IP Library › Granted Patent US 12,251,823
Granted Patent B2
US 12,251,823 · App. 18/205,292 · Granted Mar 18, 2025

Robotic devices and methods for fabrication, use and control of same

Inventors: Xiaodong Lu (Vancouver, CA); Peter Tang (Hamilton, CA); Alexander H. Slocum (Bow, NH); Rui Chen (Vancouver, CA)
Assignee: Planar Motor Incorporated
B25J15/065B25J9/0036B25J15/0246B65G1/0435H02K41/031H02P25/064H02K1/26H02K2201/18
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,251,823
App. No.
18/205,292
Granted
Mar 18, 2025
Kind
B2
Abstract

Various embodiments relate to magnetically moveable displacement devices or robotic devices. Particular embodiments provide systems and corresponding methods for magnetically moving multiple movable robots relative to one or more working surfaces of respective one or more work bodies, and for moving robots between the one or more work bodies via transfer devices. Robots can carry one or more objects among different locations, manipulate carried objects, and/or interact with their surroundings for particular functionality including but not limited to assembly, packaging, inspection, 3D printing, test, laboratory automation, etc. A mechanical link may be mounted on planar motion units such as said robots.

Claims (65)

1. An apparatus for moving one or more magnetically moveable devices, the apparatus comprising:

a work body comprising a plurality of electrically conductive coils and a work surface upon which the one or more magnetically moveable devices are configured to be controllably moved within at least two degrees of freedom, wherein the one or more magnetically moveable devices and the plurality of electrically conductive coils are on opposite sides of the work surface;

one or more controllers configured to controllably move the one or more magnetically moveable devices over the work surface by driving one or more currents through at least one of the plurality of electrically conductive coils so as to modulate one or more magnetic fields and thereby controllably and magnetically levitate the one or more magnetically moveable devices; and

one or more obstacles,

wherein the one or more controllers are further configured to:

generate, based on one or more positions of the one or more obstacles, one or more trajectories; and

controllably move the one or more magnetically moveable devices according to the one or more trajectories so as to avoid the one or more obstacles.

2. The apparatus of claim 1 , wherein the one or more controllers are further configured to:

controllably move the one or more magnetically moveable devices according to the one or more trajectories so as to move the one or more magnetically moveable devices around the one or more obstacles.

3. The apparatus of claim 1 , wherein the at least two degrees of freedom include a degree of freedom along a z-axis perpendicular to the work surface and a degree of freedom along an x-axis or a y-axis parallel to the work surface.

4. The apparatus of claim 1 , wherein:

the work surface comprises work cells and one or more routing regions connecting the work cells; and

the one or more controllers are further configured to move at least one of the one or more magnetically moveable devices from at least one of the work cells to at least another one of the work cells, via at least one of the one or more routing regions.

5. The apparatus of claim 4 , wherein each work cell is configurable between an activated state and a deactivated state, and wherein the one or more controllers are further configured to:

prevent movement of at least one of the one or more magnetically moveable devices from at least one of the one or more routing regions and into any work cell that is in the activated state.

6. The apparatus of claim 5 , wherein the one or more obstacles comprise at least one work cell that is in the activated state.

7. The apparatus of claim 1 , wherein the one or more obstacles comprise a two-dimensional area of the work surface that is configurable between:

an activated state, wherein when in the activated state the one or more magnetically moveable devices are not allowed or are otherwise unable to move into or within the two-dimensional area; and

a deactivated state, wherein when in the deactivated state the one or more magnetically moveable devices are allowed or are otherwise able to move into or within the two-dimensional area.

8. The apparatus of claim 1 , wherein the one or more obstacles include at least one obstacle whose position is fixed relative to the work surface.

9. The apparatus of claim 1 , wherein the one or more obstacles include at least one obstacle whose position relative to the work surface is dynamically configurable.

10. The apparatus of claim 1 , further comprising a buffer system for temporarily storing at least one of the one or more magnetically moveable devices that is temporarily not needed on the work surface.

11. The apparatus of claim 1 , wherein the one or more controllers comprise:

one or more high-level control modules for generating the one or more trajectories; and

one or more low-level control modules for controllably moving the one or more magnetically moveable devices along the one or more trajectories.

12. The apparatus of claim 4 , wherein:

the one or more trajectories comprise one or more routing region trajectories and one or more work cell trajectories; and

the one or more controllers comprise:

one or more high-level control modules for generating the one or more routing region trajectories;

one or more work cell control modules for generating the one or more work cell trajectories; and

one or more low-level control modules for:

controllably moving, within the one or more routing regions, at least one of the one or more magnetically moveable devices along the one or more routing region trajectories; and

controllably moving, within the one or more work cells, at least one of the one or more magnetically moveable devices along the one or more work cell trajectories.

13. The apparatus of claim 4 , wherein the work surface comprises one or more queuing regions associated with at least one work cell of the work cells, and wherein the one or more controllers are further configured to:

determine that at least one magnetically moveable device in the at least one work cell has not completed their work; and

in response thereto, move at least one other magnetically moveable device to the queuing region.

14. The apparatus of claim 1 , wherein the one or more controllers are further configured to:

determine a temperature associated with one or more areas of the work surface; and

generate the one or more trajectories based on the determined temperature.

15. The apparatus of claim 1 , wherein the one or more controllers are further configured to:

determine a load carried by at least one magnetically moveable device; and

generate the one or more trajectories based on the determined load.

16. The apparatus of claim 1 , wherein the one or more controllers are further configured to:

determine an error in a position of at least one magnetically moveable device; and

adjust one or more of a speed and an acceleration of the at least one magnetically moveable device based on the determined error.

17. The apparatus of claim 1 , wherein the one or more magnetically moveable devices comprise multiple magnetically moveable device, and wherein the one or more controllers are further configured to:

determine, based on their respective trajectories generated by the one or more controllers, a likelihood of a collision between any two or more of the magnetically moveable devices; and

adjust, based on the determined likelihood, one or more of a speed and an acceleration of the two or more of the magnetically moveable devices.

18. The apparatus of claim 1 , wherein the one or more obstacles comprise a door separating a first area of the work surface from a second area of the work surface, and wherein the one or more controllers are further configured to:

determine that the door is open; and

after determining that the door is open, move a magnetically moveable device from the first area to the second area through the open door.

19. The apparatus of claim 18 , wherein the door separating the first area of the work surface from the second area of the work surface is a first door, wherein the one or more obstacles further comprise a second door separating the second area from a third area of the work surface, and wherein the one or more controllers are further configured to:

after moving the mover from the first area to the second area, determine that the first door is closed and that the second door is closed;

after determining that the first door is closed and that the second door is closed, determine that the second door has been opened; and

after determining that the second door has been opened, move the mover from the second area to the third area.

20. The apparatus of claim 1 , wherein the one or more obstacles comprise:

one or more doors separating one or more first areas of the work surface from one or more second areas of the work surface; and

at least one of the one or more first areas or the one or more second areas, wherein the at least one of the one or more first areas or the one or more second areas is a two-dimensional area of the work surface that is configurable between:

an activated state, wherein when in the activated state the one or more magnetically moveable devices are not allowed or are otherwise unable to move into or within the two-dimensional area; and

a deactivated state, wherein when in the deactivated state the one or more magnetically moveable devices are allowed or are otherwise able to move into or within the two-dimensional area.

21. The apparatus of claim 1 , wherein:

the one or more obstacles comprise one or more doors separating an isolator region from a region external to the isolator region; and

an environment within the region external to the isolator region is different from an environment within the isolator region.

22. The apparatus of claim 21 , wherein the environment external to the isolator region is an ambient environment, and wherein the environment within the isolator region comprises one or more of the following environments: high pressure, high temperature, low temperature, chemically reactive, corrosive, toxic, water-free, oxygen-free, pure nitrogen, inert gas, and polluted.

23. The apparatus of claim 21 , wherein the environment external to the isolator region is an ambient environment, and wherein the environment within the isolator region comprises a clean environment or a vacuum.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2023
From: LU, XIAODONG; TANG, PETER; SLOCUM, ALEXANDER H.; CHEN, RIU
To: PLANAR MOTOR INCORPORATED
Reel/Frame 063844/0231 →
Continuity (9)
Continuation 17157683 · Jan 25, 2021
Continuation 16498197
Provisional Application 62626082 · Feb 4, 2018
Provisional Application 62590323 · Nov 23, 2017
Provisional Application 62513975 · Jun 1, 2017
Provisional Application 62490270 · Apr 26, 2017
Provisional Application 62485402 · Apr 14, 2017
Provisional Application 62476871 · Mar 27, 2017
Related Publication 20230302663A1 · Sep 28, 2023
References Cited (76)
US 3376578A · Sawyer · 1968 [cited by applicant]
US 4535278A · Asakawa · 1985 [cited by applicant]
US 4654571A · Hinds · 1987 [cited by applicant]
US 5334892A · Chitayat · 1994 [cited by applicant]
US 6003230A · Trumper et al. · 1999 [cited by applicant]
US 6005309A · Chitayat · 1999 [cited by applicant]
US 6069418A · Tanaka · 2000 [cited by applicant]
US 6097114A · Hazelton · 2000 [cited by applicant]
US 6208045B1 · Hazelton et al. · 2001 [cited by applicant]
US 6252234B1 · Hazelton et al. · 2001 [cited by applicant]
US 6304320B1 · Tanaka et al. · 2001 [cited by applicant]
US 6339266B1 · Tanaka · 2002 [cited by applicant]
US 6441514B1 · Markle · 2002 [cited by applicant]
US 6445093B1 · Binnard · 2002 [cited by applicant]
US 6452292B1 · Binnard · 2002 [cited by applicant]
US 6495934B1 · Hayashi et al. · 2002 [cited by applicant]
US 6720680B1 · Tanaka · 2004 [cited by applicant]
US 6777896B2 · Teng · 2004 [cited by applicant]
US 6835941B1 · Tanaka · 2004 [cited by applicant]
US 6847134B2 · Frissen et al. · 2005 [cited by applicant]
US 6885430B2 · Tanaka et al. · 2005 [cited by applicant]
US 6987335B2 · Korenaga · 2006 [cited by applicant]
US 7075198B2 · Korenaga · 2006 [cited by applicant]
US 7224252B2 · Meadow, Jr. et al. · 2007 [cited by applicant]
US 7227284B2 · Korenaga · 2007 [cited by applicant]
US 7436135B2 · Miyakawa · 2008 [cited by applicant]
US 7696653B2 · Tanaka · 2010 [cited by applicant]
US 7808133B1 · Widdowson et al. · 2010 [cited by applicant]
US 7948122B2 · Compter et al. · 2011 [cited by applicant]
US 8031328B2 · Asano et al. · 2011 [cited by applicant]
US 9202719B2 · Lu et al. · 2015 [cited by applicant]
US 10214365B2 · Wipf et al. · 2019 [cited by applicant]
US 10763733B2 · Lu · 2020 [cited by examiner]
US 20040140780A1 · Cahill et al. · 2004 [cited by applicant]
US 20080203828A1 · Compter et al. · 2008 [cited by applicant]
US 20140285122A1 · Lu et al. · 2014 [cited by applicant]
US 20170179806A1 · Lu · 2017 [cited by applicant]
US 20170198728A1 · Noda · 2017 [cited by examiner]
DE 102008008602A1 · 2008 [cited by applicant]
EP 0446378A1 · 1991 [cited by applicant]
JP 2016160040A · 2016 [cited by applicant]
WO 2013059934A1 · 2013 [cited by applicant]
WO 2014055335A1 · 2014 [cited by applicant]
WO 2015017933A1 · 2015 [cited by applicant]
WO 2015179962A1 · 2015 [cited by applicant]
WO 2015184553A1 · 2015 [cited by applicant]
WO 2015188281A1 · 2015 [cited by applicant]
WO 2017121127A1 · 2017 [cited by applicant]
WO 2017142481A1 · 2017 [cited by applicant]
W.J. Kim and D.L. Trumper, High-precision magnetic levitation stage for photolithography. Precision Eng. 22 2 (1998), pp. 66-77. [cited by applicant]
D.L. Trumper, et al., “Magnet arrays for synchronous machines”, IEEE Industry Applications Society Annual Meeting, vol. 1, pp. 9-18, 1993. [cited by applicant]
J.W. Jansen, C.M.M. van Lierop, E.A. Lomonova, A.J.A. Vandenput, “Magnetically Levitated Planar Actuator with Moving Magnets”, IEEE Tran. Ind. App., vol. 44, No. 4, 2008. [cited by applicant]
Cho, H.S., Im, C.H., Jung, H.K., 2001, Magnetic Field Analysis of 2-D Permanent Magnet Array for Planar Motor, IEEE Tran. On Magnetics, vol. 37 No. 5, pp. 3762-3766. [cited by applicant]
Filho, A.F.F., 2001, Investigation of the Forces Produced by a New Electromagnetic Planar Actuator, Electric Machines and Drives Conference, 2001. IEMDC 2001. IEEE International, pp. 8-13. [cited by applicant]
Filho, A.F., 2010, Analysis of a DC XY-Actuator, XIX International Conference on Electrical Machines—ICEM 2010, Rome. [cited by applicant]
Filho, A.F., 1999, Development of a novel planar actuator, Ninth International Conference on Electrical Machines and Drives, Conference Publication No. 468. [cited by applicant]
Fujii, N., Okinaga, K., 2002, X-Y Linear Synchronous Motors Without Force Ripple and Core Loss for Precision Two-Dimensional Drives, IEEE Transactions On Magnetics, vol. 38, No. 5, Sep. 2002. [cited by applicant]
Buckley, J.D., Galburt, D.N., Karatzas, C., 1989, Step-and-scan lithography using reduction optics, J. Vae. Sci. Technol. B 7 (6), Nov./Dec. 1989. [cited by applicant]
Hesse, S., Schaeffel, C., Katzschmann, M., 2011, Interferometric Controlled Planar Nanopositioning System With 100 MM Circular Travel Range, ASPE 2011 Annual Meeting, Denver, Co. [cited by applicant]
Tomita, Y., Koyanagawa, Y., 1995, Study on a surface-motor driven precise positioning system, Journal of Dynamic Systems, Measurement, and Control Sep. 1995, vol. 117/311-319. [cited by applicant]
Ueda, Y., Ohsaki, H., 2008, A planar actuator with a small mover traveling over large yaw and translational dispalcements, IEEE Transactions On Magnetics, vol. 44, No. 5, May 2008. [cited by applicant]
Kajiyama, H., Suzuki, K., Dohmeki, H., 2010, Development of ironless type surface motor, XIX International Conference on Electrical Machines—ICEM 2010, Rome. [cited by applicant]
Shinno, H., Yoshioka, H., Taniguchi, K., 2007, A Newly Developed Linear Motor-Driven Aerostatic X-Y Planar Motion Table System for Nano-Machining, Annals of the CIRP, 56/1:369-372. [cited by applicant]
Gao, W., Dejima, S., Yanai, H., Katakura, K., Kiyono, S., Tomita, Y., 2004, A surface motor-driven planar motion stage Integrated with an XYOZ surface encoder for precision positioning, Precision Engineering, 28/3:329-3… [cited by applicant]
In, W., Lee, S., Jeong, J., Kim, J., 2008, Design of a planar-type high speed parallel mechanism positioning platform with the capability of 180 degrees orientation, Annals of the CIRP 57/1:421-424. [cited by applicant]
Lee, K., Roth, R., Zhou, J., 1996, Dynamic Modeling and Control of a Ball-Joint-Like Variable-Reluctance Spherical Motor, Journal of Dynamic Systems, Measurement, and Control, 118/1:29-40. [cited by applicant]
Weck, M., Reinartz, T., Henneberger, G., Doncker, R., 2000, Design of a Spherical Motor with Three Degrees of Freedom, Annals of the CIRP, 49/1:289-294. [cited by applicant]
Hollis, R., Salcudean, S., Allan, A., 1991, A six-degree-of-freedom magnetically levitated variable compliance fine-motion wrist: Design, modeling, control, IEEE Trans. Robot. Automat, 7/3:320-332. [cited by applicant]
Verma, S., Kim, W., Gu, J., 2004, Six-axis nanopositioning device with precision magnetic levitation technology, IEEE Tran. On Mechatronics 9/2 384-391. [cited by applicant]
Holmes, M., Hocken, R., Trumper, D., 2000, The Long-Range Scanning Stage: a Novel Platform for Scanned-Probe Microscopy, Precision Engineering, 24/3:191-209. [cited by applicant]
Etxaniz, I., Izpizua, A., SanMartin, M., Arana, J., 2006, Magnetic Levitated 2D Fast Drive, IEEJ Transactions on Industry Applications, 126/12:1678-1681. [cited by applicant]
Compter, J., 2003, Electro-dynamic planar motor, Precision Engineering, 28/2: 171-180. [cited by applicant]
Jansen, J., van Lierop, C., Lomonova, E., Vandenput, A., 2007, Modeling of magnetically levitated planar actuators with moving magnets, IEEE Tran. Magnetic, 43/1:15-25. [cited by applicant]
B&R Industrial Automation; “ACOPOStrak: Track design flexibility [sub: EN, DA, JA]” Feb. 27, 2018 https://www.youtube.com/watch?v=4SfsZCa419A>https://www.br-automation.com/en/products/versatile-transport-systems/acopost… [cited by applicant]
Festo Automation; “Multi-Carrier-System”Mar. 13, 2015 <https://www.youtube.com/watch?v=8mb8jyUDtXo>https://www.festo.com/cms/de_de/56286.htm. [cited by applicant]
Extended European Search Report, Dec. 4, 2020. [cited by applicant]