Transistors comprising a vertical stack of elongated semiconductor features
A semiconductor device includes a substrate, a first semiconductor stack including elongated semiconductor features isolated from each other and overlaid in a direction perpendicular to a top surface of the substrate, and a second semiconductor stack including elongated semiconductor features isolated from each other and overlaid in the direction perpendicular to the top surface of the substrate. The second semiconductor stack has different geometric characteristics than the first semiconductor stack. A top surface of the first semiconductor stack is coplanar with a top surface of the second semiconductor stack.
1. A semiconductor device comprising:
a first transistor comprising a fin-like semiconductor body extending continuously from a top surface of a silicon substrate; and
a second transistor comprising a first vertical stack of elongated semiconductor features over the silicon substrate,
wherein a height of the fin-like semiconductor body is greater than a height of the first vertical stack of elongated semiconductor features,
wherein the fin-like semiconductor body comprises a uniform composition along the height of the fin-like semiconductor body,
wherein each of the first vertical stack of elongated semiconductor features extends lengthwise along a direction,
wherein at least one of the first vertical stack of elongated semiconductor features includes a dog-bone shape cross-section when viewed along the direction,
wherein a topmost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a first thickness,
wherein a bottommost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a second thickness greater than the first thickness.
2. The semiconductor device of claim 1 ,
wherein the first transistor is disposed over an input/output (I/O) region of the semiconductor device,
wherein the second transistor is disposed over a core region of the semiconductor device.
3. The semiconductor device of claim 1 ,
wherein the first transistor is disposed over a high-voltage application region of the silicon substrate,
wherein the second transistor is disposed over a core region of the silicon substrate.
4. The semiconductor device of claim 1 , further comprising:
a third transistor comprising a second vertical stack of elongated semiconductor features over the silicon substrate,
wherein a width of each of the second vertical stack of elongated semiconductor features is greater than a width of each of the first vertical stack of elongated semiconductor features.
5. The semiconductor device of claim 4 , wherein a height of the fin-like semiconductor body is greater than a height of the second vertical stack of elongated semiconductor features.
6. The semiconductor device of claim 1 , further comprising:
a third transistor comprising a third vertical stack of elongated semiconductor features over the silicon substrate; and
a fourth transistor comprising a fourth vertical stack of elongated semiconductor features over the silicon substrate,
wherein a thickness of each of the third vertical stack of elongated semiconductor features is greater than a thickness of each of the fourth vertical stack of elongated semiconductor features.
7. The semiconductor device of claim 6 , wherein a height of the fin-like semiconductor body is greater than a height of the third vertical stack of elongated semiconductor features.
8. The semiconductor device of claim 1 , wherein the fin-like semiconductor body comprises germanium and the first transistor is a p-type fully strained channel transistor.
9. A semiconductor device comprising:
a first transistor comprising a first vertical stack of elongated semiconductor features over a substrate, the first vertical stack of elongated semiconductor features extending along a direction,
wherein at least one of the first vertical stack of elongated semiconductor features includes a dog-bone shape cross-section when viewed along the direction,
wherein a width of a topmost elongated semiconductor feature of the first vertical stack of elongated semiconductor features is smaller than a width of another elongated semiconductor feature of the first vertical stack of elongated semiconductor features.
10. The semiconductor device of claim 9 , wherein at least one of the first vertical stack of elongated semiconductor features includes a rectangular cross-section when viewed along the direction.
11. The semiconductor device of claim 9 , further comprising a second transistor comprising a fin-like semiconductor body over the substrate.
12. The semiconductor device of claim 11 ,
wherein the first transistor is disposed over a core region of the semiconductor device,
wherein the second transistor is disposed over a high-voltage region of the semiconductor device.
13. The semiconductor device of claim 11 ,
wherein the first transistor is disposed over a core region of the substrate,
wherein the second transistor is disposed over an input/out (I/O) region of the substrate.
14. The semiconductor device of claim 11 , further comprising:
a third transistor comprising a second vertical stack of elongated semiconductor features over the substrate,
wherein a width of each of the second vertical stack of elongated semiconductor features is greater than a width of each of the first vertical stack of elongated semiconductor features.
15. The semiconductor device of claim 11 , wherein a height of the fin-like semiconductor body is greater than a height of the first vertical stack of elongated semiconductor features.
16. The semiconductor device of claim 11 , wherein the fin-like semiconductor body comprises germanium and the second transistor is a p-type fully strained channel transistor.
17. A semiconductor device comprising:
a fin-type transistor comprising a fin-like semiconductor body extending continuously from a top surface of a substrate; and
a gate-all-around (GAA) transistor comprising a first vertical stack of elongated semiconductor features over the substrate,
wherein a height of the fin-like semiconductor body is greater than a height of the first vertical stack of elongated semiconductor features,
wherein a width of each of the first vertical stack of elongated semiconductor features is greater than a width of the fin-like semiconductor body,
wherein the fin-like semiconductor body comprises a uniform composition along the height of the fin-like semiconductor body,
wherein a topmost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a first width,
wherein a bottommost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a second width greater than the first width,
wherein the first vertical stack of elongated semiconductor features extends lengthwise along a direction,
wherein at least one of the first vertical stack of elongated semiconductor features includes dog-bone shape cross-section when viewed along the direction.
18. The semiconductor device of claim 17 ,
wherein the fin-type transistor is disposed over an input/output (I/O) region of the substrate,
wherein the GAA transistor is disposed over a core region of the substrate.
19. The semiconductor device of claim 17 ,
wherein a width of a topmost elongated semiconductor feature of the first vertical stack of elongated semiconductor features is smaller than a width of another elongated semiconductor feature of the first vertical stack of elongated semiconductor features.
20. The semiconductor device of claim 17 ,
wherein the topmost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a first thickness along a vertical direction,
wherein the bottommost elongated semiconductor feature of the first vertical stack of elongated semiconductor features has a second thickness along the vertical direction,
wherein the second thickness is greater than the first thickness.