Gate spacing in integrated circuit structures
Discussed herein is gate spacing in integrated circuit (IC) structures, as well as related methods and components. For example, in some embodiments, an IC structure may include: a first gate metal having a longitudinal axis; a second gate metal, wherein the longitudinal axis of the first gate metal is aligned with a longitudinal axis of the second gate metal; a first dielectric material continuously around the first gate metal; and a second dielectric material continuously around the second gate metal, wherein the first dielectric material and the second dielectric material are present between the first gate metal and the second gate metal.
1. An integrated circuit (IC) structure, comprising:
a first gate electrode;
a second gate electrode;
a first dielectric material continuously around a first end of the first gate metal; and
a second dielectric material continuously around a second end of the second gate metal, wherein at least a portion of the first dielectric material and at least a portion of the second dielectric material are present between the first end and the second end, and the portion of the first dielectric material abuts the portion of the second dielectric material.
2. The IC structure of claim 1 , wherein the first dielectric material is continuously around one or more side faces of the first gate electrode.
3. The IC structure of claim 1 , wherein the second dielectric material is continuously around one or more side faces of the second gate electrode.
4. The IC structure of claim 1 , wherein a longitudinal axis of the first gate electrode is aligned with a longitudinal axis of the second gate electrode.
5. The IC structure of claim 1 , wherein the first dielectric material and the second dielectric material have a same material composition.
6. The IC structure of claim 1 , further comprising:
a first gate dielectric continuously around the first gate electrode, wherein the first gate dielectric is between the first dielectric material and the first gate electrode; and
a second gate dielectric continuously around the second gate electrode, wherein the second gate dielectric is between the second dielectric material and the second gate electrode.
7. The IC structure of claim 1 , wherein the first gate electrode is in a memory cell.
8. The IC structure of claim 7 , wherein the first dielectric material is continuously around one or more side faces of the first gate dielectric, and the second dielectric material is continuously around one or more side faces of the second gate dielectric.
9. The IC structure of claim 1 , wherein a longitudinal axis of the first gate dielectric is aligned with a longitudinal axis of the second gate dielectric.
10. The IC structure of claim 7 , wherein a distance between the first gate dielectric and the second gate dielectric is between 5 nanometers and 12 nanometers.
11. The IC structure of claim 7 , wherein the first dielectric material and the second dielectric material have a same material composition.
12. The IC structure of claim 7 , wherein the IC structure further includes:
an array of channel regions, including a first channel region and an adjacent second channel region, wherein axes of the first channel region and the second channel region are parallel and offset;
a first semiconductor region proximate to the first channel region;
a second semiconductor region proximate to the second channel region; and
an insulating material region at least partially between the first semiconductor region and the second semiconductor region.
13. The IC structure of claim 12 , wherein the insulating material region includes a first insulating material and a second insulating material, and the first insulating material is between the second insulating material and the first semiconductor region.
14. An integrated circuit (IC) structure, comprising:
a first gate dielectric;
a second gate dielectric;
a first dielectric material continuously around a first end of the first gate dielectric, a first portion of the first dielectric material contacting the first end; and
a second dielectric material continuously around a second end of the second gate dielectric, a second portion of the first dielectric material contacting the second end,
wherein first portion abuts the second portion.
15. An integrated circuit (IC) structure, comprising:
a first gate;
a second gate;
a first dielectric material continuously around a first end of the first gate; and
a second dielectric material continuously around a second end of the second gate, wherein a portion of the first dielectric material and a portion of the second dielectric material are present between the first end and the second end, and the portion of the first dielectric material abuts the portion of the second dielectric material.
16. The IC structure of claim 15 , wherein:
the first gate includes a first gate dielectric continuously around a first gate electrode, wherein the first gate dielectric is between the first dielectric material and the first gate electrode; and
the second gate includes a second gate dielectric continuously around a second gate electrode, wherein the second gate dielectric is between the second dielectric material and the second gate electrode.
17. The IC structure of claim 16 , wherein the first gate dielectric and the first dielectric material have different material compositions, and the second gate dielectric and the second dielectric material have different material compositions.
18. The IC structure of claim 15 , wherein a distance between the first gate and the second gate is less than 20 nanometers.
19. The IC structure of claim 15 , wherein the IC structure further includes:
an array of channel regions, including a first channel region and an adjacent second channel region, wherein axes of the first channel region and the second channel region are parallel and offset;
a first semiconductor region proximate to the first channel region;
a second semiconductor region proximate to the second channel region; and
an insulating material region at least partially between the first semiconductor region and the second semiconductor region.
20. The IC structure of claim 19 , wherein the insulating material region includes a first insulating material and a second insulating material, wherein the first insulating material has a U-shaped cross-section, and the first insulating material is between the second insulating material and the first semiconductor region.