IP Library › Granted Patent US 12,341,026
Granted Patent B2
US 12,341,026 · App. 18/447,353 · Granted Jun 24, 2025

Chemical dispensing system

Inventors: Ming-Chieh Hsu (Hsinchu, TW); Yung-Long Chen (New Taipei, TW); Fang-Pin Chiang (Taichung, TW); Feng-An Yang (Hsinchu, TW); Ching-Jung Hsu (Hsinchu, TW); Chi-Tung Lai (Hsinchu, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L21/67017H01L21/306
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,341,026
App. No.
18/447,353
Granted
Jun 24, 2025
Kind
B2
Abstract

A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.

Claims (54)

1. A chemical dispensing system, comprising:

a first chemical supply line configured to:

provide a semiconductor processing chemical in a day tank to a production point of use (POU) manifold when the chemical dispensing system is in a first independent production and test configuration, and

provide the semiconductor processing chemical in the day tank to a chemical test POU manifold when the chemical dispensing system is in a second independent production and test configuration; and

a second chemical supply line configured to:

provide the semiconductor processing chemical in a storage drum to the chemical test POU manifold when the chemical dispensing system is in the first independent production and test configuration,

wherein the first chemical supply line is different from the second chemical supply line when the chemical dispensing system is in the first independent production and test configuration, and

wherein the first chemical supply line is configured to simultaneously provide the semiconductor processing chemical in the day tank to the production POU manifold while the second chemical supply line provides the semiconductor processing chemical in the storage drum to the chemical test POU manifold when the chemical dispensing system is in the first independent production and test configuration, and

provide the semiconductor processing chemical in the storage drum to the production POU manifold when the chemical dispensing system is in the second independent production and test configuration.

2. The chemical dispensing system of claim 1 , further comprising:

a controller configured to cause the chemical dispensing system to be transitioned from a production supply configuration to the first independent production and test configuration.

3. The chemical dispensing system of claim 1 , wherein the first chemical supply line is further configured to provide the semiconductor processing chemical in the day tank to at least the production POU manifold when the chemical dispensing system is in a production supply configuration.

4. The chemical dispensing system of claim 3 , wherein the first chemical supply line is further configured to provide the semiconductor processing chemical in the day tank to the chemical test POU manifold when the chemical dispensing system is in the production supply configuration.

5. The chemical dispensing system of claim 1 , wherein the first chemical supply line is configured to simultaneously provide the semiconductor processing chemical in the day tank to the chemical test POU manifold while the second chemical supply line provides the semiconductor processing chemical in the storage drum to the production POU manifold when the chemical dispensing system is in the second independent production and test configuration.

6. The chemical dispensing system of claim 1 , wherein the first chemical supply line is configured to use one or more of a different valve, a different pump, a different filter, or a different pipe from the second chemical supply line when the chemical dispensing system is in the first independent production and test configuration.

7. The chemical dispensing system of claim 1 , wherein the first chemical supply line is configured to use one or more of a different valve, a different pump, a different filter, or a different pipe from the second chemical supply line when the chemical dispensing system is in the second independent production and test configuration.

8. A method, comprising:

determining, by one or more processors, that a new batch of a semiconductor processing chemical was added to a storage drum of a chemical dispensing system;

causing, by the one or more processors and based on determining that the new batch was added to the storage drum, the chemical dispensing system to be transitioned from a production supply configuration to an independent production and test configuration; and

causing, by the one or more processors and based on the chemical dispensing system being configured in the independent production and test configuration, a first chemical supply line of the chemical dispensing system to provide the semiconductor processing chemical in a day tank to a first one of a production point of use (POU) manifold or a chemical test POU manifold and a second chemical supply line of the chemical dispensing system to provide the semiconductor processing chemical in the storage drum to a second one of the production POU manifold or the chemical test POU manifold.

9. The method of claim 8 , further comprising:

causing, based on the chemical dispensing system being configured in the independent production and test configuration, the first chemical supply line to simultaneously provide the semiconductor processing chemical in the day tank to the production POU manifold while the second chemical supply line provides the semiconductor processing chemical in the storage drum to the chemical test POU manifold.

10. The method of claim 8 , further comprising:

causing, based on the chemical dispensing system being configured in the independent production and test configuration, the first chemical supply line to simultaneously provide the semiconductor processing chemical in the day tank to the chemical test POU manifold while the second chemical supply line provides the semiconductor processing chemical in the storage drum to the production POU manifold.

11. The method of claim 8 , further comprising:

causing, based on the chemical dispensing system being configured in the production supply configuration, the first chemical supply line to provide the semiconductor processing chemical in the day tank to at least the production POU manifold.

12. The method of claim 11 , further comprising:

causing, based on the chemical dispensing system being configured in the production supply configuration, the first chemical supply line to provide the semiconductor processing chemical in the day tank to the chemical test POU manifold.

13. The method of claim 8 , further comprising:

causing, based on the chemical dispensing system being configured in the independent production and test configuration, a first pump to provide the semiconductor processing chemical in the day tank to the production POU manifold through the first chemical supply line; and

causing, based on the chemical dispensing system being configured in the independent production and test configuration, a second pump to provide the semiconductor processing chemical in the storage drum to the chemical test POU manifold through the second chemical supply line.

14. The method of claim 8 , further comprising:

causing, based on the chemical dispensing system being configured in the independent production and test configuration, a first pump to provide the semiconductor processing chemical in the day tank to the chemical test POU manifold through the first chemical supply line; and

causing, based on the chemical dispensing system being configured in the independent production and test configuration, a second pump to provide the semiconductor processing chemical in the storage drum to the production POU manifold through the second chemical supply line.

15. The method of claim 8 , further comprising:

determining, based on determining that the new batch was added to the storage drum, to filter the semiconductor processing chemical in the storage drum;

identifying a configured quantity of filtration cycles for filtering the semiconductor processing chemical; and

causing a pump to circulate the semiconductor processing chemical through a filter included in the chemical dispensing system for a quantity of filtration cycles equal to the configured quantity of filtration cycles.

16. A device, comprising:

one or more memories; and

one or more processors, communicatively coupled to the one or more memories, configured to:

determine to filter a semiconductor processing chemical in a storage drum included in a chemical dispensing system;

identify a configured quantity of filtration cycles for filtering the semiconductor processing chemical;

cause a pump to circulate the semiconductor processing chemical through a filter included in the chemical dispensing system for a quantity of filtration cycles equal to the configured quantity of filtration cycles; and

cause another pump to provide the semiconductor processing chemical in a day tank to one or more of a production point of use (POU) manifold or a chemical test POU manifold in parallel with the semiconductor processing chemical being circulated through the filter.

17. The device of claim 16 , wherein the one or more processors, to cause the pump to circulate the semiconductor processing chemical through the filter for the quantity of filtration cycles, are configured to:

cause the pump to circulate the semiconductor processing chemical through a first supply line that is independent from a second supply line that is used to provide the semiconductor processing chemical in the day tank to the production POU manifold.

18. The device of claim 17 , wherein the one or more processors are further configured to:

cause the other pump to provide the semiconductor processing chemical in the day tank to the production POU manifold through the second supply line.

19. The device of claim 17 , wherein the one or more processors are further configured to:

cause the other pump to provide the semiconductor processing chemical in the day tank to the chemical test POU manifold through a third supply line.

20. The device of claim 16 , wherein the one or more processors, to determine to filter the semiconductor processing chemical in the storage drum, are configured to:

determine that the storage drum is in a standby mode; and

determine to filter the semiconductor processing chemical based on the storage drum being in the standby mode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 10, 2023
From: HSU, MING-CHIEH; CHEN, YUNG-LONG; CHIANG, FANG-PIN; YANG, FENG-AN; HSU, CHING-JUNG; LAI, CHI-TUNG
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 064553/0958 →
Continuity (2)
Continuation 16887647 · May 29, 2020
Related Publication 20230386867A1 · Nov 30, 2023
References Cited (6)
US 5024766A · Mahmud · 1991 [cited by applicant]
US 5148945A · Geatz · 1992 [cited by applicant]
US 5417346A · Ferri, Jr. et al. · 1995 [cited by applicant]
US 5832948A · Schell · 1998 [cited by applicant]
US 6224252B1 · Munroe et al. · 2001 [cited by applicant]
US 20210375645A1 · Hsu et al. · 2021 [cited by applicant]