Memory structure
View Patent ↗A memory structure includes a static random-access memory (SRAM) cell having a cell boundary. The SRAM cell includes a first write-port pull-up (PU) transistor and a second write-port PU transistor, a first write-port pull-down (PD) transistor, a second write-port PD transistor, a first write-port pass-gate (PG) transistor, a second write-port PG transistor, a first read-port PD transistor, a second read-port PD transistor, a first read-port PG transistor, and a second read-port PG transistor respectively including nanostructures that are vertically stacked from each other. The memory structure further includes a write bit-line conductor and a write bit-line-bar conductor in a first metal layer under the SRAM cell, wherein the write bit-line conductor is electrically connected to a source/drain feature of the first write-port pass-gate transistor and the write bit-line-bar conductor is electrically connected to a source/drain feature of the second write-port pass-gate transistor.
1. A memory structure, comprising:
a first write-port pull-up (PU) transistor and a second write-port PU transistor arranged in a first direction;
a first write-port pull-down (PD) transistor, a second write-port PD transistor, a first write-port pass-gate (PG) transistor, and a second write-port PG transistor arranged in the first direction;
a first read-port PD transistor, a second read-port PD transistor, a first read-port PG transistor, and a second read-port PG transistor arranged in the first direction;
a first source/drain contact extending in a second direction perpendicular to the first direction, wherein the first source/drain contact is under and electrically connected to a source/drain feature of the first write-port PG transistor;
a second source/drain contact extending in the second direction, wherein the second source/drain contact is under and electrically connected to a source/drain feature of the second write-port PG transistor;
a write bit-line conductor extending in the first direction, wherein the write bit-line conductor is under and electrically connected to the first source/drain contact; and
a write bit-line-bar conductor extending in the first direction, wherein the write bit-line-bar conductor is under and electrically connected to the second source/drain contact.
2. The memory structure of claim 1 , further comprising:
a VSS conductor extending in the first direction, wherein the VSS conductor is under and electrically connected to a source/drain feature shared by the first write-port PD transistor and the second write-port PD transistor and a source/drain feature shared by the first read-port PD transistor and the second read-port PD transistor.
3. The memory structure of claim 2 , wherein the VSS conductor is between the write bit-line conductor and the write bit-line-bar conductor.
4. The memory structure of claim 1 , further comprising:
a first read bit-line conductor and a second read bit-line conductor extending in the first direction, wherein the first read bit-line conductor is over and electrically connected to a source/drain feature of the first read-port PG transistor and the second read bit-line conductor is over and electrically connected to a source/drain feature of the second read-port PG transistor.
5. The memory structure of claim 1 , further comprising:
a first read word-line conductor and a second read word-line conductor extending in the second direction, wherein the first read word-line conductor is over and electrically connected to a gate structure of the first read-port PG transistor and the second read word-line conductor is over and electrically connected to a gate structure of the second read-port PG transistor.
6. The memory structure of claim 1 , further comprising:
a write word-line conductor extending in the second direction, wherein the write word-line conductor is over and electrically connected to a gate structure of the first write-port PG transistor and a gate structure of the second write-port PG transistor.
7. The memory structure of claim 1 , further comprising:
a write word-line conductor extending in the second direction, wherein the write word-line conductor is under and electrically connected to a gate structure of the first write-port PG transistor and a gate structure of the second write-port PG transistor.
8. The memory structure of claim 1 , further comprising:
a VDD conductor extending in the first direction, wherein the VDD conductor is over and electrically connected to a source/drain feature shared by the first write-port PU transistor and the second write-port PU transistor.
9. A memory structure, comprising:
a static random-access memory (SRAM) cell having a cell boundary with a rectangular shape, wherein the SRAM cell comprises:
a first write-port pull-up (PU) transistor and a second write-port PU transistor arranged in a first direction;
a first write-port pull-down (PD) transistor, a second write-port PD transistor, a first write-port pass-gate (PG) transistor, and a second write-port PG transistor arranged in the first direction; and
a first read-port PD transistor, a second read-port PD transistor, a first read-port PG transistor, and a second read-port PG transistor arranged in the first direction; and
a first metal layer under the SRAM cell, wherein the first metal layer comprises a write bit-line conductor and a write bit-line-bar conductor extending in the first direction and arranged in a second direction perpendicular to the first direction,
wherein the write bit-line conductor is electrically connected to a source/drain feature of the first write-port pass-gate transistor and the write bit-line-bar conductor is electrically connected to a source/drain feature of the second write-port pass-gate transistor.
10. The memory structure of claim 9 , wherein the cell boundary comprises a first boundary in the first direction and a second boundary in the second direction, wherein a ratio of a length of the second boundary to a length of the first boundary is in a range from about 1 to about 1.5.
11. The memory structure of claim 10 , wherein the first metal layer further comprises:
a first VS S conductor lengthwise overlapping the first boundary in a top view and electrically connected to a source/drain feature shared by the first write-port PD transistor and the second write-port PD transistor and a source/drain feature shared by the first read-port PD transistor and the second read-port PD transistor.
12. The memory structure of claim 11 , further comprising:
a second metal layer over the SRAM cell, wherein the second metal layer comprises a second VSS conductor extending in the first direction and electrically connected to the source/drain feature shared by the first write-port PD transistor and the second write-port PD transistor and the source/drain feature shared by the first read-port PD transistor and the second read-port PD transistor.
13. The memory structure of claim 12 , further comprising:
a third metal layer over the second metal layer, wherein the third metal layer comprises a first read word-line conductor and a second read word-line conductor extending in the second direction,
wherein the first read word-line conductor is electrically connected to a gate structure of the first read-port PG transistor and the second read word-line conductor is electrically connected to a gate structure of the second read-port PG transistor.
14. The memory structure of claim 13 , wherein the second metal layer further comprises:
a first read word-line landing pad and a second read word-line landing pad lengthwise overlapping the first boundary in the top view, wherein the first read word-line conductor is electrically connected to the gate structure of the first read-port PG transistor through the first read word-line landing pad and the second read word-line conductor is electrically connected to the gate structure of the second read-port PG transistor through the second read word-line landing pad.
15. The memory structure of claim 10 , wherein the first metal layer further comprises:
a VDD conductor lengthwise overlapping the first boundary in a top view and electrically connected to a source/drain feature shared by the first write-port PU transistor and the second write-port PU transistor.
16. A memory structure, comprising:
a static random-access memory (SRAM) cell having a cell boundary, wherein the SRAM cell comprises:
a first write-port pull-up (PU) transistor and a second write-port PU transistor, a first write-port pull-down (PD) transistor, a second write-port PD transistor, a first write-port pass-gate (PG) transistor, a second write-port PG transistor, a first read-port PD transistor, a second read-port PD transistor, a first read-port PG transistor, and a second read-port PG transistor respectively comprising nanostructures that are vertically stacked from each other; and
a write bit-line conductor and a write bit-line-bar conductor in a first metal layer under the SRAM cell, wherein the write bit-line conductor is electrically connected to a source/drain feature of the first write-port pass-gate transistor and the write bit-line-bar conductor is electrically connected to a source/drain feature of the second write-port pass-gate transistor.
17. The memory structure of claim 16 , wherein the SRAM cell further comprises:
a cell boundary having a first boundary and a second boundary, wherein a ratio of a length of the first boundary to a length of the second boundary is in a range from about 1 to about 1.5.
18. The memory structure of claim 16 , further comprising:
a first read bit-line conductor and a second read bit-line conductor in a second metal layer over the SRAM cell, wherein the first read bit-line conductor is electrically connected to a source/drain feature of the first read-port PG transistor and the second read bit-line conductor is electrically connected to a source/drain feature of the second read-port PG transistor.
19. The memory structure of claim 18 , further comprising:
a write word-line conductor in a third metal layer over the second metal layer, wherein the write word-line conductor is electrically connected to a gate structure of the first write-port PG transistor and a gate structure of the second write-port PG transistor.
20. The memory structure of claim 19 , further comprising:
a write word-line landing pad in the second metal layer and lengthwise overlapping the second boundary in a top view, wherein the write word-line conductor is electrically connected to the gate structure of the first write-port PG transistor and the gate structure of the second write-port PG transistor through the write word-line landing pad.