Method for forming metal sintered body
Provided is a method of forming a sintered metal, the method including a first step of inserting tungsten (W) powder in a graphite mold, a second step of interposing tantalum (Ta) foil between the W powder and the graphite mold, and a third step of forming sintered W from the W powder through a sintering process.
1. A method of forming a sintered metal, the method comprising:
inserting tungsten (W) powder in a graphite mold;
interposing tantalum (Ta) foil between the W powder and the graphite mold; and
forming sintered W from the W powder through a sintering process, the sintering process comprising a spark plasma sintering (SPS) process,
wherein the forming the sintered W from the W powder through the sintering process comprises:
forming Ta carbide (Ta 2 C) in the Ta foil to prevent formation of W carbide based on diffusion of carbon (C) into the sintered W due to carburization; and
forming Ta oxide (Ta 2 O 5 ) in the Ta foil to prevent formation of W oxide based on diffusion of oxygen (O) into the sintered W.
2. The method of claim 1 , wherein the sintering process comprises the spark plasma sintering (SPS) process performed in a vacuum chamber.
3. The method of claim 1 , wherein a thickness of the Ta foil is 25 μm.
4. The method of claim 1 , wherein the Ta foil has a high solid solubility of C.
5. The method of claim 1 , wherein the Ta foil has a high O affinity at a vacuum level of 10 −5 atm.
6. The method of claim 1 , wherein the Ta foil has a high O affinity at all levels higher than or equal to a vacuum level for sintering, the vacuum level for sintering being 10 −2 atm.
7. The method of claim 1 , wherein a foil used is selected from among groups IVa, Va, and VIa of a periodic table.