IP Library › Granted Patent US 12,366,831
Granted Patent B2
US 12,366,831 · App. 17/749,653 · Granted Jul 22, 2025

Fabrication of glass cells for hermetic gas enclosures

Inventors: Serge Lukas Zihlmann (Gasel, CH); Johannes Peter Kind (Bern, CH)
Assignee: mb-microtec ag
G04F5/12C03B15/14C03B23/057G04F5/14B81B3/0078B81B2201/058B81C1/00682B81C2203/0145B81C2203/0172
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Quick Facts
Patent No.
US 12,366,831
App. No.
17/749,653
Granted
Jul 22, 2025
Kind
B2
Abstract

A method of fabricating one or more glass cells includes drawing one or more glass capillaries from a source of glass material. The method includes performing a first conditioning of one or more inner surfaces of the one or more capillaries. The method includes sealing one or more first ends of the one or more capillaries using thermal energy. The method includes performing a second conditioning of the one or more inner surfaces after the sealing. The method includes purifying the one or more capillaries to increase a purity of a gas used to fill the one or more capillaries. The method includes filling the one or more capillaries using the gas after the purifying. The method includes pressurizing the one or more capillaries to a given pressure. The method includes sealing one or more second ends of the one or more capillaries using thermal energy.

Claims (22)

1. A method of fabricating one or more glass cells for enclosing a gas, the method comprising:

drawing one or more glass capillaries from a source of glass material comprising aluminosilicate, the drawing comprising:

setting a cross section of the one or more glass capillaries to a height of approximately 0.15 to 5 mm and a width of approximately 0.3 to 10 mm; and

drawing the one or more glass capillaries to a length of approximately 5 to 1500 mm;

performing a first conditioning of one or more inner surfaces of the one or more glass capillaries, the first conditioning comprising a wet process, a dry process, or wet and dry cleaning processes;

sealing one or more first ends of the one or more glass capillaries by applying thermal energy to the one or more first ends;

performing a second conditioning of the one or more inner surfaces after the sealing, the second conditioning comprising:

a wet process, a dry process, or wet and dry cleaning processes;

heating the one or more glass capillaries to accelerate degassing of the one or more inner surfaces; and

evacuating impurities from the one or more glass capillaries using a vacuum system;

purifying the one or more glass capillaries to increase a purity of a gas used to fill the one or more glass capillaries, the purifying comprising:

filling the one or more glass capillaries using one or more gases; and

evacuating the one or more glass capillaries after the filling;

filling the one or more glass capillaries using the gas after the purifying;

pressurizing the one or more glass capillaries to a given pressure;

sealing one or more second ends of the one or more glass capillaries using thermal energy; and

dividing each of the one or more glass capillaries using thermal energy to produce the one or more glass cells that are seamless and hermetically sealed, wherein a dielectric loss factor of the one or more glass cells is approximately 200·10 −4 or less for a sub-terahertz frequency.

2. The method of claim 1 , wherein the gas is a dipolar gas.

3. The method of claim 2 , wherein the dipolar gas comprises carbonyl sulfide (OCS).

4. The method of claim 1 , wherein the drawing of the one or more glass capillaries from the source of glass material further comprises setting a wall thickness of the one or more glass capillaries to approximately 50 microns to 1 mm.

5. The method of claim 1 , wherein the given pressure is approximately 0.001 to 100 mbar.

6. The method of claim 1 , wherein the purifying further comprises purifying the gas to a purity of approximately 90% or greater.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE THE ASSIGNEE NAME ON THE COVER SHEET PREVIOUSLY RECORDED AT REEL: 060506 FRAME: 0159. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Aug 4, 2022
From: ZIHLMANN, SERGE LUKAS; KIND, JOHANNES PETER
To: MB-MICROTEC AG
Reel/Frame 061602/0191 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2022
From: ZIHLMANN, SERGE LUKAS; KIND, JOHANNES PETER
To: FABRICATION OF GLASS CELLS FOR HERMETIC GAS ENCLOSURES
Reel/Frame 060506/0159 →
Continuity (1)
Related Publication 20230375983A1 · Nov 23, 2023
References Cited (30)
US 3215517A · Zimmermann · 1965 [cited by applicant]
US 3706543A · Thuler · 1972 [cited by applicant]
US 4146380A · Caffarella et al. · 1979 [cited by applicant]
US 4273398A · Summers et al. · 1981 [cited by applicant]
US 9572273B2 · Blunier et al. · 2017 [cited by applicant]
US 10374621B2 · Herbsommer et al. · 2019 [cited by applicant]
US 10544039B2 · Cook et al. · 2020 [cited by applicant]
US 11782392B2 · Herbsommer et al. · 2023 [cited by applicant]
US 20010007197A1 · Oga et al. · 2001 [cited by applicant]
US 20040239038A1 · Kramp et al. · 2004 [cited by applicant]
US 20050007118A1 · Kitching et al. · 2005 [cited by applicant]
US 20070034809A1 · Lal et al. · 2007 [cited by applicant]
US 20210139363A1 · Enderwitz et al. · 2021 [cited by applicant]
US 20220107609A1 · Herbsommer et al. · 2022 [cited by applicant]
AT 513294A1 · 2014 [cited by applicant]
CN 105271653A · 2016 [cited by applicant]
CN 108911489A · 2018 [cited by applicant]
CN 208980572U · 2019 [cited by applicant]
CZ 2020578A3 · 2022 [cited by applicant]
DE 102019130477A1 · 2021 [cited by applicant]
JP 2002274863A · 2002 [cited by applicant]
JP 2004031021A · 2004 [cited by applicant]
JP 2018163910A · 2018 [cited by applicant]
KR 1020060038538A · 2006 [cited by applicant]
WO WO03016231A2 · 2003 [cited by applicant]
WO WO2014045282A1 · 2014 [cited by applicant]
WO WO2017103133A1 · 2017 [cited by applicant]
Kim et al, “Chip-Scale Terahertz Carbonyl Sulfide (OCS) Clock: An Overview and Recent Studies on Long-Term Frequency Stability of OCS Transitions,” IEEE Transactions on Terahertz Science and Technology, May 2019, 15 pag… [cited by applicant]
Wang et al., “Chip-Scale Molecular Clock,” IEEE Journal of Solid-State Circuits, Dec. 2018, 13 pages. [cited by applicant]
Wang et al., “An on-chip fully electronic molecular clock based on sub-terahertz rotational spectroscopy,” Nature Electronics, Jul. 2018, 7 pages. [cited by applicant]