Display device and method of manufacturing the same
A display device includes a first electrode disposed on a substrate, a first insulating film disposed on the first electrode and having a first opening formed, a second insulating film disposed on the first insulating film and having a second opening, and a contact electrode electrically contacting at least a portion of the first electrode through the first opening and the second opening, wherein a side surface of the first insulating film defines the first opening, and the second insulating film overlaps the side surface of the first insulating film such that the contact electrode and the first insulating film are not in contact with each other.
1. A method of manufacturing a display device, the method comprising:
arranging a first electrode on a substrate;
forming a first insulating film on the first electrode;
disposing a light-emitting element directly above a top surface of the first insulating film;
forming a second insulating film on the first insulating film;
forming a first opening having a first diameter in the first insulating film;
forming a second opening having a second diameter in the second insulating film; and
patterning a contact electrode to electrically contact the first electrode,
wherein the forming of the second opening includes:
forming the second diameter to be smaller than the first diameter such that the second insulating film overlaps a side surface of the first insulating film.
2. The method of claim 1 , wherein the patterning of the contact electrode includes allowing the contact electrode to electrically contact the first electrode through the first opening and the second opening.
3. The method of claim 1 , wherein the forming of the first insulating film includes:
arranging a first refractive layer having a first refractive index; and
arranging a second refractive layer having a second refractive index greater than the first refractive index.
4. The method of claim 1 , wherein the forming of the first opening and the forming of the second opening are performed through a dry etching process.
5. The method of claim 1 , further comprising:
forming a third insulating film on the second insulating film; and
forming a third opening having a third diameter in the third insulating film.
6. The method of claim 5 , wherein the forming of the second opening and the forming of the third opening are performed in a single process.
7. The method of claim 5 , wherein the forming of the third opening includes etching the third insulating film such that the third diameter is smaller than the first diameter.
8. The method of claim 1 , further comprising:
arranging a light-emitting element electrically connected to at least a portion of the contact electrode;
forming the second insulating film on the light-emitting element; and
forming a third insulating film to overlap the second insulating film formed on the light-emitting element, wherein
the second insulating film includes an inorganic material, and
the third insulating film includes an organic material.
9. The method of claim 1 , wherein the contact electrode is spaced apart from the first insulating film by at least a portion of the second insulating film covering on the side surface of the first insulating film.
10. The method claim 1 , wherein the light-emitting element is directly disposed on the first insulating film.
11. The method of claim 1 , wherein the first insulating film is disposed directly on the first electrode.
12. The method of claim 1 , wherein the first insulating film completely overlaps the light-emitting element.
13. The method of claim 1 , further comprising
forming a bank pattern on the substrate, wherein
a portion of the first electrode covers at least a portion of a bank pattern such that the portion of the first electrode is above the light-emitting element,
the first electrode completely covers at least one protruding portion of the bank pattern as seen in a side view, and
the bank pattern is spaced apart from the light-emitting element in plan view.