IP Library › Granted Patent US 12,159,768
Granted Patent B2
US 12,159,768 · App. 16/790,644 · Granted Dec 3, 2024

Controlling exhaust gas pressure of a plasma reactor for plasma stability

Inventors: George Stephen Leonard, III (Oakland, CA); Stefan Andrew McClelland (San Jose, CA); Fei Xie (Sunnyvale, CA); Wei Li (San Jose, CA); Curtis Peter Tom (San Mateo, CA); Jae Mo Koo (Palo Alto, CA)
Assignee: ReCarbon, Inc.
H01J37/32229B01J19/12C23C16/511G01J1/0425G01J1/0492G01J1/4228G01J1/429G01J5/0018H01J37/32449H01J37/32623H01J37/32844H01J37/32972H05H1/46F01N2240/28H01J37/32192H01J37/32513H01J2237/1502H05H1/4622
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Quick Facts
Patent No.
US 12,159,768
App. No.
16/790,644
Granted
Dec 3, 2024
Kind
B2
Abstract

The present invention provides a plasma generating system that includes: a plurality of plasma reactors. Each plurality of plasma reactors includes: a waveguide for transmitting a microwave energy therethrough; a plasma chamber coupled to the waveguide and configured to generate a plasma therein using the microwave energy; a gas inlet for introducing a gas into the plasma chamber; an exhaust gas pipe for carrying an exhaust gas from the plasma chamber, wherein the plasma converts the gas into the exhaust gas; and a pressure control device installed in the exhaust gas pipe and configured to control a pressure of the exhaust gas in the exhaust gas pipe. The plasma generating system also includes a manifold coupled to the exhaust gas pipes of the plurality of plasma reactors and configured to receive the exhaust gas from the exhaust gas pipes.

Claims (34)

1. A plasma generating system, comprising:

a plasma chamber coupled to a waveguide and configured to generate a plasma therein using the microwave energy;

the waveguide having an inner wall enclosing the plasma chamber;

a plasma stabilizer;

a forward flow inlet and a reverse flow inlet for introducing input gases into the plasma chamber, the forward flow inlet having a gas passageway being shaped to contribute to an inner vortex flow and the reverse flow inlet to contribute to an outer vortex flow within the plasma chamber;

an exhaust gas pipe for carrying an exhaust gas from the plasma chamber, wherein the plasma converts the input gas into the exhaust gas; and

a stationary pressure control device installed in the exhaust gas pipe, the stationary pressure control device having a cylindrical orifice formed therethrough, the cylindrical orifice being shaped configured to control a pressure of the exhaust gas in the exhaust gas pipe,

wherein the plasma stabilizer is protruding into a plasma cavity that is surrounded by the inner wall, the waveguide, the forward flow inlet and the reverse flow inlet coupled to the plasma chamber.

2. The plasma generating system as recited in claim 1 , wherein the pressure control device is a disk.

3. The plasma generating system as recited in claim 1 , wherein the pressure control device is a sphere having at least one hole through which the exhaust gas passes.

4. The plasma generating system as recited in claim 1 , wherein the pressure control device includes a mesh fabric.

5. The plasma generating system as recited in claim 1 , wherein the pressure control device is a disk having one or more edge cutouts.

6. The plasma generating system as recited in claim 1 , wherein the pressure control device is a tube and a diameter of the tube varies along a downstream direction of the tube.

7. The plasma generating system as recited in claim 1 , further comprising a second flow inlet configured as a reverse flow inlet.

8. The plasma generating system as recited in claim 1 , the forward flow inlet having at least two gas passageways being shaped to contribute to the vortex flow within the plasma chamber.

9. The plasma generating system as recited in claim 8 , further comprising a second flow inlet configured as a reverse flow inlet, the reverse flow inlet having at least two gas passageways being shaped to contribute to the vortex flow within the plasma chamber.

10. A plasma generating system, comprising:

a plurality of plasma reactors, each of the plurality of plasma reactors including:

a waveguide for transmitting a microwave energy therethrough,

a plasma stabilizer;

a plasma chamber coupled to the waveguide, the waveguide having an inner wall enclosing the plasma chamber;

a forward flow inlet and a reverse flow inlet for introducing input gases into the plasma chamber, the forward flow inlet having a gas passageway being shaped to contribute to an inner vortex flow and the reverse flow inlet to contribute to an outer vortex flow within the plasma chamber;

an exhaust gas pipe for carrying an exhaust gas from the plasma chamber, wherein the plasma converts the gas into the exhaust gas; and

a pressure control device installed in the exhaust gas pipe and configured to control a pressure of the exhaust gas in the exhaust gas pipe; and

a manifold coupled to the exhaust gas pipes of the plurality of plasma reactors and configured to receive the exhaust gas from the exhaust gas pipes,

wherein a first plasma reactor of the plurality of plasma reactors having a first stationary pressure control device that is shaped to reduce crosstalk between the first plasma reactor and at least one other plasma reactor of the plurality of plasma reactors,

wherein the plasma stabilizer is protruding into a plasma cavity that is surrounded by the inner wall, the waveguide, the forward flow inlet and the reverse flow inlet coupled to the plasma chamber.

11. The plasma generating system as recited in claim 10 , wherein the pressure control device is a disk.

12. The plasma generating system as recited in claim 10 , wherein the pressure control device is a sphere having at least one hole through which the exhaust gas passes.

13. The plasma generating system as recited in claim 10 , wherein the pressure control device includes a mesh fabric.

14. The plasma generating system as recited in claim 10 , wherein the pressure control device is a disk having one or more edge cutouts.

15. The plasma generating system as recited in claim 10 , wherein the pressure control device is a tube and a diameter of the tube varies along a downstream direction of the tube.

16. The plasma generating system as recited in claim 10 , wherein the flow inlet for introducing the gas into the plasma chamber includes a forward flow inlet.

17. The plasma generating system as recited in claim 16 , further comprising a second flow inlet configured as a reverse flow inlet.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2020
From: LEONARD III, GEORGE STEPHEN; MCCLELLAND, STEFAN ANDREW; XIE, FEI; LI, WEI; TOM, CURTIS PETER; KOO, JAE MO
To: RECARBON , INC.
Reel/Frame 051817/0648 →
Continuity (8)
Provisional Application 62823514 · Mar 25, 2019
Provisional Application 62823505 · Mar 25, 2019
Provisional Application 62823517 · Mar 25, 2019
Provisional Application 62823492 · Mar 25, 2019
Provisional Application 62823436 · Mar 25, 2019
Provisional Application 62823508 · Mar 25, 2019
Provisional Application 62823484 · Mar 25, 2019
Related Publication 20200312629A1 · Oct 1, 2020