IP Library › Granted Patent US 12,227,463
Granted Patent B2
US 12,227,463 · App. 17/314,448 · Granted Feb 18, 2025

Environmental barrier coating and method of forming the same

Inventors: James T. Beals (West Hartford, CT); Richard Wesley Jackson (Mystic, CT); Xia Tang (West Hartford, CT)
Assignee: RTX CORPORATION
C04B41/4539C04B41/0072C04B41/455C04B41/5071C04B41/52C04B2235/3891C04B2235/428C04B2235/5292
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Quick Facts
Patent No.
US 12,227,463
App. No.
17/314,448
Granted
Feb 18, 2025
Kind
B2
Abstract

A method of applying a coating to a substrate includes forming a slurry by mixing elemental precursors of gettering particles, diffusive particles, matrix material, and a carrier fluid; applying the slurry to a substrate; and sintering the slurry to form a composite material. The sintering causes the elemental precursors to react with one another to form gettering particles. An article is also disclosed.

Claims (17)

1. A method of applying a coating to a substrate, comprising:

forming a slurry by mixing elemental precursors of gettering particles, diffusive particles, matrix material, and a carrier fluid;

applying the slurry to a substrate; and

sintering the slurry to form a composite material, whereby the sintering causes the elemental precursors to react with one another to form gettering particles.

2. The method of claim 1 , wherein the elemental precursors include silicon and the gettering particles are intermetallic silicides.

3. The method of claim 2 , wherein the elemental precursors include silicon and a refractory metal.

4. The method of claim 1 , further comprising the step of applying a topcoat.

5. The method of claim 4 , wherein the step of applying the topcoat is performed before the step of sintering the slurry.

6. The method of claim 1 , wherein the sintering is performed at a temperature between about 1000° C. and 1400° C. in an inert atmosphere.

7. The method of claim 1 , further comprising the step of subjecting the slurry to a low-heat treatment prior to the sintering step, and wherein sintering step is performed at a first temperature, and the low-heat treatment is performed at a second temperature lower than the first temperature.

8. The method of claim 1 , wherein after the mixing step, the elemental precursors are embedded in one another.

9. The method of claim 1 , wherein after the applying step, the elemental precursors are in an interconnected matrix.

10. The method of claim 1 , wherein after the sintering step, the gettering particles have a platelet shape.

11. The method of claim 10 , where the gettering particles have a major axis that is generally parallel to a surface of the substrate.

12. The method of claim 11 , wherein after the sintering step, the gettering particles are arranged in an interconnected matrix.

13. The method of claim 1 , wherein the slurry is aqueous.

14. The method of claim 1 , wherein the substrate is a ceramic matrix composite material.

Assignments (2)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064402/0837 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 24, 2021
From: BEALS, JAMES T.; JACKSON, RICHARD WESLEY; TANG, XIA
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 056650/0352 →
Continuity (1)
Related Publication 20240002300A1 · Jan 4, 2024
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