Automated cavitation processing
A cavitation peening system is disclosed, including a tank containing a fluid, a carrier, and an array of cavitation nozzles. The carrier is configured to deliver a workpiece to a treatment zone in the tank, and the array of cavitation nozzles are collectively configured to generate a cavitation induced whirlpool in the treatment zone.
1. A cavitation peening system, that comprises:
a controller;
a tank that contains a fluid, wherein the tank comprises a drum shape configured to facilitate a whirlpool flow of the fluid;
a carrier that comprises a rack configured to:
releasably secure a workpiece;
deliver the workpiece to a treatment zone in the tank; and
move the rack in the treatment zone through a sequence of events, wherein the controller directs a rate which the carrier moves the rack, and wherein the rack comprises a rack sensor configured to monitor a cavitation intensity of the fluid; and
an array of cavitation nozzles collectively configured to cavitate the fluid and induce the whirlpool flow in the treatment zone.
2. The system of claim 1 , wherein:
the tank comprises a peripheral wall that surrounds the treatment zone;
each nozzle in the cavitation nozzles are connected to the peripheral wall with individual supplies of the fluid at individual pressures; and
the rack sensor comprises a replaceable sacrificial component.
3. The system of claim 1 , further comprising:
a sensor configured to monitor a smoothness of the workpiece;
a frame structure inside the tank, that supports the cavitation nozzles; and
a diaphragm pump vehicle in the tank configured to mix the fluid.
4. The system of claim 1 , wherein:
each cavitation nozzle in the array of cavitation nozzles is configured to expel the fluid at a pressure that produces a desired cavitation intensity; and
the carrier comprises a manipulation device connected to the rack.
5. The system of claim 4 , wherein:
the rack is further configured to simultaneously hold a second workpiece that comprises a different shape than the workpiece; and
the manipulation device is configured to move the rack forward, back, left, and right within the tank.
6. The system of claim 4 , wherein:
configurations of some the cavitation nozzles vary from each other; and
the manipulation device is configured to rotate the rack in the treatment zone.
7. The system of claim 1 , wherein:
the fluid in the tank comprises liquid and abrasive media; and
the workpiece comprises titanium in an alpha case; and
the whirlpool flow comprises a force sufficient to remove the alpha case.
8. The system of claim 7 , further comprising:
an abrasive media supply, configured to add the abrasive media to the tank,
a density monitoring system, configured to monitor a density of the abrasive media in the fluid contained in the tank,
a reclamation system, configured to collect abrasive media from the tank, and
the controller configured to receive data from the density monitoring system, and regulate;
the abrasive media supply, and
the reclamation system to maintain abrasive media in a selected density range inside the tank.
9. The system of claim 1 , wherein the cavitation induced whirlpool flow comprises a revolving flow of the fluid including a plurality of cavitation bubbles.
10. A cavitation abrasive surface finishing system that comprises:
a treatment zone in a tank that contains a slurry of a fluid and an abrasive media,
a carrier configured to transport a workpiece into the tank and control a rate of movement of the workpiece within the tank, wherein the carrier comprises a rack that comprises a rack sensor configured to measure a cavitation intensity;
a plurality of cavitation nozzles directed toward the treatment zone and connected by high-pressure hoses to a high-pressure fluid pump and configured to induce a whirlpool flow of the fluid,
an abrasive media supply, configured to add abrasive media to the tank,
a density monitoring system, configured to monitor a density of abrasive media in the slurry contained in the tank,
a reclamation system, configured to collect abrasive media from the tank, and
a controller configured to:
receive data from the density monitoring system;
determine the rate of movement of the workpiece; and
regulate the abrasive media supply and the reclamation system to maintain a selected density of abrasive media in the slurry contained in the tank.
11. The system of claim 10 , wherein:
the density monitoring system includes a laser diffraction sensor configured to measure wavelengths transmitted by the slurry contained in the tank;
the workpiece comprises titanium in an alpha case; and
the whirlpool flow comprises a force sufficient to remove the alpha case.
12. The system of claim 10 , wherein:
each cavitation nozzle is configured to expel the fluid at a pressure that produces a desired cavitation intensity; and
the reclamation system includes an autonomous vehicle configured to move over a bottom interior surface of the tank and collect sediment.
13. The system of claim 10 , wherein:
the rack sensor comprises a sacrificial component; and
the reclamation system includes a filter configured to remove depleted abrasive media.
14. The system of claim 10 , wherein:
the rack is further configured to hold multiple workpieces of different shapes;
some of the plurality of cavitation nozzles comprise a shape that differs from each other; and
the reclamation system includes an overflow tank.
15. The system of claim 10 , further comprising:
a sensor configured to monitor a smoothness of the workpiece; and
a mixing device, configured to maintain suspension of abrasive media in the slurry contained in the tank.
16. An automated cavitation peening system, that comprises:
a tank that comprises a drum shape filled with a fluid;
a plurality of cavitation nozzles positioned around a periphery of the tank and directed toward a central region of the tank,
a fluid supply that comprises a pump connected to a manifold that comprises valves that control a delivery of the fluid supply to each of the plurality of cavitation nozzles at a pressure that produces, respectively, a desired cavitation intensity from each of the cavitation nozzles;
a rack configured to support a workpiece, wherein the rack comprises a rack sensor configured to monitor a cavitation intensity of the fluid;
a manipulation device configured to lower the rack into the tank and move the rack in a treatment zone through a sequence of events,
a controller configured to:
control the valves and regulate the supply of high-pressure fluid; and
control a direction and rate of a movement of the manipulation device.
17. The system of claim 16 , wherein the rack sensor comprises a sacrificial component.
18. The system of claim 17 , wherein the plurality of cavitation nozzles are evenly spaced around a circumferential wall of the tank.
19. The system of claim 17 , wherein a plurality of cavitation clouds generated by the nozzles result in a whirlpool action of the fluid filling the tank.
20. The system of claim 16 , wherein the rack is configured to support a plurality of different shaped workpieces for concurrent peening.