IP Library Granted Patent US 12,216,236
Granted Patent B2
US 12,216,236 · App. 18/377,050 · Granted Feb 4, 2025

Apparatuses for radiation detection and methods of making them

Inventors: Yurun Liu (Shenzhen, CN); Peiyan Cao (Shenzhen, CN)
Assignee: SHENZHEN XPECTVISIONTECHNOLOGY CO., LTD.
G01T1/24G01T1/2928
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Quick Facts
Patent No.
US 12,216,236
App. No.
18/377,050
Granted
Feb 4, 2025
Kind
B2
Abstract

Disclosed herein are apparatuses for detecting radiation and methods of making them. The method comprises forming a recess into a semiconductor substrate, wherein a portion of the semiconductor substrate extends into the recess and is surrounded by the recess; depositing semiconductor nanocrystals into the recess, the semiconductor nanocrystals having a different composition from the semiconductor substrate; forming a first doped semiconductor region in the semiconductor substrate; forming a second doped semiconductor region in the semiconductor substrate; wherein the first doped semiconductor region and the second doped semiconductor region form a p-n junction that separates the portion from the rest of the semiconductor substrate.

Claims (27)

1. A radiation detector comprising:

a semiconductor substrate;

a recess in the semiconductor substrate, wherein a portion of the semiconductor substrate extends into the recess and is surrounded by the recess;

semiconductor nanocrystals in the recess, the semiconductor nanocrystals having a different composition from the semiconductor substrate;

a first doped semiconductor region in the semiconductor substrate; and

a second doped semiconductor region in the semiconductor substrate;

wherein the first doped semiconductor region and the second doped semiconductor region form a p-n junction that separates the portion from the rest of the semiconductor substrate.

2. The radiation detector of claim 1 , wherein the radiation detector is configured to absorb particles of radiation incident on the semiconductor nanocrystals and to generate charge carriers.

3. The radiation detector of claim 1 , wherein the first doped semiconductor region surrounds the second doped semiconductor region.

4. The radiation detector of claim 1 , wherein the second doped semiconductor region is in electrical contact with the portion.

5. The radiation detector of claim 1 , wherein the first doped semiconductor region extends from a surface of the semiconductor substrate to an interface between the recess and the semiconductor substrate.

6. The radiation detector of claim 1 , wherein the second doped semiconductor region is coextensive with the first doped semiconductor region.

7. The radiation detector of claim 1 , wherein the semiconductor substrate comprises silicon, germanium, GaAs or a combination thereof.

8. The radiation detector of claim 1 , wherein the semiconductor nanocrystals are cadmium zinc telluride (CdZnTe) nanocrystals, cadmium telluride (CdTe) nanocrystals, cadmium selenide (CdSe) nanocrystals, cadmium sulfide (CdS) nanocrystals, or lead sulfide (PbS) nanocrystals.

9. The radiation detector of claim 1 , wherein the recess has a shape of a frustum, prism, pyramid, cuboid, or cylinder.

10. The radiation detector of claim 1 , further comprising an electronics layer bonded to the semiconductor substrate, the electronics layer comprising an electronic system electrically connected to the second doped semiconductor region and configured to process an electrical signal generated in the semiconductor substrate.

11. A radiation detector comprising:

an electrical insulator layer;

a semiconductor layer supported directly on the electrical insulator layer;

a through hole in the semiconductor layer, wherein a portion of the semiconductor layer extends into the through hole and is surrounded by the through hole;

semiconductor nanocrystals in the through hole, the semiconductor nanocrystals having a different composition from the semiconductor layer; and

an electrode through the electrical insulator layer, the electrode being in electrical contact to the portion.

12. The radiation detector of claim 11 , wherein the semiconductor layer comprises silicon, germanium, GaAs or a combination thereof.

13. The radiation detector of claim 11 , wherein the electrical insulator layer comprises an oxide, a nitride or an oxynitride.

14. The radiation detector of claim 11 , wherein the semiconductor nanocrystals are cadmium zinc telluride (CdZnTe) nanocrystals, cadmium telluride (CdTe) nanocrystals, cadmium selenide (CdSe) nanocrystals, cadmium sulfide (CdS) nanocrystals, or lead sulfide (PbS) nanocrystals.

15. The radiation detector of claim 11 , wherein the through hole has a shape of a frustum, prism, pyramid, cuboid, or cylinder.

16. The radiation detector of claim 11 , further comprising an electronics layer bonded to the electrical insulator layer, the electronics layer comprising an electronic system electrically connected to the electrode and configured to process an electrical signal generated in the semiconductor layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 5, 2023
From: LIU, YURUN; CAO, PEIYAN
To: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
Reel/Frame 065136/0877 →
Continuity (3)
Continuation 17471670 · Sep 10, 2021
Continuation PCTCN2019080403 · Mar 29, 2019
Related Publication 20240036220A1 · Feb 1, 2024
References Cited (3)
US 5030828A · Solomon · 1991 [cited by examiner]
US 20110037133A1 · Su · 2011 [cited by examiner]
US 20130011955A1 · Kawabata · 2013 [cited by examiner]