Large-area high-density plasma processing chamber for flat panel displays
Embodiments described herein provide a lid assembly of a chamber for independent control of plasma density and gas distribution within the interior volume of the chamber. The lid assembly includes a plasma generation system and a gas distribution assembly. The plasma generation system includes a plurality of dielectric plates having a bottom surface oriented with respect to vacuum pressure and a top surface operable to be oriented with respect to atmospheric pressure. One or more coils are positioned on or over the plurality of dielectric plates. The gas distribution assembly includes a first diffuser and a second diffuser. The first diffuser includes a plurality of first channels intersecting a plurality of second channels of the second diffuser.
1. A plate for a lid assembly, the plate comprising:
a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the plate, each cavity of the two or more cavities comprises:
a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon, each of the plurality of dielectric plates having:
a bottom surface operable to be oriented with respect to a first pressure; and
a top surface operable to be oriented opposite to the bottom surface and with respect to a second pressure different than the first pressure; and
one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and
a gas distribution assembly, the gas distribution assembly comprising:
a first diffuser, the first diffuser comprises:
one or more first diffuser inlets disposed in the plate; and
a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the plate and is adjacent to at least one recess of the plurality of recesses; and
a second diffuser, the second diffuser comprises:
one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and
each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels.
2. The plate of claim 1 , wherein each coil of each cavity of the two or more cavities is configured to be connected to an independent power source.
3. The plate of claim 2 , wherein each coil is configured to be connected to the independent power source through a match circuit.
4. The plate of claim 1 , wherein each coil has one or more turns.
5. The plate of claim 1 , wherein the plate comprises aluminum-containing materials.
6. The plate of claim 1 , wherein the plurality of dielectric plates plates comprise at least one of aluminum oxide (Al 2 O 3 ), aluminum nitride (ALN), quartz, zirconium dioxide (ZrO 2 ), zirconium nitride (ZrN), quartz, and glass materials.
7. The plate of claim 1 , wherein
each second channel of the plurality of second channels is disposed in the plate between adjacent cavities.
8. The plate of claim 1 , wherein the plate further comprises:
a fluid inlet and a fluid outlet disposed in the plate coupleable to a heat exchanger; and
a plurality of fluid channels in fluid communication with the fluid inlet and the fluid outlet, at least one of the plurality of fluid channels is disposed in the plate between adjacent cavities.
9. The plate of claim 1 , wherein flow controllers are coupleable to each of the first diffuser inlets, and wherein the flow controllers are coupleable to each of the second diffuser inlets.
10. A plate for a lid assembly, the plate comprising:
a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the plate, each cavity of the two or more cavities comprises:
a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon; and
one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and
a gas distribution assembly, the gas distribution assembly comprising:
a first diffuser, the first diffuser comprises one or more first diffuser inlets disposed in the plate and in fluid communication with a plurality of first channels;
a second diffuser, the second diffuser comprises one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels;
wherein:
each of the second channels is intersecting each of the first channels; and
each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels.
11. The plate of claim 10 , wherein flow controllers are coupleable to each of the first diffuser inlets, and wherein the flow controllers are coupleable to each of the second diffuser inlets.
12. A chamber, comprising:
a chamber body;
a substrate support disposed in the chamber body; and
a lid assembly plate positioned opposite the substrate support, the lid assembly plate and the substrate support defining a processing region in the chamber body, the lid assembly plate comprises:
a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the lid assembly plate, each cavity of the two or more cavities comprises:
a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon, the plurality of dielectric plates having:
a bottom surface positioned in the processing region; and
a top surface positioned outside the processing region; and
one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and
a gas distribution assembly, the gas distribution assembly comprising a first diffuser, the first diffuser comprises:
one or more first diffuser inlets disposed in the lid assembly plate; and
a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the lid assembly plate and is adjacent to at least one recess of the plurality of recesses; and
a second diffuser, the second diffuser comprises:
one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and
each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels.
13. The chamber of claim 12 , wherein each coil of each cavity of the two or more cavities is configured to be connected to an independent power source.
14. The chamber of claim 13 , wherein each coil is configured to be connected to the independent power source through a match circuit.
15. The chamber of claim 12 , wherein each coil has one or more turns.
16. The chamber of claim 12 , wherein the lid assembly plate comprises aluminum-containing materials.
17. The chamber of claim 12 , wherein the plurality of dielectric plates comprise at least one of aluminum oxide (Al 2 O 3 ), aluminum nitride (ALN), quartz, zirconium dioxide (ZrO 2 ), zirconium nitride (ZrN), quartz, and glass materials.
18. The chamber of claim 12 , wherein the gas distribution assembly further comprises a second diffuser comprising:
one or more second diffuser inlets disposed in the lid assembly plate; and
a plurality of second channels in fluid communication with at least one of the second diffuser inlets, each second channel of the plurality of second channels is disposed in the lid assembly plate between adjacent cavities.