Beam current adjustment for charged-particle inspection system
Apparatuses, methods, and systems for ultra-fast beam current adjustment for a charged-particle inspection system include an charged-particle source configured to emit charged particles for scanning a sample; and an emission booster configured to configured to irradiate electromagnetic radiation onto the charged-particle source for boosting charged-particle emission in a first cycle of a scanning operation of the charged-particle inspection system, and to stop irradiating the electromagnetic radiation in a second cycle of the scanning operation.
1. A charged-particle inspection system, the system comprising:
a charged-particle source configured to emit charged particles for scanning a sample; and
an emission booster configured to irradiate electromagnetic radiation onto the charged-particle source for boosting charged-particle emission in a first cycle of a scanning operation of the charged-particle inspection system, and to stop irradiating the electromagnetic radiation in a second cycle of the scanning operation,
wherein the charged-particle inspection system is configured to scan an entire first line in a frame of the sample during the first cycle and scan an entire second line in the frame of the sample during the second cycle.
2. The system of claim 1 , wherein the first line and the second line comprise the same line of the frame of the sample.
3. The system of claim 1 , wherein the first line and the second line comprise different lines of the frame of the sample.
4. The system of claim 3 , wherein the first line and the second line are neighboring lines of the frame of the sample.
5. The system of claim 1 , wherein a length of the first cycle is substantially equal to a length of the second cycle.
6. The system of claim 1 , wherein the charged-particle inspection system is configured to generate a charged-particle beam for scanning the sample, wherein the charged-particle beam is configured to have a first current when the emission booster irradiates the electromagnetic radiation onto the charged-particle source and a second current lower than the first current when the emission booster stops irradiating the electromagnetic radiation onto the charged-particle source.
7. The system of claim 6 , wherein the charged-particle emission of the emission booster is configured to synchronize with a scanning operation of the charged-particle inspection system such that the charged-particle beam has the first current when the charged-particle beam starts scanning the first line and has the second current when the charged-particle beam starts scanning the second line.
8. The system of claim 1 , wherein the charged-particle source is one of a thermionic charged-particle source or a cold-field emission charged-particle source.
9. The system of claim 1 , wherein the charged-particle source comprises a photocathode.
10. The system of claim 9 , wherein the emission booster comprises a laser generator configured to irradiate a laser.
11. The system of claim 10 , wherein the laser generator is configured to irradiate the laser onto the photocathode for increasing charged particles emitted by the photocathode.
12. The system of claim 11 , wherein the laser boosts charged-particle emission within 70 nanoseconds when the laser generator irradiates the laser onto the photocathode.
13. The system of claim 1 , wherein the emission booster is further configured to stop irradiating the electromagnetic radiation in a third cycle of the scanning operation, and the charged particle inspection system is further configured to scan the second line in the second cycle and the third cycle.
14. The system of claim 1 , wherein the charged particle inspection system is a single-beam inspection system.
15. A non-transitory computer-readable medium that stores a set of instructions that is executable by at least one processor of a charged-particle inspection system to cause the system to perform operations of defect inspection, the operations comprising:
emitting charged particles for forming a charged-particle beam using a charged-particle source of the charged-particle inspection system;
directing the charged-particle beam to perform a line-by-line scan using a scanning unit of the charged-particle inspection system;
irradiating, using an emission booster of the charged-particle inspection system, electromagnetic radiation onto the charged-particle source for boosting charged-particle emission in a first scan cycle of the charged-particle beam, and stopping irradiating the electromagnetic radiation in a second scan cycle of the charged-particle beam; and
scanning an entire first line in a frame of a sample during the first cycle and scanning an entire second line in the frame of the sample during the second cycle.
16. The non-transitory computer-readable medium of claim 15 , wherein the charged particle beam is configured to have a first current when the emission booster irradiates the electromagnetic radiation onto the charged-particle source and a second current lower than the first current when the emission booster stops irradiating the electromagnetic radiation onto the charged-particle source.
17. The non-transitory computer-readable medium of claim 16 , wherein the operations further comprise synchronizing the emission booster with a scanning operation of the charged-particle inspection system such that the charged-particle beam has the first current when the charged-particle beam starts scanning the first line and has the second current when the charged-particle beam starts scanning the second line.
18. The non-transitory computer-readable medium of claim 15 , wherein the first line and the second line comprise a same line of the frame of the sample.
19. The non-transitory computer-readable medium of claim 18 , wherein the first line and the second line comprise different lines of the frame of the sample.
20. A method, comprising:
emitting charged particles for forming a charged-particle beam using a charged particle source of a charged-particle inspection system;
directing the charged-particle beam to perform a line-by-line scan using a scanning unit of the charged-particle inspection system;
irradiating, using an emission booster of the charged-particle inspection system, electromagnetic radiation onto the charged-particle source for boosting charged particle emission in a first scan cycle of the charged-particle beam, and stopping irradiating the electromagnetic radiation in a second scan cycle of the charged particle beam; and
scanning an entire first line of a frame of the sample during the first cycle and scanning an entire second line of the frame of the sample during the second cycle.