IP Library › Granted Patent US 12,351,940
Granted Patent B2
US 12,351,940 · App. 17/663,602 · Granted Jul 8, 2025

Liner and epitaxial reactor comprising same

Inventors: Se Ri Lee (Gumi-si, KR); Seung Chul Back (Gumi-si, KR)
Assignee: SK SILTRON CO., LTD.
C30B25/12C23C16/4583
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Quick Facts
Patent No.
US 12,351,940
App. No.
17/663,602
Granted
Jul 8, 2025
Kind
B2
Abstract

According to an aspect of the present disclosure, there is provided a liner of an epitaxial reactor, including a lower body including an entrance stepped portion which is disposed on an upper end of one side of an outer side surface of the lower body and through which a source gas is introduced, a plurality of lower partitions disposed apart from each other on the entrance stepped portion, an upper body disposed on the lower body to face the lower body and including an entrance cover part forming a flow path which is interposed between the entrance stepped portion and the entrance cover part and through which the source gas is introduced, and a plurality of upper partitions disposed apart from each other on the entrance cover part, wherein the upper partitions are more densely disposed in both side portions than in a central portion of the entrance cover part.

Claims (15)

1. A liner of an epitaxial reactor, comprising:

a lower body including an entrance stepped portion which is disposed on an upper end of one side of an outer side surface of the lower body and through which a source gas is introduced and an exit stepped portion which is disposed at an upper end of the other side of the outer side surface and through which the source gas is discharged;

a plurality of lower partitions disposed on the entrance stepped portion to be spaced apart from each other;

an upper body disposed on the lower body to face the lower body and including an entrance cover part forming a flow path which is interposed between the entrance stepped portion and the entrance cover part and through which the source gas is introduced and an exit cover part forming a flow path which is interposed between the exit stepped portion and the exit cover part and through which the source gas is discharged; and

a plurality of upper partitions disposed apart from each other on the entrance cover part and the exit cover part,

wherein the upper partitions are more densely disposed in both side portions of the entrance cover part than in a central portion of the entrance cover part and in the exit cover part, and

wherein some of the upper partitions are formed with greater thicknesses than the lower partitions in the both side portions of the entrance cover part.

2. The liner of claim 1 , wherein the lower partitions are disposed at both sides of the entrance stepped portion at predetermined intervals.

3. The liner of claim 1 , wherein some of the upper partitions are disposed in a line with the lower partitions in the central portion of the entrance cover part in a direction in which the source gas is introduced.

4. The liner of claim 1 , wherein some of the upper partitions are more densely disposed than the lower partitions in the both side portions of the entrance cover part.

5. The liner of claim 4 , wherein some of the upper partitions are disposed in a line with the lower partitions in the both side portions of the entrance cover part in a direction in which the source gas is introduced.

6. The liner of claim 4 , wherein two or more of some of the upper partitions are disposed between the lower partitions in the both side portions of the entrance cover part.

7. The liner of claim 1 , wherein the others of the upper partitions are formed with the same thicknesses as the lower partitions in the central portion of the entrance cover part.

8. The liner of claim 1 , wherein at least two or more of some of the upper partitions are disposed between the lower partitions in the both side portions of the entrance cover part.

9. The liner of claim 1 , wherein the upper partitions are formed of a quartz material and integrally formed with the entrance cover part.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2022
From: LEE, SE RI; BACK, SEUNG CHUL
To: SK SILTRON CO., LTD.
Reel/Frame 060079/0011 →
Priority Claims (1)
KR 10-2022-0020611 · Feb 17, 2022 · national
Continuity (1)
Related Publication 20230257903A1 · Aug 17, 2023
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