Container finish portion with polished buffer zone
A finish portion of a preform for rotatably engaging with a closure to seal contents within an interior of a container includes a body that begins at an opening to the interior, a sealing surface adjacent to the opening and including a first polished buffer zone configured to cooperate with a plug seal, and a transition surface extending from the sealing surface to a narrower handling surface. The first buffer zone is polished by way of a machine polishing technique.
1. A finish portion of a preform for rotatably engaging with a closure to seal contents within an interior of a container formed from the preform, the finish portion comprising:
a body that begins at an opening to the interior;
a sealing surface adjacent to the opening and including a first polished buffer zone configured to cooperate with a plug seal; and
a transition surface extending from the sealing surface to a narrower handling surface,
wherein the first buffer zone is polished by way of a machine polishing technique.
2. The finish portion of claim 1 , wherein the first buffer zone exhibits a Roughness Average ranging between substantially 0.1 μm and substantially 0.3 μm.
3. The finish portion of claim 1 , wherein the first buffer zone includes a width that ranges between 50 μm and 150 μm.
4. The finish portion of claim 1 , wherein the transition surface includes a second polished buffer zone.
5. The finish portion of claim 1 , wherein the transition surface comprises a reverse curve surface that includes a concave portion that extends from the sealing surface and joins with a convex portion that extends to the handing surface.
6. The finish portion of claim 5 , wherein the transition surface includes a second polished buffer zone that extends from the first buffer zone and terminates at the handling surface.
7. The finish portion of claim 6 , wherein the Roughness Average of the second polished buffer zone ranges between 0.15 μm and 0.25 μm.
8. The finish portion of claim 6 , wherein the second polished buffer zone includes a width that ranges between 50 μm and 150 μm.
9. The finish portion of claim 4 , wherein the first and second buffer zones are polished to a surface smoothness wherein blemishes in the surface have a depth reduced to less than roughly 1.0 μm.
10. The finish portion of claim 4 , wherein the first and second buffer zones are polished to a surface smoothness wherein blemishes have a depth ranging between substantially 10 μm and 40 μm in depth.
11. A finish portion of a preform for rotatably engaging with a closure to seal contents within an interior of a container formed from the preform, the finish portion comprising:
a body that begins at an opening to the interior;
a sealing surface adjacent to the opening and including a first polished buffer zone configured to cooperate with a plug seal; and
a transition surface extending from the sealing surface to a narrower handling surface,
wherein the first buffer zone is polished by way of a hand polishing technique.
12. The finish portion of claim 11 , wherein the first buffer zone exhibits a Roughness Average ranging between substantially 0.1 μm and substantially 0.3 μm.
13. The finish portion of claim 11 , wherein the first buffer zone includes a width that ranges between 50 μm and 150 μm.
14. The finish portion of claim 11 , wherein the transition surface includes a second polished buffer zone.
15. The finish portion of claim 11 , wherein the transition surface comprises a reverse curve surface that includes a concave portion that extends from the sealing surface and joins with a convex portion that extends to the handing surface.
16. The finish portion of claim 15 , wherein the transition surface includes a second polished buffer zone that extends from the first buffer zone and terminates at the handling surface.
17. The finish portion of claim 16 , wherein the Roughness Average of the second polished buffer zone ranges between 0.15 μm and 0.25 μm.
18. The finish portion of claim 16 , wherein the second polished buffer zone includes a width that ranges between 50 μm and 150 μm.
19. The finish portion of claim 14 , wherein the first and second buffer zones are polished to a surface smoothness wherein blemishes in the surface have a depth reduced to less than roughly 1.0 μm.
20. The finish portion of claim 14 , wherein the first and second buffer zones are polished to a surface smoothness wherein blemishes have a depth ranging between substantially 10 μm and 40 μm in depth.