Gas curtain for semiconductor manufacturing system
View Patent ↗The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber, a slit valve configured to provide access to the chamber, a chuck disposed in the chamber and configured to hold a substrate, and a gas curtain device disposed between the chuck and the slit valve and configured to flow an inert gas to form a gas curtain. An example benefit of the gas curtain is to block an inflow of oxygen or moisture from entering the chamber to ensure a yield and reliability of the semiconductor manufacturing processes conducted in the chamber.
1. An apparatus, comprising:
a processing chamber;
a slit valve configured to provide access to the processing chamber;
a chuck disposed in the processing chamber and configured to hold as substrate; and
a gas curtain device disposed between the chuck and the slit valve and configured to form a directional inert gas stream flowing towards the slit valve, wherein a ratio of a distance between the slit valve and the gas curtain device and a distance between the slit valve and a rear sidewall of the processing chamber is between about 0.02 and about 1.
2. The apparatus of claim 1 , wherein the gas curtain device comprises:
a gas hole formed through a sidewall of the processing chamber; and
a gas conduit comprising an outlet and connected to the gas hole, wherein the outlet tilts towards the slit valve.
3. The apparatus of claim 1 , further comprising:
a gas outlet port formed through a rear sidewall of the processing chamber and configured to vent the processing chamber; and
an other gas curtain device disposed between the chuck and the gas outlet port.
4. The apparatus of claim 3 , wherein the gas curtain device is further configured to increase a strength of the directional inert gas stream by reducing a gas extraction flow rate associated with the gas outlet port.
5. The apparatus of claim 3 , wherein the gas curtain device is further configured to increase a strength of the directional inert gas stream by closing the gas outlet port.
6. The apparatus of claim 1 , further comprising a gas detector configured to detect an oxygen trace or a moisture trace in the processing chamber.
7. The apparatus of claim 1 , wherein the gas curtain device is further configured to form the directional inert gas stream flowing from a bottom portion of the processing chamber towards a top portion of the processing chamber.
8. An apparatus, comprising:
a processing chamber comprising a chuck;
a slit valve configured to provide access to the processing chamber;
a transfer module configured to transfer a substrate to the processing chamber via the slit valve; and
a gas curtain device disposed between the chuck and the slit valve and configured to form a directional inert gas stream flowing towards the slit valve to block a gas flow from the transfer module towards the processing chamber, wherein a ratio of a distance between the slit valve and the gas curtain device and a distance between the slit valve and a rear sidewall of the processing chamber is between about 0.02 and about 1.
9. The apparatus of claim 8 , wherein the processing chamber is configured to receive a process gas and perform an annealing process with the process gas on the substrate.
10. The apparatus of claim 8 , wherein the slit valve is further configured to purge a gas stream from the processing chamber towards the transfer module when the slit valve is at an open position.
11. The apparatus of claim 10 , wherein the slit valve is further configured to purge the gas stream from the processing chamber towards the transfer module at a flow rate greater than or equal to about 1.0 slm.
12. The apparatus of claim 8 , further comprising a gas detector configured to detect a residue gas characteristic in the processing chamber, wherein the gas curtain device is further configured to adjust a strength of the directional inert gas stream based on a comparison of the residue gas characteristic to a baseline requirement.
13. An apparatus, comprising:
a processing chamber comprising a chuck;
a transfer module configured to transfer a substrate to the processing chamber via a slit valve disposed between the transfer module and the processing chamber;
a gas detector configured to detect a residue gas characteristic in the processing chamber; and
a gas curtain device disposed between the chuck and the slit configured to form a gas curtain by flowing a gas towards the slit valve, and adjust a strength of the gas curtain based on a comparison of the residue gas characteristic to a baseline requirement, wherein a ratio of a distance between the slit valve and the gas curtain device and a distance between the slit valve and a rear sidewall of the processing chamber is between about 0.02 and about 1.
14. The apparatus of claim 13 , wherein the gas detector is further configured to detect the residue gas characteristic by measuring a concentration of oxygen or moisture in the processing chamber.
15. The apparatus of claim 13 , wherein the gas curtain device is further configured to adjust the strength of the gas curtain by increasing a flow rate associated with the gas curtain.
16. The apparatus of claim 13 , further comprising an other gas curtain device disposed between the chuck and a gas outlet port and configured to form another gas curtain by flowing the gas towards the chuck.
17. The apparatus of claim 8 , wherein the gas curtain device comprises a gas conduit with an outlet that tilts towards the slit valve.
18. The apparatus of claim 13 , wherein the gas curtain device comprises:
a first gas conduit disposed between a first end of the chuck and the slit valve, wherein the first gas conduit comprises a first outlet that tilts towards the slit valve;
a gas outlet port disposed on an end of the processing chamber opposite to that of the slit valve; and
a second gas conduit disposed between a second end of the chuck and the gas outlet port, wherein the second gas conduit comprises a second outlet that tilts towards the slit valve, and wherein the second end is opposite to the first end of the chuck.
19. The apparatus of claim 2 , wherein an opening of the gas conduit is greater than or equal to about 3 mm.
20. The apparatus of claim 8 , wherein the gas curtain device comprises a gas conduit with an opening greater than or equal to about 3 mm.