Apparatus for preventing contamination of self-plasma chamber
The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and has a shielding means capable of preventing an inflow of negative electrode material, which is generated by a sputtering phenomenon, into a discharge chamber when a positive charge of plasma, which is generated in the self-plasma chamber, collides with a negative electrode.
1. An apparatus comprising a self-plasma chamber comprising a shielding means, wherein the self-plasma chamber is connected to a branch pipe branching from an exhaust pipe of a process chamber to analyze components of gas generated from the process chamber,
wherein the shielding means prevents ground-electrode material, generated due to a sputtering phenomenon when a positive charge of the plasma generated from the self-plasma chamber collides with a ground electrode connector, from being introduced into a discharge chamber,
wherein the self-plasma chamber comprises:
the ground electrode connector connected to the branch pipe,
a flange formed on a one end of the ground electrode connector which is connected to the branch pipe, and
the discharge chamber connected to an other end of the ground electrode connector and made of non-metallic material, wherein the one end of the ground electrode connector is opposite to the other end of the ground electrode connector,
wherein the discharge chamber comprises:
a discharge area connected to the other end of the ground electrode connector;
a main discharge chamber extending from the discharge area, having an outer diameter smaller than an outer diameter of the discharge area, with a stepped portion being formed on an end of the discharge area connected to the main discharge chamber, and
wherein the shielding means is installed in the discharge area.
2. The apparatus of claim 1 , wherein the shielding means is spaced apart from an inner surface of the discharge chamber.
3. The apparatus of claim 1 , wherein the self-plasma chamber comprises:
a window provided on an end of the discharge chamber; and
a plasma generating module provided to generate the plasma in the discharge chamber.
4. The apparatus of claim 3 , wherein a metal piece is installed in the discharge area, and a baffle plate is coupled to a surface facing the main discharge chamber, the baffle plate functioning as the shielding means.
5. The apparatus of claim 4 , wherein the plasma generating module comprises an electrode provided in the main discharge chamber, the metal piece provided in the discharge area, and a RF matching coil, and the electrode and the RF matching coil are connected to each other, and the RF generator and the metal piece are connected to a ground electrode.
6. The apparatus of claim 5 , wherein a second shielding means is installed in a space between the electrode and the window.
7. The apparatus of claim 6 , wherein a shield ring is configured to protrude into the discharge chamber, and is made of non-metallic material, the shield ring functioning as the second shielding means.