas and before injecting the second inert gas, delay for a predetermined delay time without injecting gas into the vacuum chamber.
18. The reactor of claim 10 , wherein the controller is configured to cause the at least one flow regulator to, after injecting the second inert gas and before injecting the first precursor or reactant gas, delay for a predetermined delay time without injecting gas into the vacuum chamber.