Granted Patent B2

US 12,255,053 · App. 17/544,167 · Granted Mar 18, 2025

Inventors: Daniele Piumi (Etterbeek, BE); Pamela Rene Fischer (Portland, OR)

Assignee: ASM IP Holding B.V.

H01J37/32449C23C16/4408C23C16/45525C23C16/45565C23C16/4586C23C16/46C23C16/509C23C16/52H01J37/32128H01J37/32724H01J37/32935H01J2237/332

Abstract

Claims (34)

1. A method for depositing a layer on a substrate, the method comprising the steps:

providing a system comprising:

a reaction chamber, the reaction chamber comprising a substrate support and an upper electrode, the substrate support comprising a lower electrode; and,

a radio frequency power source coupled one of the substrate support and the upper electrode and arranged for generating a radio frequency power waveform;

positioning a substrate on the substrate support; and

executing a deposition process, the deposition process comprising:

providing one or more gaseous precursors to the reaction chamber;

generating a plasma in the reaction chamber by means of the radio frequency power waveform; and,

using a plasma control and measurement unit, monitoring a monitored plasma characteristic to determine whether or not a determined layer thickness has been deposited on the substrate;

wherein the other of the substrate support and the upper electrode is grounded,

wherein the plasma control and measurement unit is configured and arranged to control and measure one or more properties of a plasma and is located exterior the reaction chamber,

wherein the deposition process is continuous and is ended when the monitored plasma characteristic matches a pre-determined criterion, wherein the deposition process comprises continuously providing one or more gaseous precursors to the reaction chamber, and wherein the deposition process comprises continuously generating a plasma in the reaction chamber,

wherein the monitored plasma characteristic comprises the radio frequency power waveform, and wherein the pre-determined criterion comprises a spectral distribution of the radio frequency power waveform.

2. The method according to claim 1 wherein the spectral distribution of the radio frequency power waveform comprises a fundamental frequency and an n th overtone, the fundamental frequency having a fundamental frequency amplitude and the n th overtone having an n th overtone amplitude, and wherein the deposition process is ended when a ratio of the n th overtone amplitude and the fundamental frequency amplitude exceeds a pre-determined value.

3. The method according to claim 1 wherein the spectral distribution of the radio frequency power waveform comprises a fundamental frequency and an n th overtone, the fundamental frequency having a fundamental frequency amplitude and the n th overtone having an n th overtone amplitude, and wherein the deposition process is ended when a ratio of the fundamental frequency amplitude and the n th overtone amplitude exceeds a pre-determined value.

4. The method according to claim 1 wherein the monitored plasma characteristic comprises a monitored spectral distribution of the radio frequency power waveform, and wherein the pre-determined criterion comprises a similarity score calculated by (1) subtracting the spectral distribution of the radio frequency power waveform from the pre-determined spectral distribution and integrating this difference to obtain a similarity score or (2) subtracting a matching impedance from a pre-determined frequency-dependent reference impedance and integrating this difference to obtain a similarity score.

5. A method for depositing a layer on a substrate, the method comprising the steps:

providing a system comprising:

a reaction chamber, the reaction chamber comprising a substrate support and an upper electrode, the substrate support comprising a lower electrode; and,

a radio frequency power source coupled one of the substrate support and the upper electrode and arranged for generating a radio frequency power waveform;

positioning a substrate on the substrate support; and

executing a deposition process, the deposition process comprising:

providing one or more gaseous precursors to the reaction chamber;

generating a plasma in the reaction chamber by means of the radio frequency power waveform; and,

using a plasma control and measurement unit, monitoring a monitored plasma characteristic to determine whether or not a determined layer thickness has been deposited on the substrate;

wherein the other of the substrate support and the upper electrode is grounded, wherein the plasma control and measurement unit is configured and arranged to control and measure one or more properties of a plasma and is located exterior the reaction chamber,

wherein the deposition process is continuous and is ended when the monitored plasma characteristic matches a pre-determined criterion, wherein the deposition process comprises continuously providing one or more gaseous precursors to the reaction chamber, and wherein the deposition process comprises continuously generating a plasma in the reaction chamber,

wherein the monitored plasma characteristic comprises a matching impedance of an impedance matching block, wherein the impedance matching block is arranged for matching an impedance of the radio frequency power source to a load, and

wherein the matching impedance is frequency dependent, and wherein the pre-determined criterion comprises a similarity score calculated using the matching impedance and a pre-determined frequency-dependent reference impedance.

6. The method according to claim 4 wherein the deposition process is ended when the similarity score as a function of time reaches a stationary point.

7. The method according to claim 4 wherein the deposition process is ended when an absolute value of a rate of change of the similarity score with time drops below a pre-determined value.

8. The method according to claim 4 wherein the pre-determined criterion comprises a similarity score calculated by subtracting the spectral distribution of the radio frequency power waveform from the pre-determined spectral distribution and integrating this difference to obtain a similarity score.

9. The method according to claim 1 wherein a predetermined impedance of a matching block corresponds to the predetermined thickness, and wherein the deposition step is ended after a predetermined impedance of a matching block is detected.

10. The method according to claim 1 wherein the monitored plasma characteristic is indicative of an amount of overburden of a deposited layer on the substrate.

Assignments (1)

Continuity (2)

References Cited (400)