Adhesion promoting photoresist underlayer composition

1. A photoresist underlayer composition, comprising:

a poly (arylene ether) derived from a compound containing two or more cyclopentadienone moieties, wherein the compound is free of a solubility enhancing polar moiety;

an additive of formula (14):

D-(L 1 -Ar—[X] n ) m   (14); and

a solvent,

wherein, in formula (14),

D is a substituted or unsubstituted C 1-60 organic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted C 1-60 organic group;

each L 1 is independently a single bond or a divalent linking group,

when L 1 is a single bond, D may be a substituted or unsubstituted C 3-30 cycloalkyl or substituted or unsubstituted C 1-20 heterocycloalkyl that is optionally fused with Ar,

each Ar is independently a monocyclic or polycyclic C 5-60 aromatic group,

each X is independently −OR 30 , −SR 31 , or −NR 32 R 33 ,

m is an integer of 1 to 6,

each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater,

R 30 to R 33 are each independently hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl, each of which except hydrogen optionally further comprises as part of its structure one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —S—, —S(O)—, —S(O) 2 —, or −NR 34 — wherein R 34 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl, and

when n is 2, optionally any one of R 30 to R 33 of a first group X is a divalent group, any one of R 30 to R 33 of a second group X is a divalent group, and the divalent group of the first group X forms a ring together with the divalent group of the second group X, wherein the ring optionally further comprises a linking group comprising one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 6-30 arylene, —O—, —C(O)—, —C(O)O—, —NR 35 —, —S—, —S(O)—, or —S(O) 2 —, wherein R 35 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl.

2. The photoresist underlayer composition of claim 1 , wherein D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 1-20 heterocycloalkyl, a polyvalent C 6-30 aryl, a polyvalent C 6-30 heteroaryl, —NH 2 or an organic acid salt thereof, or —C(O)OR 22 wherein R 22 is hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl.

3. The photoresist underlayer composition of claim 1 , wherein

D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 6-30 aryl, or a polyvalent C 6-30 heteroaryl,

each L 1 is independently a single bond or a divalent linking group comprising one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —NR 23 —, —S—, —S(O)—, —S(O) 2 —, or —C(O)NR 23 —,

R 23 is hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl,

each Ar is independently a monocyclic or polycyclic C 6-60 arylene group,

each X is independently —OR 30 or —NR 32 R 33 ,

R 30 , R 32 , and R 33 are the same as provided for claim 1 ,

m is an integer of 2 to 4, and

the sum of n is 3 or greater.

4. A photoresist underlayer composition, comprising:

a poly (arylene ether) derived from a compound containing two or more cyclopentadienone moieties,

an additive of formula (15):

a solvent,

wherein, in formula (15),

D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 6-30 aryl, or a polyvalent C 6-30 heteroaryl,

each Ar 5 is a monocyclic or polycyclic C 6-60 arylene group or a monocyclic or polycyclic C 5-60 heteroarylene group,

each X is independently —OR 30 , —SR 31 , or —NR 32 R 33 ,

R 30 to R 33 are each independently hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl, each of which except hydrogen optionally further comprises as part of its structure one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —S—, —S(O)—, —S(O) 2 —, or —NR 34 — wherein R 34 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl,

m is an integer of 2 to 4, and

each n is independently an integer of 1 to 5, provided that the sum of n is 3 or greater.

5. The photoresist underlayer composition of claim 1 , wherein in formula (14), each X is independently —OR 30 , wherein each R 30 is independently hydrogen, substituted or unsubstituted C 1-10 alkyl, substituted or unsubstituted —C(O)—C 1-6 alkyl, substituted or unsubstituted C 3-10 cycloalkyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl.

6. A photoresist underlayer composition, comprising:

a poly (arylene ether) derived from a compound containing two or more cyclopentadienone moieties;

an additive of formula (14):

D-(L 1 -Ar—[X] n ) m   (14); and

a solvent,

wherein, in formula (14),

D is —(C(O)O − )(M + ) or —(NH 3 + )(Z − ),

M + is an organic cation,

Z − is an organic anion,

each L 1 is independently a divalent linking group,

m is 1,

each Ar is independently a monocyclic or polycyclic C 5-60 aromatic group,

each X is independently —OR 30 , —SR 31 , or —NR 32 R 33 ,

n is an integer of 2 to 4, and

R 30 to R 33 are each independently hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl, each of which except hydrogen optionally further comprises as part of its structure one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —S—, —S(O)—, —S(O) 2 —, or —NR 34 — wherein R 34 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl.

7. The photoresist underlayer composition of claim 1 , wherein the additive is present in an amount from 0.1 to 20 wt %, based on total solids of the photoresist underlayer composition.

8. A method of forming a pattern, the method comprising: (a) applying a layer of the photoresist underlayer composition of claim 1 on a substrate; (b) curing the applied photoresist underlayer composition to form a photoresist underlayer; and (c) forming a photoresist layer over the photoresist underlayer.

9. The method of claim 8 , further comprising forming a silicon-containing layer, an organic antireflective coating layer, or a combination thereof, above the photoresist underlayer prior to forming the photoresist layer.

10. The method of claim 8 , further comprising patterning the photoresist layer and transferring a pattern from the patterned photoresist layer to the coating layer and to a layer below the photoresist underlayer.

11. The method of claim 8 , wherein D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 1-20 heterocycloalkyl, a polyvalent C 6-30 aryl, a polyvalent C 6-30 heteroaryl, —NH 2 or an organic acid salt thereof, or —C(O)OR 22 wherein R 22 is hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl.

12. The method of claim 8 , wherein

D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 6-30 aryl, or a polyvalent C 6-30 heteroaryl,

each L 1 is independently a single bond or a divalent linking group comprising one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —NR 23 —, —S—, —S(O)—, —S(O) 2 —, or —C(O)NR 23 —,

R 23 is hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl,

each Ar is independently a monocyclic or polycyclic C 6-60 arylene group,

each X is independently —OR 30 or —NR 32 R 33 ,

R 30 , R 32 , and R 33 are the same as provided for claim 1 ,

m is an integer of 2 to 4, and

the sum of n is 3 or greater.

13. The method of claim 8 , wherein the additive is of formula (15):

wherein,

D is a polyvalent C 1-30 alkyl, a polyvalent C 3-30 cycloalkyl, a polyvalent C 6-30 aryl, or a polyvalent C 6-30 heteroaryl,

each Ar 5 is a monocyclic or polycyclic C 6-60 arylene group or a monocyclic or polycyclic C 5-60 heteroarylene group,

each X is independently —OR 30 , —SR 31 , or —NR 32 R 33 ,

R 30 to R 33 are each independently hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl, each of which except hydrogen optionally further comprises as part of its structure one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —S—, —S(O)—, —S(O) 2 —, or —NR 34 — wherein R 34 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl,

m is an integer of 2 to 4, and

each n is independently an integer of 1 to 5, provided that the sum of n is 3 or greater.

14. The method of claim 8 , wherein in formula (14), each X is independently —OR 30 , wherein each R 30 is independently hydrogen, substituted or unsubstituted C 1-10 alkyl, substituted or unsubstituted-C(O)—C 1-6 alkyl, substituted or unsubstituted C 3-10 cycloalkyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl.

15. The method of claim 8 , wherein, in formula (14),

D is —(C(O)O − )(M + ) or —(NH 3 + )(Z − ),

M + is an organic cation,

Z − is an organic anion,

each L 1 is independently a divalent linking group,

m is 1,

each Ar is independently a monocyclic or polycyclic C 5-60 aromatic group,

each X is independently —OR 30 , —SR 31 , or —NR 32 R 33 ,

n is an integer of 2 to 4, and

R 30 to R 33 are each independently hydrogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 heteroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 2-30 heterocycloalkyl, substituted or unsubstituted C 2-30 alkenyl, substituted or unsubstituted C 2-30 alkynyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 3-30 heteroaryl, or substituted or unsubstituted C 4-30 heteroarylalkyl, each of which except hydrogen optionally further comprises as part of its structure one or more of substituted or unsubstituted C 1-30 alkylene, substituted or unsubstituted C 3-30 cycloalkylene, substituted or unsubstituted C 2-30 alkenylene, substituted or unsubstituted C 4-30 cycloalkenylene, substituted or unsubstituted C 2-30 alkynylene, substituted or unsubstituted C 1-30 heterocycloalkylene, substituted or unsubstituted C 6-30 arylene, substituted or unsubstituted C 4-30 heteroarylene, —O—, —C(O)—, —C(O)O—, —S—, —S(O)—, —S(O) 2 —, or —NR 34 — wherein R 34 is substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-20 heterocycloalkyl, substituted or unsubstituted C 6-30 aryl, substituted or unsubstituted C 7-30 arylalkyl, substituted or unsubstituted C 7-30 alkylaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 alkylheteroaryl.

16. The method of claim 8 , wherein the additive is present in an amount from 0.1 to 20 wt %, based on total solids of the photoresist underlayer composition.

17. The photoresist underlayer composition of claim 1 , wherein the poly (arylene ether) is prepared by a Diels-Alder polymerization of one or more first monomers and one or more second monomers, and optionally an end capping monomer,

wherein the one or more first monomers are the compound containing two or more cyclopentadienone moieties, wherein the compound is free of the solubility enhancing polar moiety, and

wherein the one or more second monomers comprise a compound having an aryl moiety and two or more alkynyl groups capable of undergoing a Diels-Alder reaction.

18. The photoresist underlayer composition of claim 17 , wherein the one or more second monomers are free of a solubility enhancing polar moiety.