IP Library Granted Patent US 12,317,621
Granted Patent B2
US 12,317,621 · App. 17/972,781 · Granted May 27, 2025

Imaging device and electronic device

Inventor: Tetsuya Yamaguchi (Kanagawa, JP)
Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
H10F39/8053H10F39/024H10F39/8063
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Quick Facts
Patent No.
US 12,317,621
App. No.
17/972,781
Granted
May 27, 2025
Kind
B2
Abstract

An imaging device is provided to inhibit deterioration in imaging performance due to high-angle incident light. The imaging device includes a semiconductor substrate including a plurality of photoelectric conversion elements. The imaging device includes a plurality of color filters on the semiconductor substrate that face each of the plurality of photoelectric conversion elements. The imaging device further includes a partition wall on the semiconductor substrate that provides separation between one color filter and another color filter adjacent to each other among the plurality of color filters. The partition wall includes a first metal layer, a translucent first partition wall layer that covers a side surface of the first metal layer, and a translucent second partition wall layer located between the first metal layer and the first partition wall layer. A refractive index of the second partition wall layer is larger than a refractive index of the first partition wall layer.

Claims (46)

1. A light detecting device, comprising:

a semiconductor substrate comprising:

a first surface configured to receive light; and

a second surface opposite to the first surface;

a lens on a side opposite to the first surface of the semiconductor substrate;

a first photoelectric conversion region in the semiconductor substrate;

a second photoelectric conversion region in the semiconductor substrate and adjacent to the first photoelectric conversion region;

a first color filter above the first photoelectric conversion region in a cross-sectional view;

a second color filter above the second photoelectric conversion region in the cross-sectional view; and

a separation region between the first color filter and the second color filter in the cross-sectional view, wherein

the separation region includes a first film, a second film, and a first metal film,

the first film is between the first color filter and the second film in the cross-sectional view,

the second film is between the first film and the first metal film in the cross-sectional view,

the first metal film includes an upper end surface, a first side surface, a second side surface on a side opposite to the first side surface,

the first side surface faces the first color filter and the second side surface faces the second color filter, in a horizontal direction parallel to the first surface,

the upper end surface faces an end portion of the lens in a direction orthogonal to the horizontal direction,

a first distance is a distance between the first side surface of the first metal film and a first side of the first film,

a second distance is a distance between the second side surface of the first metal film and a second side of the first film,

the second side of the first film is opposite to the first side of the first film,

the first distance is different from the second distance,

a refractive index of the first film is less than a refractive index of the first color filter, and

the refractive index of the first film is less than a refractive index of the second film.

2. The light detecting device according to claim 1 , wherein

the separation region further includes a third film, and

the third film includes silicon oxide.

3. The light detecting device according to claim 2 , further comprising a second metal film, wherein

the second metal film includes a metal,

the second metal film is covered by the third film, and

the third film is between the second film and the second metal film in the cross-sectional view.

4. The light detecting device according to claim 1 , wherein the first film includes silicon.

5. The light detecting device according to claim 1 , wherein the first film includes oxide.

6. The light detecting device according to claim 1 , wherein the second film includes silicon carbide, and wherein the second film has an amorphous crystal structure.

7. The light detecting device according to claim 1 , wherein the second film is below the first film in the cross-sectional view.

8. The light detecting device according to claim 1 , wherein the second film covers the upper end surface of the first metal film.

9. The light detecting device according to claim 1 , wherein

a first portion of the second film covers the first side surface of the first metal film,

a second portion of the second film covers the second side surface of the first metal film, and

a thickness of the first portion is different from a thickness of the second portion.

10. The light detecting device according to claim 1 , wherein a width of the first color filter is different from a width of the second color filter.

11. The light detecting device according to claim 1 , wherein

the semiconductor substrate further includes an element separation layer that separates the first photoelectric conversion region from the second photoelectric conversion region which is adjacent to the first photoelectric conversion region,

the separation region is on the element separation layer, and

the element separation layer includes

a third metal film, and

an insulating film that covers a side surface of the third metal film.

12. The light detecting device according to claim 11 , wherein the first metal film is integrated with the third metal film.

Continuity (2)
Continuation 17756175
Related Publication 20230042668A1 · Feb 9, 2023
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