Granted Patent B2

US 12,264,391 · App. 18/501,708 · Granted Apr 1, 2025

Inventor: Wonje Cho (Yongin-si, KR)

Assignee: Samsung Display Co., Ltd.

C23C14/042C23C14/0682C23C14/08H10K71/166H10K71/231

Abstract

Claims (26)

1. An apparatus for manufacturing a display device, the apparatus comprising:

a mask assembly, the mask assembly comprising:

a plurality of silicon substrates, each silicon substrate of the plurality of silicon substrates comprising a first surface, a second surface opposite to the first surface, and a first opening portion penetrating the first surface and the second surface;

a support substrate on the second surface, the support substrate comprising a second opening portion connected to the first opening portion, and

a mask sheet comprising a plurality of mask opening portions, each silicon substrate being aligned with a corresponding one of the plurality of mask opening portions, and the support substrate being between the mask sheet and the plurality of silicon substrates,

wherein the first opening portion at the first surface is less in width than the first opening portion at the second surface.

2. The apparatus of claim 1 , wherein the support substrate is greater in thickness than the silicon substrate.

3. The apparatus of claim 1 , wherein the support substrate is directly connected to the second surface of the silicon substrate.

4. The apparatus of claim 3 , wherein each of the silicon substrate and the support substrate comprises a plurality of silicon atoms arranged in a first arrangement direction and a second arrangement direction, the second arrangement direction crossing the first arrangement direction,

wherein a first outer silicon atom at an outermost side from among the plurality of silicon atoms of the silicon substrate and a second outer silicon atom at an outermost side from among the plurality of silicon atoms of the support substrate are adjacent to each other with the second surface therebetween, and

wherein a third arrangement direction from the center of the first outer silicon atom to the center of the second outer silicon atom crosses the first arrangement direction and the second arrangement direction.

5. The apparatus of claim 3 , wherein the support substrate comprises a plurality of first silicon atoms arranged in a first arrangement direction and a second arrangement direction, the second arrangement direction crossing the first arrangement direction, and

wherein the silicon substrate comprises a plurality of second silicon atoms arranged in the first arrangement direction and a third arrangement direction, the third arrangement direction crossing the first arrangement direction and the second arrangement direction.

6. The apparatus of claim 3 , wherein the second surface comprises silicon monoxide.

7. The apparatus of claim 1 , further comprising an intermediate adhesive member between the support substrate and the silicon substrate.

8. The apparatus of claim 1 , wherein the mask assembly further comprises:

a mask frame having an opening area; and

the mask sheet on the mask frame, the mask sheet comprising an upper surface, a lower surface opposite to the upper surface, and the plurality of mask opening portions penetrating the upper surface and the lower surface,

wherein the support substrate is on the mask sheet, and

wherein the second surface of the silicon substrate faces the upper surface of the mask sheet.

9. The apparatus of claim 8 , wherein one of the mask sheet or the support substrate comprises a concave portion facing the other one of the mask sheet or the support substrate,

the apparatus further comprising an adhesive member in the concave portion.

10. The apparatus of claim 1 , further comprising:

a chamber having the mask assembly therein; and

a source unit in the chamber, the source unit being configured to supply a deposition material,

wherein the second surface of the silicon substrate faces the source unit.

Priority Claims (1)

Continuity (2)

References Cited (22)