Precursor capsule, a vessel and a method
The current disclosure relates to a precursor capsule for holding a precursor for a vapor deposition process. The precursor capsule comprises a vapor-permeable shell configured to define a precursor space, and to allow precursor in vapor form to leave the precursor capsule under vaporization conditions. The disclosure further relates to a precursor vessel comprising capsules according to the current disclosure, to a vapor deposition apparatus and a method.
1. A precursor capsule for holding a precursor for a vapor deposition process, wherein
the precursor capsule comprises:
a shell configured to define a precursor space, wherein
the shell is vapor-permeable to allow precursor in vapor form to leave the precursor capsule under vaporization conditions, and
wherein the shell comprises metal.
2. The precursor capsule of claim 1 , wherein the shell is configured to substantially retain the non-vaporized precursor in the precursor space.
3. The precursor capsule of claim 1 , wherein the shell comprises openings for vaporized precursor to exit the precursor capsule.
4. The precursor capsule of claim 3 , wherein the largest cross section of the openings is 50 μm to 50 mm.
5. The precursor capsule of claim 3 , wherein at least 50% of the surface area of the shell is vapor permeable.
6. The precursor capsule of claim 1 , the precursor capsule is configured to be loadable in a precursor vessel for performing a vapor deposition process.
7. The precursor capsule of claim 1 , wherein the shell comprises a coating.
8. The precursor capsule of claim 1 , wherein the precursor space has a volume of from about 1 cm 3 to about 20 cm 3 .
9. The precursor capsule of claim 1 , wherein the shell comprises protrusions extending towards the interior of the precursor space.
10. The precursor capsule of claim 1 , wherein the shell has a substantially spherical shape.
11. The precursor capsule of claim 1 , wherein the shell has a width and a length, and the width to length ratio of the shell is from about 1:1 to about 1:20.
12. The precursor capsule of claim 1 , wherein the shell has substantially spherocylindrical shape.
13. The precursor capsule of claim 1 , wherein the shell has a substantially a cylindrical shape.
14. The precursor capsule of claim 1 , wherein the shell has a length and a width, and the length is from about 1 cm to about 20 cm.
15. The precursor capsule of claim 1 , wherein the shell is configured and arranged to hold a solid precursor.
16. The precursor capsule of claim 1 , wherein the shell has a length and a width, and the width is about from about 0.4 cm to about 10 cm.
17. The precursor capsule of claim 16 , wherein the shell is constructed from parts that are moveable relative to each other for opening the precursor capsule.
18. The precursor capsule of claim 1 , wherein the shell is constructed and arranged to be openable to allow the filling of precursor into the precursor capsule.
19. A precursor vessel containing at least two precursor capsules for holding a precursor for a vapor deposition process, the at least two precursor capsules comprising the precursor capsule of claim 1 .
20. The precursor vessel of claim 19 constructed and arranged to operate at a vaporization temperature of 30° C. to 500° C., and material of the precursor capsule shell is selected to withstand said vaporization temperature.
21. A vapor deposition assembly, comprising the precursor vessel of claim 19 .
22. A precursor capsule for holding a precursor for a vapor deposition process, wherein
the precursor capsule comprises:
a shell configured to define a precursor space,
wherein the shell is vapor-permeable to allow precursor in vapor form to leave the precursor capsule under vaporization conditions, and
wherein the shell comprises a coating.