IP Library › Granted Patent US 12,275,091
Granted Patent B2
US 12,275,091 · App. 17/289,069 · Granted Apr 15, 2025

Laser processing apparatus and laser processing method

Inventors: Katsuhiro Korematsu (Hamamatsu, JP); Takeshi Sakamoto (Hamamatsu, JP)
Assignee: HAMAMATSU PHOTONICS K.K.
B23K26/53B23K26/08H01L21/268B23K2103/56
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Quick Facts
Patent No.
US 12,275,091
App. No.
17/289,069
Granted
Apr 15, 2025
Kind
B2
Abstract

A laser processing apparatus irradiates a target with a laser light to form a modified region along a virtual plane in the target. The laser processing apparatus includes a support portion, an irradiation portion, a movement mechanism, and a controller. The controller performs a first processing process of irradiating a first portion in the target with the laser light under a first processing condition, and a second processing process of irradiating a second portion more on an inner side than the first portion in the target with the laser light under a second processing condition different from the first processing condition, after the first processing process.

Claims (65)

1. A laser processing apparatus that irradiates a target with a laser light to form a modified region along a virtual plane in the target, the laser processing apparatus comprising:

a support portion configured to support the target;

an irradiation portion configured to irradiate the target supported by the support portion with the laser light;

a movement mechanism configured to move at least one of the support portion and the irradiation portion to move a position of a focusing point of the laser light along the virtual plane; and

a controller configured to control the support portion, the irradiation portion, and the movement mechanism, wherein the controller performs

a first processing process of irradiating a first portion in the target with the laser light under a first processing condition, and

a second processing process of irradiating a second portion more on an inner side than the first portion in the target with the laser light under a second processing condition different from the first processing condition, after the first processing process,

wherein each of the first processing condition and the second processing condition includes one or more parameters for the laser light, each of which is defined by a parameter amount associated therewith, such that the first processing condition includes a first parameter set and the second processing condition includes a second parameter set that is different from the first parameter set.

2. The laser processing apparatus according to claim 1 , wherein the first portion is a bevel portion in the target including a curved surface extending from a corner of a circumferential edge portion toward a laser light incident surface of the target.

3. The laser processing apparatus according to claim 2 , wherein in the first processing process, a peripheral region in which the modified region is formed in the target shifts in a first direction toward the inner side from a circumferential edge.

4. The laser processing apparatus according to claim 3 , wherein in the first processing process, a crack extending from the modified region along the virtual plane is formed in the circumferential edge portion.

5. The laser processing apparatus according to claim 3 , wherein in the first processing process, the modified region is formed toward the inner side from the circumferential edge along a processing line spirally extending toward the inner side from the circumferential edge in the target, or a plurality of the modified regions are formed along a plurality of linear processing lines arranged in a direction toward the inner side from the circumferential edge in the target, the plurality of modified regions being formed sequentially from the circumferential edge toward the inner side.

6. The laser processing apparatus according to claim 3 , wherein

a first slicing state is established as a processing state when the modified region is formed by emitting the laser light under the first processing condition or the second processing condition along a single processing line, and

the first slicing state is a state in which cracks extending from a plurality of modified spots included in the modified region advance in a direction along the single processing line.

7. The laser processing apparatus according to claim 6 , wherein

a second slicing state is established as a processing state when the modified region is formed by emitting the laser light under the first processing condition or the second processing condition along a processing line including a plurality of parallel lines arranged side by side, and

the second slicing state is a state in which the cracks extending from the plurality of modified spots included in the modified region advance in a direction along the parallel lines and a direction intersecting with the parallel lines to be connected to each other.

8. The laser processing apparatus according to claim 7 , wherein

the second slicing state is established as a processing state (1) after laser processing is performed under the first processing condition using a first specified parameter associated with at least one of the parameters, or (2) after laser processing is performed under the second processing condition using a second specified parameter associated with the at least one of the parameters that is larger than the first specified parameter.

9. The laser processing apparatus according to claim 3 , wherein

the movement mechanism moves at least one of the support portion and the irradiation portion to make the position of the focusing point of the laser light move in a direction intersecting with the virtual plane, and

the controller performs a trimming process of forming the modified region by irradiating, with the laser light, a portion more on a side opposite to the laser light incident surface than the virtual plane in the target, along a processing line extending annularly on the inner side of the circumferential edge of the target, before the first processing process.

10. The laser processing apparatus according to claim 3 , wherein in the second processing process, a region in which the modified region is formed in the target shifts in the first direction.

11. The laser processing apparatus according to claim 3 , wherein

in the second processing process, an inner region in which the modified region is formed in the target shifts in a second direction opposite to the first direction, and

a distance of the first portion in the first direction is equal to or shorter than a predetermined distance set in advance.

12. The laser processing apparatus according to claim 1 comprising an input portion configured to receive an input from a user, wherein

the controller sets at least one of the first processing condition and the second processing condition based on the input made on the input portion.

13. The laser processing apparatus according to claim 1 , wherein the controller performs a third processing process of irradiating the first portion in the target with the laser light under another processing condition different from the first processing condition, during the first processing process.

14. The laser processing apparatus according to claim 1 , wherein

under the second processing condition, a second slicing state is established as a processing state after laser processing is performed using a first specified parameter associated with at least one of the parameters when the modified region is formed by emitting the laser light along a processing line including a plurality of parallel lines arranged side by side,

under the first processing condition, a first slicing state or the second slicing state is established as a processing state after laser processing is performed using a second specified parameter associated with the at least one of the parameters that is larger than the first specified parameter when the modified region is formed by emitting the laser light along the processing line including the plurality of parallel lines,

the first portion is a portion in the target excluding a circumferential edge portion, the circumferential edge portion including a side surface intersecting with a laser light incident surface,

in the first slicing state, cracks extending from a plurality of modified spots included in the modified region advance in a direction along a single processing line, and

in the second slicing state, the cracks extending from the plurality of modified spots included in the modified region advance in a direction along the parallel lines and a direction intersecting with the parallel lines to be connected to each other.

15. A laser processing method that irradiates a target with a laser light to form a modified region along a virtual plane in the target, the laser processing method comprising:

a first processing process of irradiating a first portion in the target including a circumferential edge portion including a side surface intersecting with a laser light incident surface with the laser light under a first processing condition; and

a second processing process of irradiating a second portion more on an inner side than the first portion in the target with the laser light under a second processing condition different from the first processing condition, after the first processing process, wherein

in the first processing process, a region in which the modified region is formed in the target shifts in a first direction toward the inner side from a circumferential edge, and

each of the first processing condition and the second processing condition includes one or more parameters for the laser light, each of which is defined by a parameter amount associated therewith, such that the first processing condition includes a first parameter set and the second processing condition includes a second parameter set that is different from the first parameter set.

16. The laser processing apparatus according to claim 1 , wherein the laser light comprises one or more branched components, and the one or more parameters include at least one of:

(a) a number of the branched components of the laser light,

(b) a pitch defined between the branched components of the laser light,

(c) a property of a pulse oscillation with which the laser light is generated, the property comprising one or more of a pulse energy or a pulse width,

(d) a processing speed associated with the irradiating with the laser light,

(e) a frequency associated with the laser light, or

(f) an operation parameter used by a spatial light modulator to branch the laser light into the branched components.

17. The laser processing method of claim 15 , wherein the laser light comprises one or more branched components, and the one or more parameters include at least one of:

(a) a number of the branched components of the laser light,

(b) a pitch defined between the branched components of the laser light,

(c) a property of a pulse oscillation with which the laser light is generated, the property comprising one or more of a pulse energy or a pulse width,

(d) a processing speed associated with the irradiating with the laser light,

(e) a frequency associated with the laser light, or

(f) an operation parameter used by a spatial light modulator to branch the laser light into the branched components.

18. The laser processing method of claim 1 , wherein performing the second processing process under the second processing condition causes formation of a plurality of modified spots in the modified region that are rougher than when performing the first processing process under the first processing condition.

19. The laser processing apparatus according to claim 1 , wherein the laser light comprises one or more branched components, and the one or more parameters include a number of the branched components of the laser light.

20. A laser processing apparatus that irradiates a target with a laser light to form a modified region along a virtual plane in the target, the laser processing apparatus comprising:

a support portion configured to support the target;

an irradiation portion configured to irradiate the target supported by the support portion with the laser light;

a movement mechanism configured to move at least one of the support portion and the irradiation portion to move a position of a focusing point of the laser light along the virtual plane; and

a controller configured to control the support portion, the irradiation portion, and the movement mechanism, wherein the controller performs

a first processing process of irradiating a first portion in the target with the laser light under a first processing condition for generating the laser light, and

a second processing process of irradiating a second portion more on an inner side than the first portion in the target with the laser light under a second processing condition for generating the laser light different from the first processing condition, after the first processing process,

wherein each of the first processing condition and the second processing condition includes one or more parameters for the laser light, each of which is defined by a parameter amount associated therewith, such that the first processing condition includes a first parameter set and the second processing condition includes a second parameter set that is different from the first parameter set.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 11, 2021
From: KOREMATSU, KATSUHIRO; SAKAMOTO, TAKESHI
To: HAMAMATSU PHOTONICS K.K.
Reel/Frame 056511/0395 →
Priority Claims (3)
JP 2018-204114 · Oct 30, 2018 · national
JP 2019-073098 · Apr 5, 2019 · national
JP 2019-073178 · Apr 5, 2019 · national
Continuity (1)
Related Publication 20220009039A1 · Jan 13, 2022
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