Semitransparent thin-film solar module
A thin-film solar module with a substrate and a layer structure applied thereon that comprises a rear electrode layer, a front electrode layer, and an absorber layer arranged between the back electrode layer and the front electrode layer. Serially connected solar cells are formed in the layer structure by patterning zones, wherein each patterning zone comprises a first patterning line for subdividing at least the rear electrode layer, a second patterning line for subdividing at least the absorber layer, and at least one third patterning line for subdividing at least the front electrode layer. At least one patterning zone has one or more optically transparent zones in a zone region reduced by the first patterning line, which are in each case rear-electrode-layer-free, wherein the one or more optically transparent zones are implemented such that the rear electrode layer is continuous in the zone region.
1. A method for producing a thin-film solar module, comprising:
providing a substrate, wherein the substrate is flat;
depositing a rear electrode layer on one side of the substrate;
depositing an absorber layer over the rear electrode layer;
depositing a front electrode layer over the absorber layer;
patterning the rear electrode layer by first patterning lines;
patterning the absorber layer by second patterning lines;
patterning the front electrode layer by third patterning lines, wherein a patterning zone is formed by an immediate sequence of a first patterning line, a second patterning line, and a third patterning line, and the patterning zone form a monolithic serial connection circuit of solar cells;
forming one or more rear-electrode-layer-free optically transparent zones by section-wise removal of at least the rear electrode layer in a reduced zone region reduced by the first patterning line of at least one patterning zone, causing the rear electrode layer to be continuous in the reduced zone region;
depositing a buffer layer over the absorber layer; and
patterning the buffer layer by fourth patterning lines,
wherein the one or more optically transparent zones is filled by material of the buffer layer, and
wherein the buffer layer is in direct contact with the rear electrode layer.
2. The method for producing the thin-film solar module according to claim 1 , wherein
at least one linear decoating region is formed in the reduced zone region, by which decoating region reduced the zone region is subdivided into two zone region portions,
the decoating region has an alternating sequence of at least two optically transparent zones and at least one electrode zone,
each electrode zone is absorber-layer-free, has a rear electrode layer section and is formed by section-wise removal at least of the absorber layer, and
the rear electrode layer section areally connects two rear electrode layer sections of the zone region portions to one another.
3. The method for producing the thin-film solar module according to claim 1 , further comprising forming the optically transparent zones by section-wise removal of at least the rear electrode layer prior to depositing the absorber layer.
4. The method for producing the thin-film solar module according to claim 3 , wherein the section-wise removal of at least the rear electrode layer prior to depositing the absorber layer comprises an irradiation with a laser beam.
5. The method for producing the thin-film solar module according to claim 3 , further comprising:
forming electrode zones and edge zones surrounding the optically transparent zones, after depositing the absorber layer and front electrode layer, and after forming the third patterning lines, by section-wise removal of at least the absorber layer and the front electrode layer.
6. The method for producing the thin-film solar module according to claim 5 , wherein the section-wise removal of at least the absorber layer and the front electrode layer comprises a mechanical material removal.
7. The method for producing the thin-film solar module according to claim 5 , wherein the optically transparent zones surrounded by edge zones are formed by:
section-wise removal of at least the absorber layer in processing zones that correspond to an optically transparent zone to be formed, and the optically transparent zone is formed in an inner region and surrounding edge zones are formed in edge regions of the processing zone, and removal of at least the rear electrode layer in the inner region of the processing zones for forming the optically transparent zones.