Semiconductor memory device including a discharge contact
A semiconductor memory device includes a memory structure including a plurality of memory cells which are disposed on a cell region of a source plate; a plurality of contact plugs passing through the source plate in a coupling region of the source plate including at least a portion of a center portion of the source plate, and separated from the source plate by a dielectric layer pattern; a discharge contact passing through the source plate in the coupling region, and coupled to the center portion of the source plate; and a discharge region coupled to the discharge contact. The discharge region is located in a substrate below the source plate.
1. A semiconductor memory device comprising:
a memory structure including a plurality of memory cells that are disposed on a cell region of a source plate;
a plurality of contact plugs passing through the source plate in a coupling region of the source plate including at least a portion of a center portion of the source plate, and separated from the source plate by a dielectric layer pattern;
a discharge contact passing through the source plate in the coupling region;
a discharge region coupled to the discharge contact, and disposed in a substrate below the source plate; and
an additional discharge contact passing through the source plate at the center portion of the source plate, intersecting with the discharge contact, and coupled to the discharge contact and the center portion of the source plate.
2. The semiconductor memory device according to claim 1 , wherein
the memory structure further includes a plurality of bit lines that are coupled to the plurality of memory cells, and
the plurality of contact plugs couple a page buffer circuit defined on the substrate and the plurality of bit lines.
3. The semiconductor memory device according to claim 1 , wherein
the memory structure further includes a plurality of bit lines that are coupled to the plurality of memory cells and are arranged in a first direction parallel to a top surface of the source plate, and
the discharge contact has a line shape that extends in the first direction.
4. The semiconductor memory device according to claim 1 , wherein the discharge contact is disposed at an edge portion of the coupling region adjacent to the cell region.
5. The semiconductor memory device according to claim 1 ,
wherein the memory structure comprises:
a dielectric part that is disposed on the coupling region of the source plate and through which the plurality of contact plugs pass; and
a cell part including a plurality of electrode layers and a plurality of interlayer dielectric layers that are alternately stacked on the cell region of the source plate, and a plurality of cell plugs that pass through the plurality of electrode layers and the plurality of interlayer dielectric layers to extend to the source plate, and
wherein the plurality of cell plugs comprise:
a plurality of dummy cell plugs disposed at an edge portion of the cell region adjacent to the discharge contact; and
a plurality of main cell plugs separated from the discharge contact by the plurality of dummy cell plugs.
6. The semiconductor memory device according to claim 1 ,
wherein the memory structure further comprises:
a plurality of electrode layers and a plurality of interlayer dielectric layers alternately stacked on the cell region of the source plate; and
a plurality of cell plugs passing through the plurality of electrode layers and the plurality of interlayer dielectric layers to extend to the source plate,
wherein the cell region includes an empty region, and
wherein the plurality of cell plugs are disposed in the cell region except the empty region, and an additional discharge contact is disposed in the empty region.
7. The semiconductor memory device according to claim 1 , wherein
the memory structure further includes a plurality of bit lines that are coupled to the plurality of memory cells,
the discharge contact has a line shape that extends in a direction in which the plurality of bit lines are arranged when viewed from the top, and
the additional discharge contact has a line shape which extends in a direction in which the plurality of bit lines extend when viewed from the top.
8. A semiconductor memory device comprising:
a memory structure including a plurality of memory cells that are disposed on a first region of a source plate;
a first discharge contact passing through the source plate in a second region of the source plate including at least a portion of a center portion of the source plate, and coupled to the center portion of the source plate;
a second discharge contact passing through the source plate at an edge portion of the source plate, and coupled to the edge portion of the source plate;
a discharge region in a substrate below the source plate and coupled in common to the first discharge contact and the second discharge contact; and
a third discharge contact passing through the source plate at the center portion of the source plate, intersecting with the first discharge contact, and coupled to the first discharge contact and the center portion of the source plate.
9. The semiconductor memory device according to claim 8 , wherein the discharge region overlaps with the second discharge contact in a vertical direction perpendicular to a top surface of the source plate.
10. The semiconductor memory device according to claim 8 , wherein
the memory structure further includes a plurality of bit lines that are coupled to the plurality of memory cells, and
the first discharge contact has a line shape that extends in a direction in which the plurality of bit lines are arranged when viewed from the top.
11. The semiconductor memory device according to claim 8 , wherein the first discharge contact is disposed at an edge portion of the second region adjacent to the first region.
12. The semiconductor memory device according to claim 8 ,
wherein the memory structure comprises:
a plurality of electrode layers and a plurality of interlayer dielectric layers alternately stacked on the first region of the source plate; and
a plurality of cell plugs passing through the plurality of electrode layers and the plurality of interlayer dielectric layers to extend to the source plate,
wherein the first region includes an empty region, and
wherein the plurality of cell plugs are disposed in the first region but not in the empty region, and the third discharge contact is disposed in the empty region.
13. The semiconductor memory device according to claim 8 , wherein
the memory structure further includes a plurality of bit lines that are coupled to the plurality of memory cells, and
the first discharge contact has a line shape that extends in a direction in which the plurality of bit lines are arranged when viewed from the top, and
the third discharge contact has a line shape that extends in a direction in which the plurality of bit lines extend when viewed from the top.