IP Library › Granted Patent US 12,336,438
Granted Patent B2
US 12,336,438 · App. 17/582,800 · Granted Jun 17, 2025

Optically transparent surface gate for a qubit memory cell

Inventor: Robert Willett (Warren, NJ)
Assignee: Nokia Technologies Oy
H10N60/128G06N10/40G06N10/60G11C11/44H10N60/11
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,336,438
App. No.
17/582,800
Granted
Jun 17, 2025
Kind
B2
Abstract

A qubit memory cell having a thin, optically transparent, metal surface gate that laterally fits into the corresponding region of the memory cell, while not being in direct contact with the perimeter of the region. The surface gate may have apertures to accommodate therein the dot-like control electrodes of the qubit and enable the corresponding electrical overpass bridges to be connected to those dot-like control electrodes. The thickness of the surface gate may be selected such as to let a substantial portion of light impinging thereupon penetrate to the underlying surface of the substrate. In at least some embodiments, the electrical-interconnect structure of the memory cell may be designed to enable separate electrical biasing of the surface gate, e.g., independent of the electrical biasing of some other electrodes of the memory cell. Advantageously, such a surface gate may significantly reduce detrimental clumping of charge carriers in the memory cell.

Claims (32)

1. An apparatus, comprising:

a semiconductor substrate having a quantum-well structure corresponding to one or more memory cells, each of the memory cells having a pattern of controllable electrodes, the electrodes laterally defining a physical sequence of two or more lateral regions of the quantum-well structure joined by one or more channels; and

one or more metal surface gates on the surface of the substrate substantially covering the two or more lateral regions, the one or more metal surface gates having a thickness that enables a substantial portion of light impinging thereupon to penetrate therethrough to the surface of the substrate; and

wherein the electrodes are controllable to deplete lateral areas of the quantum-well structure of charge carriers such that a 2-dimensional droplet of the charge carriers in the quantum-well structure is localized laterally along the substrate beneath the one or more metal surface gates;

wherein the one or more metal surface gates have one or more openings, each of the one or more openings having therein a respective dot-like electrode of the pattern of controllable electrodes; and

wherein each of the one or more dot-like electrodes is not in direct electrical contact with any of the one or more metal surface gates; and

wherein each of the one or more dot-like electrodes is in direct electrical contact with a corresponding electrical overpass bridge.

2. The apparatus of claim 1 , wherein the thickness is selected to cause at least 10% of the light to penetrate to the surface of the substrate.

3. The apparatus of claim 1 , wherein the thickness is selected to cause at least 50% of the light to penetrate to the surface of the substrate.

4. The apparatus of claim 1 , wherein the one or more metal surface gates comprise a metal film deposited on the surface.

5. The apparatus of claim 4 , wherein the metal film is partially transparent to red light.

6. The apparatus of claim 4 , wherein the metal film comprises palladium.

7. The apparatus of claim 4 , wherein the metal film is partially transparent to light having a photon energy larger than a bandgap of the quantum-well structure.

8. The apparatus of claim 1 , further comprising a metal interconnect structure enabling at least one of the one or more metal surface gates to receive a separate electrical bias.

9. The apparatus of claim 1 , wherein the one or more metal surface gates include first and second metal surface gates, which are not in direct electrical contact with each other.

10. The apparatus of claim 9 , further comprising a metal interconnect structure enabling the first and second metal surface gates to receive different respective electrical biases.

11. The apparatus of claim 1 , wherein the electrodes are controllable to perform one or more of the following:

store a multi-qubit state on the droplet, while the droplet is maintained in a fractional-quantum-Hall-effect state;

read one or more qubit values stored in the one or more memory cells; and

do an entanglement computation with said multi-qubit state stored on the droplet.

12. The apparatus of claim 1 , wherein the electrodes are controllable to perform two or more of the following:

store a multi-qubit state on the droplet, while the droplet is maintained in a fractional-quantum-Hall-effect state;

read one or more qubit values stored in the one or more memory cells; and

do an entanglement computation with said multi-qubit state stored on the droplet.

13. The apparatus of claim 1 , wherein the electrodes are controllable to perform the following:

store a multi-qubit state on the droplet, while the droplet is maintained in a fractional-quantum-Hall-effect state;

read one or more qubit values stored in the one or more memory cells; and

do an entanglement computation with said multi-qubit state stored on the droplet.

14. The apparatus of claim 1 , wherein:

the electrodes laterally define the physical sequence of at least first and second lateral regions of the quantum-well structure; and

the apparatus comprises at least first and second metal surface gates substantially covering the at least first and second lateral regions, respectively.

15. The apparatus of claim 14 , wherein the first and second metal surface gates are electrically separated by a gap.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2022
From: NOKIA OF AMERICA CORPORATION
To: NOKIA TECHNOLOGIES OY
Reel/Frame 058884/0137 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2022
From: WILLETT, ROBERT
To: NOKIA OF AMERICA CORPORATION
Reel/Frame 058884/0141 →
Continuity (1)
Related Publication 20230240155A1 · Jul 27, 2023
References Cited (20)
US 7960714B2 · Baldwin et al. · 2011 [cited by applicant]
US 8324120B2 · Baldwin et al. · 2012 [cited by applicant]
US 8362461B2 · Baldwin et al. · 2013 [cited by applicant]
US 8633092B2 · Baldwin et al. · 2014 [cited by applicant]
US 8987703B2 · Willett · 2015 [cited by applicant]
US 9748473B2 · Willett · 2017 [cited by applicant]
US 10262871B1 · Nayfeh et al. · 2019 [cited by applicant]
US 10956267B2 · Kapit · 2021 [cited by applicant]
US 11171211B1 · Park · 2021 [cited by examiner]
US 20100155697A1 · Baldwin et al. · 2010 [cited by applicant]
US 20150155478A1 · Willett · 2015 [cited by applicant]
US 20200098990A1 · Nayfeh · 2020 [cited by applicant]
US 20200135254A1 · Willett · 2020 [cited by examiner]
US 20200364598A1 · Ashikhmin · 2020 [cited by applicant]
US 20210247917A1 · Willett · 2021 [cited by applicant]
US 20220122877A1 · Or-Bach · 2022 [cited by examiner]
WO 2020180956A1 · 2020 [cited by applicant]
Bruzewicz, Colin D., et al. “Trapped-Ion Quantum Computing: Progress and Challenges.” arXiv preprint, arxiv.org, arXiv:1904.04178v1 (Apr. 8, 2019): 1-56. [cited by applicant]
Nayak, Chetan, et al. “Non-Abelian Anyons and Topological Quantum Computation.” arXiv preprint, arxiv.org, arXiv:0707.1889v2 (Mar. 28, 2008): 1-73. [cited by applicant]
Nickerson, Naomi H., et al. “Topological quantum computing with a very noisy network and local error rates approaching one percent.” Nature Communications 4.1756 (2013): 1-12. [cited by applicant]