IP Library Granted Patent US 12,106,937
Granted Patent B2
US 12,106,937 · App. 17/580,257 · Granted Oct 1, 2024

Power delivery to a plasma via inductive coupling

Inventor: Randy Heckman (Fort Collins, CO)
Assignee: Advanced Energy Industries, Inc.
H01J37/321H01J37/32183
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Quick Facts
Patent No.
US 12,106,937
App. No.
17/580,257
Granted
Oct 1, 2024
Kind
B2
Abstract

Inductively coupled plasma (ICP) RF power delivery systems are disclosed that include at least two ICP coils. At least one of the ICP coils is directly driven by an RF resonant power amplifier that includes a resonant tank comprising the ICP coil. A controller is configured to control the power into the direct driven ICP coil by varying a corresponding DC voltage source and simultaneously varying operating frequency into the ICP coil by allowing a resonant voltage waveform across a corresponding open switch network to rise and then fall to substantially zero volts before closing the corresponding switch network for a remainder of an RF cycle. Some variations comprise at least one passive ICP coil that is arranged and configured to be inductively coupled to the first ICP coil, and the passive ICP coil is terminated by an independently adjustable impedance.

Claims (24)

1. An inductively coupled plasma (ICP) RF power delivery system comprising:

two or more DC voltage sources, each of the DC voltage sources connected to a corresponding one of two or more RF resonant power amplifiers, each of the RF resonant power amplifiers tuned to operate over a different range of frequencies that are coupled into a common plasma, each of the RF resonant power amplifiers comprising:

a switch network comprising at least one switch; and

a resonant tank circuit tuned to a frequency range comprising:

a reactive network comprising at least one capacitive component; and

an ICP coil connected to the reactive network; and

a controller configured to control the power into each ICP coil by:

varying the corresponding DC voltage source; and

simultaneously varying operating frequency into each ICP coil by allowing a resonant voltage waveform across a corresponding open switch network to rise and then fall before closing the corresponding open switch network for a remainder of an RF cycle.

2. The ICP RF power delivery system of claim 1 where each of the DC voltage sources comprises is a DC-DC converter with inputs driven by a fixed DC voltage source.

3. The ICP RF power delivery system of claim 2 , wherein each DC-DC converter comprises one of a buck converter, boost converter, or buck-boost converter.

4. The ICP RF power delivery system of claim 3 , where current into each of the ICP coils is regulated by the current measured into each ICP coil.

5. The ICP RF power delivery system of claim 3 where power in to each of the ICP coils is regulated by actual RF power measured into each ICP coil.

6. The ICP RF power delivery system of claim 1 wherein the switch network in each of the RF resonant power amplifiers comprises one of a single physical switch or a plurality of switches that operate as a single switch.

7. The ICP RF power delivery system of claim 1 , wherein each of the reactive networks comprises one of a series capacitor, a parallel capacitor, or a series and a parallel capacitor.

8. The ICP RF power delivery system of claim 1 , wherein power regulation into each of the ICP coils is controlled by a product of a DC source output voltage and current.

9. An inductively coupled plasma (ICP) RF power delivery system comprising:

a first branch comprising a first DC voltage source and a first RF resonant power amplifier configured to couple to a first ICP coil;

a second branch comprising a second DC voltage source and a second RF resonant power amplifier configured to couple to a second ICP coil; and

at least one controller configured to maintain zero-voltage switching in the first and second branches, control the power into the first ICP coil by varying the first DC voltage source, and control the power into the second ICP coil by varying the second DC voltage source.

10. The ICP RF power delivery system of claim 9 where each of the first and second DC voltage sources includes a DC-DC converter with inputs driven by a fixed DC voltage source.

11. The ICP RF power delivery system of claim 10 , wherein each DC-DC converter comprises one of a buck converter, boost converter, or buck-boost converter.

12. The ICP RF power delivery system of claim 11 , where current into each of the ICP coils is regulated by the current measured into each ICP coil.

13. The ICP RF power delivery system of claim 11 where power into each of the ICP coils is regulated by actual RF power measured into each ICP coil.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 5, 2022
From: HECKMAN, RANDY
To: ADVANCED ENERGY INDUSTRIES, INC.
Reel/Frame 058900/0128 →
Continuity (2)
Provisional Application 63139488 · Jan 20, 2021
Related Publication 20220230847A1 · Jul 21, 2022
Cited By (5)
US 12,471,202 US 12,484,139 US 12,490,370 US 12,507,338 US 12,586,758