Electrostatic chuck with mesas
Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically over an edge of one of the one or more electrodes.
1. A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region;
one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
2. The substrate support assembly of claim 1 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.
3. The substrate support assembly of claim 1 , wherein the ceramic top plate comprises aluminum nitride.
4. The substrate support assembly of claim 1 , wherein the ceramic top plate comprises aluminum oxide.
5. The substrate support assembly of claim 1 , wherein the one or more electrodes comprise molybdenum.
6. A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region;
a molybdenum mesh within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over the molybdenum mesh.
7. The substrate support assembly of claim 6 , wherein the ceramic top plate comprises aluminum nitride.
8. The substrate support assembly of claim 6 , wherein the ceramic top plate comprises aluminum oxide.
9. A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region, the top surface having one or more high topography regions and one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
10. The substrate support assembly of claim 9 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.
11. The substrate support assembly of claim 9 , wherein the ceramic top plate comprises aluminum nitride.
12. The substrate support assembly of claim 9 , wherein the ceramic top plate comprises aluminum oxide.
13. The substrate support assembly of claim 9 , further comprising one or more electrodes comprising molybdenum.
14. A substrate support assembly, comprising:
a ceramic top plate having a top surface with a processing region, the top surface having one or more stress regions;
one or more electrodes within the ceramic top plate; and
a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
15. The substrate support assembly of claim 14 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate.
16. The substrate support assembly of claim 14 , wherein the ceramic top plate comprises aluminum nitride.
17. The substrate support assembly of claim 14 , wherein the ceramic top plate comprises aluminum oxide.
18. The substrate support assembly of claim 14 , further comprising one or more electrodes comprising molybdenum.