Sublimation in forming a semiconductor
The present disclosure includes apparatuses and methods related to sublimation in forming a semiconductor. In an example, a method may include forming a sacrificial material in an opening of a structure, wherein the sacrificial material displaces a solvent used in a wet clean operation and removing the sacrificial material via sublimation by exposing the sacrificial material to sub-atmospheric pressure.
1. A method, comprising:
holding a batch of semiconductor wafers in a carrier, wherein the semiconductor wafers include structures with openings;
receiving, at a chamber, the carrier;
performing a wet clean operation on the structures in an inert atmosphere;
receiving a reactive gas and a solution;
forming sacrificial material in the openings of the structures by the reactive gas and the solution, wherein the sacrificial material displaces isopropyl alcohol from the wet clean operation;
exposing the batch of semiconductor wafers in the carrier to a moisture-containing atmosphere, wherein the sacrificial material prevents oxidation and condensation in the openings of the structures when the batch of semiconductor wafers including the structures with the openings including the sacrificial material are exposed to the moisture-containing atmosphere; and
removing the sacrificial material from the openings of the structures via sublimation.
2. The method of claim 1 , further comprising removing the sacrificial material from the openings of the structures via sublimation by pressurizing the chamber to sub-atmospheric pressure using a pump.
3. The method of claim 1 , further comprising removing the sacrificial material from the openings of the structures via sublimation by heating the structures.
4. The method of claim 1 , further comprising removing the sacrificial material from the openings of the structures via sublimation by removing a different gas from the chamber.
5. The method of claim 1 , further comprising removing the sacrificial material from the openings of the structures via sublimation by creating sub-atmospheric pressure in the chamber using a vacuum.
6. A method, comprising:
performing a wet clean operation on a structure in an inert atmosphere;
displacing a solvent used in the wet clean operation in an opening of the structure with a sacrificial material formed by a reactive gas and a solution;
exposing the structure with the sacrificial material to oxygen; and
removing the sacrificial material from the opening of the structure via sublimation.
7. The method of claim 6 , wherein the solvent is isopropyl alcohol (IPA).
8. The method of claim 6 , further comprising removing the sacrificial material from the opening of the structure via sublimation by heating the structure.
9. The method of claim 6 , further comprising removing the sacrificial material from the opening of the structure via sublimation by removing a different reactive gas from the structure.
10. The method of claim 6 , further comprising removing the sacrificial material from the opening of the structure via sublimation by exposing the sacrificial material to sub-atmospheric pressure.