Visible light-emitting semiconductor laser device and method of manufacturing the same
A semiconductor laser light-emitting structure includes a semiconductor laser light-emitting structure having a vertical-cavity surface-emitting laser structure and configured to emit light having a first wavelength, and a wavelength converter including a metasurface and monolithically formed with the semiconductor laser light-emitting structure on a light output side of the semiconductor laser light-emitting structure, wherein the metasurface is configured to non-linearly convert the light having the first wavelength into light having a second wavelength.
1. A semiconductor laser device comprising:
a semiconductor laser light-emitting structure having a vertical-cavity surface-emitting laser structure, the semiconductor laser light-emitting structure being configured to emit light having a first wavelength;
a wavelength converter comprising a metasurface, the wavelength converter being monolithically formed with the semiconductor laser light-emitting structure on a light output side of the semiconductor laser light-emitting structure; and
an air gap between the metasurface and the semiconductor laser light-emitting structure,
wherein the metasurface is configured to non-linearly convert the light having the first wavelength into light having a second wavelength.
2. The semiconductor laser device of claim 1 , wherein the semiconductor laser light-emitting structure is further configured to emit infrared light, and
wherein the wavelength converter is further configured to non-linearly convert the infrared light into visible light.
3. The semiconductor laser device of claim 1 , wherein each of the semiconductor laser light-emitting structure and the metasurface comprises a Group III-V semiconductor compound.
4. The semiconductor laser device of claim 1 , wherein the metasurface comprises a plurality of nanoresonators, and each of the plurality of nanoresonators has an asymmetric cross-sectional shape.
5. The semiconductor laser device of claim 4 , wherein each of the plurality of nanoresonators comprises a spacer layer and a semiconductor compound layer provided on the spacer layer.
6. The semiconductor laser device of claim 5 , wherein the semiconductor compound layer of each of the plurality of nanoresonators comprises an A″BY semiconductor compound.
7. The semiconductor laser device of claim 5 , wherein the spacer layer of each of the plurality of nanoresonators comprises an oxide of a Group III-V semiconductor compound.
8. The semiconductor laser device of claim 4 , wherein the metasurface comprises a spacer layer provided below the plurality of nanoresonators.
9. The semiconductor laser device of claim 1 , wherein the semiconductor laser light-emitting structure comprises an active area layer and a lower distributed Bragg reflector layer provided on one side of the active area layer, and
wherein the metasurface is provided on an opposite side of the lower distributed Bragg reflector layer with respect to the active area layer.
10. The semiconductor laser device of claim 9 , wherein the metasurface is configured to function as an upper reflector layer pairing up with the lower distributed Bragg reflector layer.
11. The semiconductor laser device of claim 9 , further comprising:
a transparent dielectric layer covering the metasurface; and
an upper distributed Bragg reflector layer provided on the transparent dielectric layer.
12. The semiconductor laser device of claim 1 , further comprising a plurality of sub-semiconductor laser devices in each of which the semiconductor laser light-emitting structure and the wavelength converter are integrated,
wherein each of the plurality of sub-semiconductor laser devices is configured to emit visible light having a wavelength different from other sub-semiconductor laser devices of the plurality of sub-semiconductor laser devices.
13. A semiconductor laser device comprising:
a substrate;
a semiconductor laser light-emitting structure comprising:
a lower distributed Bragg reflector layer,
a first-type conductive semiconductor contact layer,
an active area layer, and
a second-type conductive semiconductor contact layer, which are sequentially stacked on the substrate, wherein the semiconductor laser light-emitting structure comprises a vertical-cavity surface-emitting laser structure configured to emit infrared light;
a metasurface comprising a plurality of nanoresonators, each of the plurality of nanoresonators having an asymmetric cross-sectional shape, the metasurface being provided on the second-type conductive semiconductor contact layer and configured to non-linearly convert the infrared light into visible light; and
an air gap between the metasurface and the semiconductor laser light-emitting structure,
wherein each of the semiconductor laser light-emitting structure and the metasurface comprises a Group III-V semiconductor compound, and
wherein the metasurface is monolithically integrated with the semiconductor laser light-emitting structure.
14. The semiconductor laser device of claim 13 , wherein each of the plurality of nanoresonators comprises a spacer layer and a semiconductor compound layer provided on the spacer layer.
15. The semiconductor laser device of claim 14 , wherein the semiconductor compound layer of each of the plurality of nanoresonators comprises an A III B V semiconductor compound, and
wherein the spacer layer of each of the plurality of nanoresonators comprises an oxide of the Group III-V semiconductor compound.
16. The semiconductor laser device of claim 13 , wherein the metasurface comprises a spacer layer provided below the plurality of nanoresonators.
17. The semiconductor laser device of claim 13 , wherein the metasurface is configured to function as an upper reflector layer pairing up with the lower distributed Bragg reflector layer.
18. The semiconductor laser device of claim 13 , further comprising:
a transparent dielectric layer covering the metasurface; and
an upper distributed Bragg reflector layer provided on the transparent dielectric layer.