IP Library Granted Patent US 12,112,006
Granted Patent B2
US 12,112,006 · App. 18/227,754 · Granted Oct 8, 2024

Input sensing panel, display device having the same, and method of manufacturing the display device

Inventors: Jin-Su Byun (Seoul, KR); Woongsik Kim (Hwaseong-si, KR)
Assignee: Samsung Display Co., Ltd.
G06F3/0446G06F3/0412G06F3/0443H10K59/40G06F2203/04103G06F2203/04111G09G3/3233G09G2300/0426G09G2300/0809G09G2320/0238H10K59/122
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,112,006
App. No.
18/227,754
Granted
Oct 8, 2024
Kind
B2
Abstract

A method of manufacturing a display device, including forming a first sensing insulating layer on a display panel comprising an active area and a peripheral area; forming a first conductive layer on the first sensing insulating layer; forming a second sensing insulating layer to cover the first conductive layer; forming a second conductive layer comprising a conductive material on the second sensing insulating layer; forming a passivation layer on the second conductive layer; substantially simultaneously etching the second conductive layer and the passivation layer through a photolithography process; and forming a third sensing insulating layer to cover the passivation layer. The passivation layer includes an inorganic material.

Claims (12)

1. A method of manufacturing a display device, comprising:

forming a first sensing insulating layer on a display panel comprising an active area and a peripheral area;

forming a first conductive layer on the first sensing insulating layer;

forming a second sensing insulating layer to cover the first conductive layer;

forming a second conductive layer comprising a conductive material on the second sensing insulating layer;

forming a passivation layer on the second conductive layer;

substantially simultaneously etching the second conductive layer and the passivation layer through a photolithography process; and

forming a third sensing insulating layer to cover the passivation layer,

wherein the passivation layer comprises an inorganic material.

2. The method of claim 1 , wherein, when the second conductive layer and the passivation layer are substantially simultaneously etched, at least a portion of the second sensing insulating layer is removed to form a side surface of the second sensing insulating layer, which is aligned with a side surface of the second conductive layer.

3. The method of claim 2 , further comprising forming a contact hole through the first sensing insulating layer and the second sensing insulating layer in the peripheral area after the forming of the second sensing insulating layer and before the forming of the second conductive layer.

4. The method of claim 3 , further comprising removing the passivation layer in an area overlapping the contact hole to expose the second conductive layer after the second conductive layer and the passivation layer are substantially simultaneously etched.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 18, 2024
From: BYUN, JIN-SU; KIM, WOONGSIK
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 067753/0537 →
Priority Claims (1)
KR 10-2021-0081820 · Jun 23, 2021 · national
Continuity (2)
Division 17836929 · Jun 9, 2022
Related Publication 20230376154A1 · Nov 23, 2023