Plasma viewport
Plasma viewports for high-temperature environments in semiconductor processing equipment are disclosed; such viewports may use a triple-window design, with each window providing particular functionality.
1. An apparatus comprising:
a frame defining an aperture that extends between an interior side and an exterior side;
a first window sealed against the frame, sized larger than the aperture, and completely overlapping the aperture when viewed along a direction perpendicular to a largest surface of the first window;
a glass window; and
a polymeric window sized larger than the aperture, completely overlapping the aperture when viewed along a direction perpendicular to a largest surface of the polymeric window, and secured to the exterior side of the frame, wherein:
the first window is positioned closer to the interior side of the frame than the polymeric window,
the glass window is interposed between the first window and the polymeric window,
the first window is made of a fluorine-resistant, high-temperature stable material that has optical transmissivity of 80% in at least 80% of the visual light spectrum, and
the frame supports the first window, the glass window, and the polymeric window in a spaced-apart configuration.
2. The apparatus of claim 1 , wherein the first window is made of sapphire.
3. The apparatus of claim 1 , further comprising:
a first elastomeric O-ring interposed between the first window and the frame.
4. The apparatus of claim 3 , further comprising:
a second elastomeric O-ring interposed between the glass window and the polymeric window.
5. The apparatus of claim 1 , wherein the glass window is made of borosilicate glass.
6. The apparatus of claim 1 , wherein the glass window has a composition by weight of 70% silica, 11.5% boron oxide, 9.5% sodium oxide, 7.5% potassium oxide, 1% barium oxide, with the remainder including titanium oxide, calcium oxide, and any impurities.
7. The apparatus of claim 1 , wherein the frame includes a perforated web that spans the aperture, the perforated web having a pattern of through-holes sized approximately 4 millimeters or less in diameter.
8. The apparatus of claim 7 , wherein the through-holes are arranged in a hexagonal lattice pattern.
9. The apparatus of claim 7 , wherein the perforated web is interposed between the first window and the glass window.
10. The apparatus of claim 1 , wherein the frame comprises an aluminum alloy and at least a surface on a side of the frame adjacent to the first window has a hard-anodized coating.
11. The apparatus of claim 1 , wherein the polymeric window comprises a polycarbonate material.
12. The apparatus of claim 1 , wherein the polymeric window, when viewed along the direction perpendicular to the largest surface of the first window, completely overlaps the frame.
13. The apparatus of claim 1 , wherein the polymeric window is held in place relative to the frame using fasteners selected from the group consisting of star-point screws, anti-tamper star-point screws, spanner head screws, one-way screws, and anti-tamper screws.
14. The apparatus of claim 1 , further comprising:
a wall having a receptacle sized to receive the frame, wherein:
the frame is set in the receptacle and the receptacle includes an interior flange,
the interior flange defines an opening, and
the first window is sized larger than the opening; and
an elastomeric O-ring that is interposed between the first window and the interior flange.
15. The apparatus of claim 14 , wherein the elastomeric O-ring is compressed between the interior flange and the first window.
16. The apparatus of claim 14 , further comprising a semiconductor processing chamber, wherein the wall is a wall of the semiconductor processing chamber.
17. The apparatus of claim 16 , further comprising:
a radio frequency (RF) generator; and
an RF electrode, wherein:
the RF generator is electrically connected to the RF electrode,
the RF generator is configured to generate a plasma within the semiconductor processing chamber using the RF electrode, and
the receptacle is positioned in the wall such that there is a line of sight through the first window, the glass window, and the polymeric window to a location in the semiconductor processing chamber where the RF generator and the RF electrode are configured to generate the plasma.
18. A semiconductor processing tool comprising:
a semiconductor processing chamber, the semiconductor processing chamber having an exterior wall;
a radio-frequency (RF) generator;
an RF electrode located within the semiconductor processing chamber; and
a plasma viewport, the plasma viewport having:
a frame defining an aperture that extends between an interior side and an exterior side;
a first window sealed against the frame, sized larger than the aperture, and completely overlapping the aperture when viewed along a direction perpendicular to a largest surface of the first window;
a glass window; and
a polymeric window sized larger than the aperture, completely overlapping the aperture when viewed along a direction perpendicular to a largest surface of the polymeric window, and secured to the exterior side of the frame, wherein:
the first window is positioned closer to the interior side of the frame than the polymeric window, such that the first window is interposed between the processing chamber and the glass window;
the glass window is interposed between the first window and the polymeric window,
the first window is made of a fluorine-resistant, high-temperature stable material that has optical transmissivity of 80% in at least 80% of the visual light spectrum, and
the frame supports the first window, the glass window, and the polymeric window in a spaced-apart configuration.
19. The semiconductor processing tool of claim 18 , wherein the first window is made of sapphire.