IP Library › Granted Patent US 12,198,976
Granted Patent B2
US 12,198,976 · App. 17/447,025 · Granted Jan 14, 2025

Template, method of manufacturing template, and method of manufacturing semiconductor device

Inventor: Kazuhiro Takahata (Yokohama Kanagawa, JP)
Assignee: Kioxia Corporation
H01L21/76817H01L21/76877B29C59/02
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Quick Facts
Patent No.
US 12,198,976
App. No.
17/447,025
Granted
Jan 14, 2025
Kind
B2
Abstract

According to one embodiment, there is provided a template including: a substrate having a first surface; a trench that is recessed from the first surface at a predetermined depth and extends along the first surface in a first direction, the trench includes a first portion having a second width in a second direction intersecting with the first direction and a second portion having a third width in the second direction; and a hole that is arranged is the first portion of the trench and extends from a bottom surface of the trench, and the first width is smaller than the second width, and the third width is smaller than the first width.

Claims (12)

1. A template comprising:

a substrate having a first surface;

a trench that is recessed from the first surface at a predetermined depth and extends along the first surface in a first direction, the trench includes a first portion having a first width in a second direction intersecting with the first direction, a second portion having a second width in the second direction, and a third portion having the first width in the second direction, the first to third portions continuously extending in the first direction in this order; and

a hole that is arranged in the second portion of the trench and extends from a bottom surface of the second portion in the trench, the hole having a third width in the second direction, and

the first width is smaller than the third width, and the third width is smaller than the second width.

2. The template according to claim 1 ,

wherein the third width is a maximum width of the hole in the second direction, and

the second width is a maximum width of the trench in the second direction at the first portion.

3. The template according to claim 1 ,

wherein the hole has a flat bottom surface.

4. The template according to claim 1 ,

wherein a cross section of the hole has a circular shape, an elliptical shape, or an oval shape.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 4, 2021
From: TAKAHATA, KAZUHIRO
To: KIOXIA CORPORATION
Reel/Frame 057693/0943 →
Priority Claims (1)
JP 2020-156094 · Sep 17, 2020 · national
Continuity (1)
Related Publication 20220084877A1 · Mar 17, 2022
References Cited (11)
US 10288999B2 · Choi · 2019 [cited by applicant]
US 11191164B2 · Kasai et al. · 2021 [cited by applicant]
US 20110315077A1 · Asano · 2011 [cited by applicant]
US 20180169910A1 · Choi · 2018 [cited by applicant]
US 20180310413A1 · Kasai · 2018 [cited by examiner]
US 20220046801A1 · Kasai et al. · 2022 [cited by applicant]
JP 2010219456A · 2010 [cited by applicant]
JP 20129686A · 2012 [cited by applicant]
JP 201814497A · 2018 [cited by applicant]
JP 2018101780A · 2018 [cited by applicant]
JP 202017746A · 2020 [cited by applicant]