Granted Patent B2

US 12,219,796 · App. 17/420,104 · Granted Feb 4, 2025

Inventors: Bingwei Yang (Beijing, CN); Mingxing Li (Beijing, CN)

Assignees: MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.; BOE TECHNOLOGY GROUP CO., LTD.

H10K50/844H10K59/122H10K59/124H10K71/00H10K71/233H10K59/1201

Abstract

Claims (56)

1. A display substrate having an active area and a frame area located at at least one side of the active area, the display substrate comprising:

a substrate;

pixel units disposed on the substrate and located in the active area;

an isolation column located in the active area;

a pixel defining layer located in the active area;

a planarization layer covering at least the active area;

a plurality of light-emitting devices arranged in an array in the active area;

at least one blocking dam disposed on the substrate and located in the frame area, at least one groove being provided on a surface of the at least one blocking dam facing away from the substrate;

a depth direction of the at least one groove being perpendicular to the substrate, and an extending direction of the at least one groove being substantially the same as an extending direction of the at least one blocking dam provided with the at least one groove;

a conductive pattern located in the frame area; and

a first encapsulation layer covering the at least one blocking dam;

wherein the plurality of light-emitting devices are located between the first encapsulation layer and the substrate, each light-emitting device includes a first electrode, a light-emitting functional layer and a second electrode that are sequentially stacked on the planarization layer, and the light-emitting functional layer of each light-emitting device is located in an opening of the pixel defining layer; and

the conductive pattern and the first electrode of each light-emitting device are disposed in the same layer and have the same material, and an edge of an orthogonal projection of the conductive pattern on the substrate away from the active area is located within a range of an orthogonal projection of the at least one blocking dam on the substrate;

wherein the at least one blocking dam provided with the at least one groove includes a second pattern layer and a first pattern layer that are sequentially stacked on the substrate, a material of the first pattern layer is different from a material of the second pattern layer, and the at least one groove is located in the first pattern layer;

the isolation column and the first pattern layer being formed by patterning the same film layer; and

the pixel defining layer and the second pattern layer being formed by patterning the same film layer;

wherein the at least one blocking dam further includes a third pattern layer between the second pattern layer and the substrate, and the planarization layer and the third pattern layer are formed by patterning the same film layer; and

an orthogonal projection of the conductive pattern on the substrate is overlapped with an orthogonal projection of the third pattern layer on the substrate, and is not overlapped with orthogonal projections of the second pattern layer and the first pattern layer on the substrate.

2. The display substrate according to claim 1 , wherein a portion of the first encapsulation layer covering the at least one groove is conformal to the at least one groove.

3. The display substrate according to claim 1 , wherein

the at least one blocking dam includes at least two blocking dams, and the at least two blocking dams surround the active area and are sequentially arranged from inside to outside; and

the at least one groove is arranged to surround the active area, and an orthogonal projection of the at least one groove on the substrate is in a closed shape.

4. The display substrate according to claim 3 , wherein

in a direction from a center to an edge of the display substrate, heights of the at least two blocking dams successively increase.

5. The display substrate according to claim 1 , wherein

at least two grooves surrounding the active area are provided in the at least one blocking dam provided with the at least one groove, and the at least two grooves are sequentially arranged from inside to outside.

6. The display substrate according to claim 1 , wherein

a plurality of protruding portions are provided in the at least one groove; and in an extending direction of the at least one groove, the plurality of protruding portions are sequentially arranged at intervals.

7. The display substrate according to claim 6 , wherein

the plurality of protruding portions and a portion of the at least one blocking dam away from the substrate are formed by patterning the same film layer.

8. The display substrate according to claim 6 , wherein

a shape of an orthogonal projection of the plurality of protruding portions on the substrate is at least one of a triangle, a rectangle, a polygon or a circle.

9. The display substrate according to claim 1 , further comprising:

a second encapsulation layer located above a side of the first encapsulation layer away from the substrate, the second encapsulation layer covering the active area and the at least one blocking dam;

a third encapsulation layer located between the first encapsulation layer and the second encapsulation layer, the third encapsulation layer covering at least the active area, wherein

an edge of an orthogonal projection of the at least one blocking dam on the substrate away from the active area is located outside an orthogonal projection of the third encapsulation layer on the substrate.

10. A display device, comprising the display substrate according to claim 1 .

11. A manufacturing method for a display substrate, comprising:

providing a substrate having an active area and a frame area located at at least one side of the active area;

forming at least one blocking dam on the substrate and in the frame area, and forming at least one groove on a surface of the at least one blocking dam facing away from the substrate, wherein a depth direction of the at least one groove is perpendicular to the substrate, and an extending direction of the at least one groove is substantially the same as an extending direction of the at least one blocking dam provided with the at least one groove; and

forming a first encapsulation layer on the substrate to cover the active area and the at least one blocking dam;

wherein the at least one blocking dam includes a second pattern layer and a first pattern layer that are sequentially stacked on the substrate, a material of the first pattern layer is different from a material of the second pattern layer, and the at least one groove is formed in the first pattern layer; forming the at least one blocking dam includes:

sequentially depositing a second material layer and a first material layer on the substrate to form stacked layers; and

simultaneously patterning the first material layer and the second material layer by using a halftone mask, wherein

a portion of the first material layer located in the active area is formed into an isolation column, and a portion of the first material layer located in the frame area is formed into the first pattern layer; a portion of the second material layer located in the active area is formed into a pixel defining layer, and a portion of the second material layer located in the frame area is formed into the second pattern layer;

wherein the at least one blocking dam further includes a third pattern layer between the second pattern layer and the substrate; forming the at least one blocking dam further includes:

depositing an insulating material film on the substrate to planarize a surface of the substrate; and

patterning the insulating material film, wherein

a portion of the insulating material film located in the active area is formed into a planarization layer, and a portion of the insulating material film outside the active area is formed into the third pattern layer;

after forming the planarization layer, the method further comprising:

depositing a conductive material layer on the planarization layer;

patterning the conductive material layer, wherein a portion of the conductive material layer located in the active area is formed into a first electrode, a portion of the conductive material layer located in the frame area is formed into a conductive pattern, and an edge of an orthogonal projection of the conductive pattern on the substrate away from the active area is located within a range of an orthogonal projection of the at least one blocking dam on the substrate; the orthogonal projection of the conductive pattern on the substrate is overlapped with an orthogonal projection of the third pattern layer on the substrate, and is not overlapped with orthogonal projections of the second pattern layer and the first pattern layer on the substrate; and

forming a light-emitting functional layer and a second electrodes sequentially, wherein the light-emitting functional layer is located in an opening of the pixel defining layer, the first electrode, the light-emitting functional layer and the second electrode that are sequentially stacked on the substrate constitute a light-emitting device of a plurality of light emitting devices, and the plurality of light-emitting devices are arranged in an array in the active area and located between the first encapsulation layer and the substrate.

12. The method according to claim 11 , after forming the first encapsulation layer, the method further comprising:

coating a liquid including an organic material on a portion of the first encapsulation layer located in the active area; and

drying and solidifying the liquid to form a third encapsulation layer.

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (24)