Granted Patent B2

US 12,238,967 · App. 18/583,853 · Granted Feb 25, 2025

Inventor: Chungi You (Yongin-si, KR)

Assignee: Samsung Display Co., Ltd.

H10K59/121H10K50/844H10K59/131H10K59/40H10K59/65H10K71/00H10K77/10H10K59/1201

Abstract

Claims (41)

1. A method of manufacturing a display device, the method comprising:

preparing a display substrate comprising a substrate and a first insulating layer on the substrate, the substrate comprising a non-display area and a display area;

forming, on the first insulating layer, a conductive pattern comprising a first layer and a second layer;

forming, in the non-display area, a pattern layer comprising a lower pattern layer and an upper pattern layer;

forming a conductive layer on the pattern layer and the display area;

patterning the conductive layer to form a first electrode; and

removing the upper pattern layer,

wherein the lower pattern layer and the first layer include a same material, and

wherein the upper pattern layer and the second layer include a same material.

2. The method of claim 1 , further comprising:

forming a second electrode and at least one of a first functional layer or a second functional layer, on the lower pattern layer and the first electrode; and

removing the second electrode and at least one of the first functional layer or the second functional layer on the lower pattern layer.

3. The method of claim 2 , wherein the removing of the second electrode and at least one of the first functional layer or the second functional layer comprises:

forming, in at least one of the first functional layer or the second functional layer, a first transmission hole exposing a portion of an upper surface of the first insulating layer; and

forming, in the second electrode, a second transmission hole exposing the portion of the upper surface of the first insulating layer.

4. The method of claim 2 , wherein the removing of the second electrode and at least one of the first functional layer or the second functional layer comprises:

irradiating laser light on the lower pattern layer; and

removing the lower pattern layer.

5. The method of claim 2 , wherein the removing of the second electrode and at least one of the first functional layer or the second functional layer comprises:

irradiating laser light on the lower pattern layer; and

exposing an upper surface of the lower pattern layer.

6. The method of claim 1 , further comprising:

forming, on the first insulating layer, a middle conductive pattern overlapping the non-display area;

forming, on the middle conductive pattern, a second electrode and at least one of a first functional layer or a second functional layer; and

removing the second electrode on the middle conductive pattern to expose an upper surface of at least one of the first functional layer or the second functional layer,

wherein the middle conductive pattern and the lower pattern layer include a same material.

7. The method of claim 1 , further comprising:

forming a second insulating layer covering the conductive pattern and the pattern layer;

forming, in the second insulating layer, a second opening exposing the pattern layer; and

forming, in the first insulating layer, a first recess or a first opening connected to the second opening.

8. The method of claim 7 , further comprising forming a middle insulating layer on the first insulating layer,

wherein the pattern layer and the conductive pattern are formed on the middle insulating layer, and

wherein the forming of the second opening comprises forming a middle opening in the middle insulating layer.

9. The method of claim 7 , further comprising forming a middle insulating layer on the first insulating layer,

wherein the forming of the second opening comprises:

forming a middle opening in the middle insulating layer; and

exposing the pattern layer through the middle opening.

10. The method of claim 7 , wherein the substrate further comprises a bending area, and

the method further comprises:

forming a photoresist layer having a photoresist opening exposing the bending area, the photoresist layer covering the second opening; and

etching the first insulating layer and the second insulating layer overlapping the photoresist opening.

Assignments (1)

Priority Claims (1)

Continuity (2)

References Cited (14)