Method and apparatus for Schottky TFE inspection
The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.
1. An image generation method, comprising:
forming an electron beam using a Schottky thermal field emission (TFE) source, wherein the Schottky TFE source includes a tip and the electron beam is emitted from the tip;
adjusting the electron beam as the electron beam exited the Schottky TFE source to form an adjusted electron beam by applying a voltage setting to electron optics;
generating an emission image of the tip of the Schottky TFE source by exposing a scintillator screen to the adjusted electron beam as the adjusted electron beam exited the electron optics;
adjusting a magnification of the emission image, using a microscope, to form an adjusted emission image on a camera sensor in a camera; and
generating a final image of the adjusted emission image.
2. The method of claim 1 , further comprising tuning at least one of the voltage setting and the magnification until the final image has desired image characteristics.
3. The method of claim 1 , further comprising analyzing the final image to determine whether or not the tip is defective.
4. The method of claim 1 , wherein
the Schottky TFE source, the electron optics, and the scintillator screen are inside a vacuum chamber, and
the microscope and the camera are outside the vacuum chamber.
5. The method of claim 4 , wherein the electron optics for performing the adjusting is located between the tip and the scintillator screen.
6. The method of claim 1 , wherein the electron optics includes an electrostatic lens with two or more electrodes.
7. The method of claim 1 , wherein the electron optics includes a three-electrode electrostatic lens.
8. The method of claim 7 , wherein
a first electrode from the three-electrode electrostatic lens is set to 2,000 volts,
a second electrode from the three-electrode electrostatic lens is set to 600 volts,
a third electrode from the three-electrode electrostatic lens is set between 250 and 450 volts,
the first electrode is located closest to the Schottky TFE source,
the third electrode is located furthest from the Schottky TFE source, and
the second electrode is located between the first electrode and the third electrode.
9. The method of claim 1 , further comprising displaying the final image.
10. The method of claim 1 , wherein the camera is at least one of a CCD camera and a CMOS camera.
11. The method of claim 1 , wherein the adjusted electron beam is a collimated electron beam.
12. An image generation method, comprising:
forming an electron beam using a Schottky thermal field emission (TFE) source, wherein the Schottky TFE source includes a tip and the electron beam is emitted from the tip;
adjusting the electron beam to form an adjusted electron beam by applying a voltage setting to electron optics;
generating an emission image by exposing a scintillator screen to the adjusted electron beam as it exited the electron optics;
adjusting a magnification of the emission image, using a microscope, to form an adjusted emission image on a camera sensor in a camera;
generating a final image of the adjusted emission image; and
analyzing the final image to determine whether or not the tip is defective.
13. The method of claim 12 , comprising:
adjusting the electron beam as the electron beam exits the Schottky TFE source to form an adjusted electron beam by applying a voltage setting to electron optics; and
generating an emission image by exposing a scintillator screen to the adjusted electron beam.