IP Library › Granted Patent US 12,280,325
Granted Patent B2
US 12,280,325 · App. 17/750,884 · Granted Apr 22, 2025

Porous composite structure, method of preparing the same, article including the same, and air purifier including the same

Inventors: Hyoungwoo Choi (Hwaseong-si, KR); Hyomin Lee (Pohang-si, KR); Min Ryu (Pohang-si, KR); Jinkyu Kang (Hwaseong-si, KR); Joonseon Jeong (Seoul, KR); Dongwook Kim (Suwon-si, KR); Daehoon Park (Paju-si, KR); Hyun Chul Lee (Hwaseong-si, KR)
Assignees: SAMSUNG ELECTRONICS CO., LTD.; POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
B01D39/2072B01D46/0001B01D46/02B01D47/06B05D5/08B82B3/0019B82B3/0047B82Y30/00B82Y40/00B01D2201/184
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Quick Facts
Patent No.
US 12,280,325
App. No.
17/750,884
Granted
Apr 22, 2025
Kind
B2
Abstract

A porous composite structure including a substrate including a plurality of nanostructures; a particle layer disposed on a surface of the substrate; and a liquid, a method of preparing the porous composite structure, an article including the porous composite structure, and an air purifier including the porous composite structure.

Claims (66)

1. A porous composite structure, comprising:

a substrate comprising a plurality of nanostructures;

a particle layer disposed on a surface of the substrate;

a liquid; and

an interlayer, wherein the interlayer is disposed on the surface of the substrate, and the particle layer is disposed on a surface of the interlayer,

wherein the interlayer comprises a hydrolyzed, dehydrated and condensed product of a compound represented by Formula 1:

H 2 N—R 1 —Si(OR 2 ) 3   Formula 1

wherein, in Formula 1,

R 1 is a C1-C20 alkylene group or a C6-C20 arylene group, and

R 2 is hydrogen, a C1-C20 alkyl group, a C6-C20 aryl group, or Cl.

2. The porous composite structure of claim 1 , wherein the substrate and the particle layer form a re-entrant structure.

3. The porous composite structure of claim 1 , wherein

the substrate is in a form of a porous surface; and

the liquid is infused in the porous surface.

4. The porous composite structure of claim 1 , further comprising a material having an affinity for the liquid.

5. The porous composite structure of claim 4 , wherein the material having an affinity for the liquid is chemically bonded to the particle layer.

6. The porous composite structure of claim 4 , wherein the material having an affinity for the liquid is a fluorinated silane.

7. The porous composite structure of claim 6 , wherein the fluorinated silane comprises trichloro(1H,1H,2H,2H-perfluorooctyl) silane, 1H,1H,2H,2H-perfluorodecyltriethoxysilane, or a combination thereof.

8. The porous composite structure of claim 1 , wherein:

the plurality of nanostructures comprises nanorods, nanoribbons, nanotubes, nanoblades, nanoplates, or a combination thereof; or

the substrate comprises a template comprising a plurality of nanoscale sized pores.

9. The porous composite structure of claim 1 , wherein

the substrate further comprises a base layer, and

the nanostructures comprise pillars protruding from the base layer,

wherein the base layer and the pillars are formed of a same material, and

the pillars comprise nanorods, nanoribbons, nanotubes, nanoblades, nanoplates, or a combination thereof.

10. The porous composite structure of claim 1 , wherein the particle layer comprises inorganic particles, organic particles, or a combination thereof.

11. The porous composite structure of claim 1 , wherein the particle layer is an inorganic particle layer comprising SiO 2 , Al 2 O 3 , TiO 2 , ZnO 2 , WO 3 , SnO 2 , ZrO, indium tin oxide, CaCO 3 , or a combination thereof.

12. The porous composite structure of claim 1 , wherein the interlayer and the particle layer are bound by electrostatic attraction.

13. The porous composite structure of claim 1 , wherein the particle layer comprises a positively charged silica layer and a negatively charged silica layer.

14. The porous composite structure of claim 1 , wherein the substrate comprises a metal, a metal oxide, a metal hydroxide, a polymer, a glass, a ceramic, or a combination thereof.

15. The porous composite structure of claim 1 , wherein a contact angle of the porous composite structure with respect to water and an organic solvent is about 170° or greater, and a sliding angle thereof is about 10° or less.

16. The porous composite structure of claim 1 , wherein the compound represented by Formula 1 is (3-aminopropyl) trimethoxysilane, (3-aminopropyl)triethoxysilane, (2-aminoundecyl)trimethoxysilane, aminophenyltrimethoxysilane, bis(trimethoxysilylpropyl)amine, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, or a combination thereof.

17. A method of preparing a porous composite structure, the method comprising:

forming a particle layer on a substrate to prepare a first structure;

providing a liquid on the first structure to prepare the porous composite structure; and

forming an interlayer on the substrate before the forming of the particle layer on the substrate,

wherein the substrate comprises a plurality of nanostructures, and

wherein the forming of the interlayer comprises coating a compound represented by Formula 1 on the substrate:

H 2 N—R 1 —Si(OR 2 ) 3   Formula 1

wherein, in Formula 1,

R 1 is a C1-C20 alkylene group or a C6-C20 arylene group, and

R 2 is hydrogen, a C1-C20 alkyl group, a C6-C20 aryl group, or Cl.

18. The method of claim 17 , wherein the compound represented by Formula 1 is (3-aminopropyl)triethoxysilane, (3-aminopropyl) trimethoxysilane, (2-aminoundecyl)trimethoxysilane, aminophenyltrimethoxysilane, bis(trimethoxysilylpropyl) amine, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, or a combination thereof.

19. The method of claim 17 , wherein the forming of the particle layer on the interlayer to prepare the first structure comprises repeatedly contacting negatively charged inorganic particles and positively charged inorganic particles on the interlayer.

20. The method of claim 19 , wherein the negatively charged inorganic particles are negatively charged colloidal silica, and the positively charged inorganic particles are positively charged colloidal silica.

21. The method of claim 17 , further comprising providing a material having an affinity for the liquid on the first structure before providing the liquid on the first structure.

22. The method of claim 21 , wherein the providing of the material having the affinity for the liquid comprises coating the substrate with a fluorinated silane.

23. The method of claim 22 , wherein the fluorinated silane is trichloro(1H,1H,2H,2H-perfluorooctyl) silane, 1H,1H,2H,2H-perfluorodecyltriethoxysilane, or a combination thereof.

24. The method of claim 17 , further comprising performing an oxygen plasma treatment.

25. The method of claim 17 , further comprising

preparing the substrate by removing impurities and a native oxide layer of the substrate, and

etching to form the nanostructures.

26. An article, comprising the porous composite structure of claim 1 .

27. An air purifier, comprising the porous composite structure of claim 1 .

28. An air purifier of claim 27 , comprising:

a duct configured to flow air comprising micro-dust therethrough;

a droplet sprayer configured to spray water inside the duct to form a gas-liquid mixture fluid and collect micro-dusts in the air;

a dust collector comprising a porous member comprising micro-channels through which the gas-liquid mixture fluid is configured to pass, the dust collector configured to collect the droplets comprising the micro-dust,

wherein the porous member comprises a porous composite structure comprising

a substrate comprising a plurality of nanostructures;

a particle layer disposed on a surface of the substrate; and

a liquid; and

a discharge plasma generating device configured to generate a discharge plasma in the dust collector, a catalyst reactor configured to remove ozone discharged from the dust collector using a catalyst, or a combination thereof.

29. The air purifier of claim 28 , further comprising a discharge plasma generating device configured to generate a discharge plasma in the dust collector.

30. The air purifier of claim 28 , further comprising a catalyst reactor configured to remove ozone discharged from the dust collector using a catalyst.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 23, 2022
From: CHOI, HYOUNGWOO; LEE, HYOMIN; RYU, MIN; KANG, JINKYU; JEONG, JOONSEON; KIM, DONGWOOK; PARK, DAEHOON; LEE, HYUN CHUL
To: SAMSUNG ELECTRONICS CO., LTD.; POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
Reel/Frame 059984/0059 →
Priority Claims (2)
KR 10-2021-0066493 · May 24, 2021 · national
KR 10-2022-0026218 · Feb 28, 2022 · national
Continuity (1)
Related Publication 20220370937A1 · Nov 24, 2022
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