Thermal-conductive silicone composition, production method therefor, and semiconductor device
A thermal-conductive silicone composition containing: (A) a hydrolysable organopolysiloxane having an alkoxysilyl group; and (B) aluminum nitride particles having an average particle size of 0.5 μm or more and 2.0 μm or less and contained in an amount of 50 to 70 volume %. A content of coarse particles in the aluminum nitride particles is 1.0 volume % or less relative to the entire aluminum nitride particles, the coarse particles having particle sizes of 10 μm or more according to a particle size distribution measurement method by laser diffraction. The thermal-conductive silicone composition has a heat conductivity of 1.3 W/mK or more according to a hot disc method. The present invention provides: a thermal-conductive silicone composition having high heat conductivity and being compressible to 10 μm or less; and a production method of the thermal-conductive silicone composition.
1. A thermal-conductive silicone composition comprising the following components (A) and (B):
(A) a hydrolysable organopolysiloxane having an alkoxysilyl group; and
(B) aluminum nitride particles having an average particle size of 0.5 μm or more and 2.0 μm or less and contained in an amount of 50 to 70 volume %, wherein
a content of coarse particles in the aluminum nitride particles is 1.0 volume % or less relative to the entire aluminum nitride particles, the coarse particles having particle sizes of 10 μm or more according to a particle size distribution measurement method by laser diffraction, and
the thermal-conductive silicone composition has a heat conductivity of 1.3 W/mK or more according to a hot disc method.
2. The thermal-conductive silicone composition according to claim 1 , wherein the aluminum nitride particles have an oxygen content of 1.0 mass % or less.
3. The thermal-conductive silicone composition according to claim 1 , wherein the thermal-conductive silicone composition has a thermal resistance of 5.0 mm2·K/W or less as measured at 25° C. by a laser flash method.
4. The thermal-conductive silicone composition according to claim 2 , wherein the thermal-conductive silicone composition has a thermal resistance of 5.0 mm2·K/W or less as measured at 25° C. by a laser flash method.
5. The thermal-conductive silicone composition according to claim 1 , wherein the thermal-conductive silicone composition has an absolute viscosity of 3 to 500 Pa·S as measured with a spiral viscometer at 25° C. and a shear rate of 6 S-1.
6. The thermal-conductive silicone composition according to claim 2 , wherein the thermal-conductive silicone composition has an absolute viscosity of 3 to 500 Pa·S as measured with a spiral viscometer at 25° C. and a shear rate of 6 S-1.
7. The thermal-conductive silicone composition according to claim 3 , wherein the thermal-conductive silicone composition has an absolute viscosity of 3 to 500 Pa·S as measured with a spiral viscometer at 25° C. and a shear rate of 6 S-1.
8. The thermal-conductive silicone composition according to claim 4 , wherein the thermal-conductive silicone composition has an absolute viscosity of 3 to 500 Pa·S as measured with a spiral viscometer at 25° C. and a shear rate of 6 S-1.
9. A semiconductor device comprising the thermal-conductive silicone composition according to claim 1 interposed in a space formed between a heat generator and a cooler, the space having a thickness of 10 μm or less.
10. The semiconductor device according to claim 9 , wherein the heat generator is an insulated-gate bipolar transistor.
11. A production method for producing the thermal-conductive silicone composition according to claim 1 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
12. A production method for producing the thermal-conductive silicone composition according to claim 2 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
13. A production method for producing the thermal-conductive silicone composition according to claim 3 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
14. A production method for producing the thermal-conductive silicone composition according to claim 4 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
15. A production method for producing the thermal-conductive silicone composition according to claim 5 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
16. A production method for producing the thermal-conductive silicone composition according to claim 6 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
17. A production method for producing the thermal-conductive silicone composition according to claim 7 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.
18. A production method for producing the thermal-conductive silicone composition according to claim 8 , the method comprising a step of mixing the components (A) and (B) at a temperature of 100° C. or more for 30 minutes or more.