Display device including an encapsulation structure
A display device includes a substrate. A display element is disposed over the substrate. A first inorganic encapsulation layer is disposed on the display element. An organic encapsulation layer is disposed on the first inorganic encapsulation layer. An auxiliary layer is disposed between the first inorganic encapsulation layer and the organic encapsulation layer. The auxiliary layer has a thickness less than about 100 nm, and includes an inorganic insulating material. A second inorganic encapsulation layer is disposed on the organic encapsulation layer.
1. A display device comprising:
a substrate;
a display layer disposed over the substrate; and
an encapsulation layer on the display layer, wherein the encapsulation layer comprises:
an organic encapsulation layer including a bottom surface facing the display layer and a top surface opposite to the bottom surface;
an inorganic encapsulation layer on the top surface of the organic encapsulation layer;
a first inorganic insulating layer between a top surface of the display layer and the bottom surface of the organic encapsulation layer, wherein the first inorganic insulating layer includes a bottom surface facing the display layer and a top surface facing the bottom surface of the organic encapsulation layer; and
a second inorganic insulating layer between the bottom surface of the organic encapsulation layer and the top surface of the first inorganic insulating layer, such that the first inorganic insulating layer and the second inorganic insulating layer are disposed on a same side of the organic encapsulation layer,
wherein the second inorganic insulating layer and the first inorganic insulating layer comprise same non-metal atoms as each other, wherein the same non-metal atoms include oxygen atoms, and
wherein the second inorganic insulating layer comprises an oxygen-rich layer that has a refractive index less than a refractive index of the first inorganic insulating layer such that there is an interface between the first inorganic insulating layer including the non-metal atoms including oxygen atoms and the second inorganic insulating layer including the non-metal atoms including oxygen atoms and having the refractive index less than that of the first inorganic insulating layer.
2. The display device of claim 1 , wherein the oxygen-rich layer comprises an oxygen-rich silicon oxynitride layer.
3. The display device of claim 1 , wherein the first inorganic insulating layer has a thickness raging from about 600 nm to about 2,200 nm.
4. The display device of claim 1 , further comprising:
a LiF layer between the display layer and the first inorganic insulating layer.
5. The display device of claim 1 , wherein the inorganic encapsulation layer comprises aluminum oxide, titanium oxide, tantalum oxide, hafnium oxide, zinc oxide, silicon oxide, silicon nitride, or silicon oxynitride.
6. The display device of claim 1 , wherein a bottom surface of the second inorganic insulating layer is in direct contact with the top surface of the first inorganic insulating layer.
7. A display device comprising:
a substrate;
a display layer disposed over the substrate; and
an encapsulation layer on the display layer, wherein the encapsulation layer comprises:
an organic encapsulation layer including a bottom surface facing the display layer and a top surface opposite to the bottom surface;
an inorganic encapsulation layer on the top surface of the organic encapsulation layer; and
a stack of inorganic insulating layers between a top surface of the display layer and the bottom surface of the organic encapsulation layer, wherein the stack of inorganic insulating layers comprises:
a first inorganic insulating layer, a second inorganic insulating layer, and a third inorganic insulating layer comprise same non-metal atoms as each other, wherein the same non-metal atoms include oxygen atoms,
wherein the third inorganic insulating layer has a refractive index less than a refractive index of the first inorganic insulating layer or a refractive index of the second inorganic insulating layer,
wherein the first inorganic insulating layer, the second inorganic insulating layer, and the third inorganic insulating layer are all disposed on a same side of the organic encapsulation layer, and
wherein there in a first interface between the first inorganic insulating layer including the non-metal atoms including oxygen atoms and the second inorganic insulating layer including the non-metal atoms including oxygen atoms, and a second interface between the second inorganic insulating layer including the non-metal atoms including oxygen atoms and the third inorganic insulating layer including the non-metal atoms including oxygen atoms.
8. The display device of claim 7 , wherein the first, second, and third inorganic insulating layers respectively comprise different Si, O, and N content ratios or concentrations.
9. The display device of claim 7 , wherein the first inorganic insulating layer has a thickness raging from about 600 nm to about 2,200 nm.
10. The display device of claim 7 , further comprising:
a LiF layer between the display layer and the first inorganic insulating layer.
11. The display device of claim 7 , wherein the inorganic encapsulation layer comprises aluminum oxide, titanium oxide, tantalum oxide, hafnium oxide, zinc oxide, silicon oxide, silicon nitride, or silicon oxynitride.
12. A display device comprising:
a substrate;
a display layer disposed over the substrate; and
an encapsulation layer on the display layer, wherein the encapsulation layer comprises:
an organic encapsulation layer including a bottom surface facing the display layer and a top surface opposite to the bottom surface;
an inorganic encapsulation layer on the top surface of the organic encapsulation layer;
a first inorganic insulating layer between a top surface of the display layer and the bottom surface of the organic encapsulation layer, wherein the first inorganic insulating layer includes a bottom surface facing the display layer and a top surface facing the bottom surface of the organic encapsulation layer; and
a second inorganic insulating layer between the bottom surface of the organic encapsulation layer and the top surface of the first inorganic insulating layer, such that the first inorganic insulating layer and the second inorganic insulating layer are disposed on a same side of the organic encapsulation layer,
wherein the second inorganic insulating layer has a refractive index less than a refractive index of the first inorganic insulating layer, and a thickness of the second inorganic insulating layer is less than a thickness of the first inorganic insulating layer such that there is an interface between the first inorganic insulating layer including the non-metal atoms including oxygen atoms and the second inorganic insulating layer including the non-metal atoms including oxygen atoms, having the refractive index less than that of the first inorganic insulating layer, and being thinner than the first inorganic insulating layer.
13. The display device of claim 12 , wherein the second inorganic insulating layer and the first inorganic insulating layer comprise same non-metal atoms as each other, wherein the same non-metal atoms include oxygen atoms.
14. The display device of claim 13 , wherein the second inorganic insulating layer comprises an oxygen-rich layer.
15. The display device of claim 14 , wherein the second inorganic insulating layer and the first inorganic insulating layer respectively comprise different Si, O, and N content ratios or concentrations.
16. The display device of claim 12 , further comprising:
a LiF layer between the display layer and the first inorganic insulating layer.
17. The display device of claim 12 , wherein the inorganic encapsulation layer comprises aluminum oxide, titanium oxide, tantalum oxide, hafnium oxide, zinc oxide, silicon oxide, silicon nitride, or silicon oxynitride.