IP Library Granted Patent US 12,385,686
Granted Patent B2
US 12,385,686 · App. 17/939,507 · Granted Aug 12, 2025

Vacuum adiabatic body and refrigerator

Inventors: Wonyeong Jung (Seoul, KR); Deokhyun Youn (Seoul, KR); Daewoong Kim (Seoul, KR)
Assignee: LG ELECTRONICS INC.
F25D23/028F16L59/065F25D19/006F25D23/02F25D23/062F25D23/085F25D23/087F25D2201/14
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,385,686
App. No.
17/939,507
Granted
Aug 12, 2025
Kind
B2
Abstract

A vacuum adiabatic body includes a first plate defining at least one portion of a wall of a first space; a second plate defining at least one portion of a wall of a second space having a different temperature from the first space; a seal that seals the first plate and the second plate to provide a third space that has a temperature between the temperature of the first space and the temperature of the second space and is in a vacuum state; a support to maintain the third space; an exhaust port through which a gas in the third space is exhausted; a peripheral adiabatic material, as a previously formed separate molded product, fixed to an edge of the third space; and a gasket having at least one portion fixed to the peripheral adiabatic material to provide a boundary between the first space and the second space.

Claims (45)

1. A vacuum adiabatic body, comprising:

a first plate;

a second plate;

a vacuum space to be provided between the first plate and the second plate;

a peripheral adiabatic body configured as a portion of the vacuum adiabatic body,

wherein an end portion of the second plate is bent to provide a first adiabatic material holding end, and an end portion of the first plate is bent to provide a second adiabatic material holding end; and

wherein a first end portion of the peripheral adiabatic body is held by the first adiabatic material holding end, and a second end portion of the peripheral adiabatic body is held by the second adiabatic material holding end, wherein the peripheral adiabatic body is a previously formed separate molded product, and the peripheral adiabatic body is configured to be held to the first and second adiabatic material holding ends and then slid more deeply such that the peripheral adiabatic body is fixed, wherein the first plate comprises a first surface facing outside of the vacuum space and a second surface facing the vacuum space, and the second plate comprises a first surface facing outside of the vacuum space and a second surface facing the vacuum space, wherein the peripheral adiabatic body contacts at least one side of the first plate and one side of the second plate, and wherein the first adiabatic material holding end is bent in a pocket shape, and the peripheral adiabatic body is accommodated inside the first adiabatic material holding end such that the peripheral adiabatic body is not exposed to the outside of the vacuum adiabatic body.

2. The vacuum adiabatic body according to claim 1 , further comprising a conductive resistance sheet that connects the first plate to the second plate and is configured to reduce heat transfer between the second plate and the first plate, wherein a portion of the peripheral adiabatic body is to contact the conductive resistance sheet to provide heat insulation.

3. The vacuum adiabatic body according to claim 2 , further comprising a side frame fastened to the second plate and to the conductive resistance sheet and configured to form at least one outer wall of the vacuum space, wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, and the side frame, so as to maintain a position of the peripheral adiabatic body.

4. The vacuum adiabatic body according to claim 1 , comprising:

a conductive resistance sheet that connects the first plate to the second plate, and

a side frame fastened to a side portion of the vacuum adiabatic body and configured to form at least one outer wall of the vacuum space, wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, and the side frame, so as to maintain a position of the peripheral adiabatic body.

5. The vacuum adiabatic body according to claim 1 , comprising a side frame adiabatic body disposed in an empty space provided at an internal space of the peripheral adiabatic body.

6. A vacuum adiabatic body, comprising:

a first plate;

a second plate;

a vacuum space to be provided between the first plate and the second plate;

a peripheral adiabatic body configured as a portion of the vacuum adiabatic body;

a conductive resistance sheet that connects the first plate to the second plate, and has a curved surface thinner than each of the first and second plates to resist heat conduction flowing from the second plate to the first plate, and the conductive resistance sheet is configured to reduce heat transfer between the second plate and the first plate, to form a portion of a wall of the vacuum space, and to have a first surface and a second surface; and

a side frame fastened to the second plate and to the conductive resistance sheet and configured to form at least one outer wall of the vacuum space, wherein the peripheral adiabatic body is to cover the portion of the wall of the vacuum space formed by the conductive resistance sheet, wherein the peripheral adiabatic body does not contact an outside of the curved surface of the conductive resistance sheet, wherein the conduction resistance sheet is disposed in a longitudinal direction of the vacuum space, wherein the first surface of the conductive resistance sheet is to be heat-insulated by the peripheral adiabatic body provided adjacent to the conductive resistance sheet, and the second surface of the conductive resistance sheet is to be heat-insulated by the vacuum space, and wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, or the side frame, so as to maintain a position of the peripheral adiabatic body.

7. The vacuum adiabatic body according to claim 6 , further comprising a gasket having a portion fixed to the peripheral adiabatic body and having a portion adjacent to the first plate.

8. The vacuum adiabatic body according to claim 7 , wherein the gasket is to cover the portion of the wall of the vacuum space formed by the conductive resistance sheet and a portion of the peripheral adiabatic body covering the wall such that the portion of the peripheral adiabatic body is between the wall of the vacuum space and the gasket.

9. The vacuum adiabatic body according to claim 6 , further comprising a shielding part configured to provide an adiabatic effect, and the shielding part is disposed outside the vacuum space.

10. The vacuum adiabatic body according to claim 9 , wherein the shielding part is disposed to cover the conductive resistance sheet.

11. The vacuum adiabatic body according to claim 6 , wherein the peripheral adiabatic body is a previously formed separate molded product, and the peripheral adiabatic body is configured to be held to first and second adiabatic material holding ends and then slid more deeply such that the peripheral adiabatic body is fixed.

12. The vacuum adiabatic body according to claim 6 , comprising a side frame adiabatic body disposed in an empty space provided at an internal space of the peripheral adiabatic body.

13. The vacuum adiabatic body according to claim 6 , comprising a side frame fastened to a side portion of the vacuum adiabatic body and configured to form at least one outer wall of the vacuum space, wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, and the side frame, so as to maintain a position of the peripheral adiabatic body.

14. The vacuum adiabatic body according to claim 6 , comprising a side frame fastened to the second plate and to the conductive resistance sheet and configured to form at least one outer wall of the vacuum space, wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, and the side frame, so as to maintain a position of the peripheral adiabatic body.

15. The vacuum adiabatic body according to claim 6 , wherein a first peripheral adiabatic body and a second peripheral adiabatic body are arranged side by side in a longitudinal direction of the vacuum space.

16. A vacuum adiabatic body, comprising:

a first plate;

a second plate;

a vacuum space to be provided between the first plate and the second plate;

a peripheral adiabatic body configured as a portion of the vacuum adiabatic body;

a side frame fastened to a side portion of the vacuum adiabatic body and configured to form at least one outer wall of the vacuum space,

wherein the first plate comprises a first surface facing outside of the vacuum space and a second surface facing the vacuum space, wherein the first surface faces the peripheral adiabatic body; and

a side frame adiabatic body disposed in an empty space provided at an internal space of the peripheral adiabatic body, wherein the peripheral adiabatic body is held to at least one of the first plate, the second plate, and the side frame, so as to maintain a position of the peripheral adiabatic body, wherein the peripheral adiabatic body includes a first peripheral adiabatic body and a second peripheral adiabatic body as two different molds separated from each other, and wherein the first peripheral adiabatic body and the second peripheral adiabatic body contact each other at two different spots.

17. The vacuum adiabatic body according to claim 16 , further comprising:

a support that supports the first and second plates and is provided in the vacuum space; and

an exhaust port configured to exhaust a gas from the vacuum space.

18. The vacuum adiabatic body according to claim 16 , further comprising a conductive resistance sheet that connects the first plate to the second plate and is configured to reduce heat transfer between the second plate and the first plate,

wherein a portion of the peripheral adiabatic body is to cover the conductive resistance sheet to provide heat insulation,

wherein the conduction resistance sheet is disposed in a longitudinal direction of the vacuum space.

19. The vacuum adiabatic body according to claim 18 , further comprising a gasket having a portion fixed to the peripheral adiabatic body and having a portion adjacent to the first plate.

20. The vacuum adiabatic body according to claim 19 , wherein the gasket is to cover the peripheral adiabatic body on top of the conductive resistance sheet such that a portion the peripheral adiabatic body is between the gasket and the conductive resistance sheet.

Priority Claims (1)
KR 10-2015-0109722 · Aug 3, 2015 · national
Continuity (3)
Continuation 17170005 · Feb 8, 2021
Continuation 15749136
Related Publication 20220412641A1 · Dec 29, 2022
References Cited (400)
US 1413169A · Lawton · 1922 [cited by applicant]
US 1588707A · Csiga · 1926 [cited by applicant]
US 1845353A · Snell · 1932 [cited by applicant]
US 1898977A · Comstock · 1933 [cited by applicant]
US 2000882A · Comstock · 1935 [cited by applicant]
US 2550040A · Clar · 1951 [cited by applicant]
US 2708774A · Seelen · 1955 [cited by applicant]
US 2715976A · Whitmore · 1955 [cited by applicant]
US 2729863A · Kurtz · 1956 [cited by applicant]
US 2768046A · Evans · 1956 [cited by applicant]
US 2786241A · Garvey et al. · 1957 [cited by applicant]
US 3091946A · Kesling · 1963 [cited by applicant]
US 3161265A · Matsch et al. · 1964 [cited by applicant]
US 3289423A · Berner · 1966 [cited by applicant]
US 3370740A · Anderson · 1968 [cited by applicant]
US 3520581A · Giovanni · 1970 [cited by examiner]
US 4056211A · Zumwalt · 1977 [cited by applicant]
US 4646934A · McAllister · 1987 [cited by applicant]
US 4822117A · Boston, Jr. · 1989 [cited by applicant]
US 4959111A · Kruck et al. · 1990 [cited by applicant]
US 5011729A · Mcallister · 1991 [cited by applicant]
US 5018328A · Cur · 1991 [cited by applicant]
US 5033803A · Katsuyoshi et al. · 1991 [cited by applicant]
US 5185981A · Martinez · 1993 [cited by applicant]
US 5200015A · Schilf · 1993 [cited by applicant]
US 5361598A · Roseen · 1994 [cited by applicant]
US 5512345A · Tsutsumi et al. · 1996 [cited by applicant]
US 5532034A · Kirby et al. · 1996 [cited by applicant]
US 5694789A · Do · 1997 [cited by applicant]
US 5795639A · Lin · 1998 [cited by applicant]
US 5843353A · De Vos et al. · 1998 [cited by applicant]
US 5947479A · Ostrowski · 1999 [cited by applicant]
US 5966888A · Richardson · 1999 [cited by applicant]
US 6001890A · Hamilton · 1999 [cited by applicant]
US 6029846A · Hirath et al. · 2000 [cited by applicant]
US 6038830A · Hirath et al. · 2000 [cited by applicant]
US 6109712A · Haworth et al. · 2000 [cited by applicant]
US 6168040B1 · Sautner et al. · 2001 [cited by applicant]
US 6192703B1 · Salyer et al. · 2001 [cited by applicant]
US 6244458B1 · Frysinger et al. · 2001 [cited by applicant]
US 6280814B1 · Offermann · 2001 [cited by applicant]
US 6338536B1 · Ueno et al. · 2002 [cited by applicant]
US 6427945B1 · Bansemir · 2002 [cited by applicant]
US 6485122B2 · Wolf · 2002 [cited by applicant]
US 6485805B1 · Smith · 2002 [cited by applicant]
US 6739104B2 · Tokonabe · 2004 [cited by applicant]
US 6860082B1 · Yamamoto · 2005 [cited by applicant]
US 7001656B2 · Maignan · 2006 [cited by applicant]
US 7111752B2 · Bucher · 2006 [cited by applicant]
US 7169459B2 · Lichodziejewski · 2007 [cited by applicant]
US 7288326B2 · Elzey · 2007 [cited by applicant]
US 7954301B2 · Mills · 2011 [cited by applicant]
US 8383225B2 · Rotter · 2013 [cited by applicant]
US 8857931B2 · Jung et al. · 2014 [cited by applicant]
US 8881398B2 · Hanley et al. · 2014 [cited by applicant]
US 8943770B2 · Sanders · 2015 [cited by applicant]
US 8944541B2 · Allard et al. · 2015 [cited by applicant]
US 9182158B2 · Wu · 2015 [cited by applicant]
US 9328951B2 · Shin · 2016 [cited by applicant]
US 9441779B1 · Alshourbagy et al. · 2016 [cited by applicant]
US 9463918B2 · Reid · 2016 [cited by applicant]
US 9752818B2 · Naik · 2017 [cited by applicant]
US 9791204B2 · Kim · 2017 [cited by applicant]
US 9945600B2 · Kang · 2018 [cited by applicant]
US 10082328B2 · Jung et al. · 2018 [cited by applicant]
US 10274247B2 · Jeong et al. · 2019 [cited by applicant]
US 20020041134A1 · Wolf · 2002 [cited by examiner]
US 20020100250A1 · Hirath et al. · 2002 [cited by applicant]
US 20020170265A1 · Tokonabe et al. · 2002 [cited by applicant]
US 20030080126A1 · Voute et al. · 2003 [cited by applicant]
US 20030115838A1 · Rouanet et al. · 2003 [cited by applicant]
US 20030207075A1 · Maignan et al. · 2003 [cited by applicant]
US 20040051427A1 · Cittadini et al. · 2004 [cited by applicant]
US 20040091688A1 · Gaku · 2004 [cited by applicant]
US 20040226956A1 · Brooks · 2004 [cited by applicant]
US 20050175809A1 · Hirai et al. · 2005 [cited by applicant]
US 20050235682A1 · Hirai et al. · 2005 [cited by applicant]
US 20070089989A1 · Hoagland · 2007 [cited by applicant]
US 20070152551A1 · Kim et al. · 2007 [cited by applicant]
US 20070204648A1 · Smale et al. · 2007 [cited by applicant]
US 20070243358A1 · Gandini · 2007 [cited by applicant]
US 20080110128A1 · Hirath · 2008 [cited by applicant]
US 20080289898A1 · Rickards · 2008 [cited by applicant]
US 20090031659A1 · Kalfon · 2009 [cited by applicant]
US 20090113899A1 · Dain et al. · 2009 [cited by applicant]
US 20100104923A1 · Takeguchi et al. · 2010 [cited by applicant]
US 20100178439A1 · Bettger et al. · 2010 [cited by applicant]
US 20100283359A1 · Hottmann · 2010 [cited by applicant]
US 20110089802A1 · Cording · 2011 [cited by applicant]
US 20110146333A1 · Koo et al. · 2011 [cited by applicant]
US 20110241513A1 · Nomura · 2011 [cited by applicant]
US 20110296797A1 · Stark et al. · 2011 [cited by applicant]
US 20120103006A1 · Jung · 2012 [cited by applicant]
US 20120104923A1 · Jung et al. · 2012 [cited by applicant]
US 20120118002A1 · Kim et al. · 2012 [cited by applicant]
US 20120125039A1 · Hwang · 2012 [cited by applicant]
US 20120128920A1 · Yoon et al. · 2012 [cited by applicant]
US 20120231204A1 · Jeon et al. · 2012 [cited by applicant]
US 20120269996A1 · Jäger · 2012 [cited by applicant]
US 20120326587A1 · Jeong et al. · 2012 [cited by applicant]
US 20130008309A1 · Hashida · 2013 [cited by applicant]
US 20130026900A1 · Oh et al. · 2013 [cited by applicant]
US 20130099650A1 · Lee et al. · 2013 [cited by applicant]
US 20130105494A1 · Jung · 2013 [cited by applicant]
US 20130105495A1 · Jung · 2013 [cited by applicant]
US 20130105496A1 · Jung · 2013 [cited by applicant]
US 20130195544A1 · Sanders et al. · 2013 [cited by applicant]
US 20130255304A1 · Cur et al. · 2013 [cited by applicant]
US 20130257257A1 · Cur · 2013 [cited by applicant]
US 20130293080A1 · Kim · 2013 [cited by applicant]
US 20140103791A1 · Cheon · 2014 [cited by applicant]
US 20140132142A1 · Kim et al. · 2014 [cited by applicant]
US 20140216100A1 · Toshimitsu · 2014 [cited by applicant]
US 20140272208A1 · Song et al. · 2014 [cited by applicant]
US 20140315011A1 · Lee et al. · 2014 [cited by applicant]
US 20140346942A1 · Kim · 2014 [cited by examiner]
US 20150030800A1 · Jung et al. · 2015 [cited by applicant]
US 20150068401A1 · Hashida · 2015 [cited by applicant]
US 20150192356A1 · Kang et al. · 2015 [cited by applicant]
US 20150360842A1 · Bessho et al. · 2015 [cited by applicant]
US 20160108659A1 · Stark et al. · 2016 [cited by applicant]
US 20160109172A1 · Kim et al. · 2016 [cited by applicant]
US 20160356542A1 · Kim et al. · 2016 [cited by applicant]
US 20170325634A1 · Cai et al. · 2017 [cited by applicant]
US 20180266620A1 · Kawarazaki et al. · 2018 [cited by applicant]
US 20180299060A1 · Song et al. · 2018 [cited by applicant]
US 20180313492A1 · Kitano et al. · 2018 [cited by applicant]
US 20190101320A1 · Dherde et al. · 2019 [cited by applicant]
US 20190128593A1 · Deka et al. · 2019 [cited by applicant]
CN 1132346 · 1996 [cited by applicant]
CN 1191959 · 1998 [cited by applicant]
CN 1276052 · 2000 [cited by applicant]
CN 1286386 · 2001 [cited by applicant]
CN 1515857 · 2004 [cited by applicant]
CN 1576678 · 2005 [cited by applicant]
CN 2700790 · 2005 [cited by applicant]
CN 1666071 · 2005 [cited by applicant]
CN 2748848 · 2005 [cited by applicant]
CN 1731053 · 2006 [cited by applicant]
CN 1820173 · 2006 [cited by applicant]
CN 1896657 · 2007 [cited by applicant]
CN 101072968 · 2007 [cited by applicant]
CN 101171472 · 2008 [cited by applicant]
CN 101349493 · 2009 [cited by applicant]
CN 201191121 · 2009 [cited by applicant]
CN 201428906 · 2010 [cited by applicant]
CN 201764779 · 2011 [cited by applicant]
CN 102032736 · 2011 [cited by applicant]
CN 201811526 · 2011 [cited by applicant]
CN 102099646 · 2011 [cited by applicant]
CN 102116402 · 2011 [cited by applicant]
CN 102261470 · 2011 [cited by applicant]
CN 102455103 · 2012 [cited by applicant]
CN 102455104 · 2012 [cited by applicant]
CN 102455105 · 2012 [cited by applicant]
CN 102735013 · 2012 [cited by applicant]
CN 102818421 · 2012 [cited by applicant]
CN 102840729 · 2012 [cited by applicant]
CN 102927740 · 2013 [cited by applicant]
CN 103062981 · 2013 [cited by applicant]
CN 103090615 · 2013 [cited by applicant]
CN 103090616 · 2013 [cited by applicant]
CN 103140640 · 2013 [cited by applicant]
CN 103154648 · 2013 [cited by applicant]
CN 103189696 · 2013 [cited by applicant]
CN 103228851 · 2013 [cited by applicant]
CN 203095854 · 2013 [cited by applicant]
CN 103363764 · 2013 [cited by applicant]
CN 103370587 · 2013 [cited by applicant]
CN 103542660 · 2014 [cited by applicant]
CN 103575038 · 2014 [cited by applicant]
CN 103649658 · 2014 [cited by applicant]
CN 103968196 · 2014 [cited by applicant]
CN 104180595 · 2014 [cited by applicant]
CN 104204646 · 2014 [cited by applicant]
CN 104254749 · 2014 [cited by applicant]
CN 104344653 · 2015 [cited by applicant]
CN 104457117A · 2015 [cited by applicant]
CN 104482707 · 2015 [cited by applicant]
CN 104567215 · 2015 [cited by applicant]
CN 104634047 · 2015 [cited by applicant]
CN 104696669 · 2015 [cited by applicant]
CN 104729201 · 2015 [cited by applicant]
CN 104746690 · 2015 [cited by applicant]
CN 105546923 · 2016 [cited by applicant]
CN 108354755 · 2018 [cited by applicant]
DE 956899 · 1957 [cited by applicant]
DE 2802910 · 1978 [cited by applicant]
DE 2939878 · 1981 [cited by applicant]
DE 3121351 · 1982 [cited by applicant]
DE 9204365 · 1992 [cited by applicant]
DE 19745825 · 1999 [cited by applicant]
DE 19803908 · 1999 [cited by applicant]
DE 29912917 · 1999 [cited by applicant]
DE 19907182 · 2000 [cited by applicant]
DE 102011050473 · 2011 [cited by applicant]
DE 102011014302 · 2012 [cited by applicant]
DE 102011079209 · 2013 [cited by applicant]
DE 102012100490 · 2013 [cited by applicant]
DE 102012223539 · 2014 [cited by applicant]
EP 0071090 · 1983 [cited by applicant]
EP 0658716A1 · 1995 [cited by applicant]
EP 0658733 · 1995 [cited by applicant]
EP 0892120 · 1999 [cited by applicant]
EP 1477752 · 2004 [cited by applicant]
EP 1484563 · 2004 [cited by applicant]
EP 1614954 · 2006 [cited by applicant]
EP 2333179 · 2011 [cited by applicant]
EP 2447639 · 2012 [cited by applicant]
EP 2806239 · 2014 [cited by applicant]
EP 2824405 · 2015 [cited by applicant]
EP 2829827 · 2015 [cited by applicant]
EP 2936013 · 2015 [cited by applicant]
EP 2952839 · 2015 [cited by applicant]
EP 2952838 · 2015 [cited by applicant]
EP 2789951 · 2020 [cited by applicant]
GB 890372 · 1962 [cited by applicant]
GB 2446053 · 2008 [cited by applicant]
JP H04341694 · 1992 [cited by applicant]
JP H0510494 · 1993 [cited by applicant]
JP H07234067 · 1995 [cited by applicant]
JP H09145241 · 1997 [cited by applicant]
JP 11211334 · 1999 [cited by applicant]
JP H11335114 · 1999 [cited by applicant]
JP 2002243091A · 2002 [cited by applicant]
JP 2002340280 · 2002 [cited by applicant]
JP 2003106760 · 2003 [cited by applicant]
JP 2003269688 · 2003 [cited by applicant]
JP 2004044980 · 2004 [cited by applicant]
JP 2004196411 · 2004 [cited by applicant]
JP 2005214372 · 2005 [cited by applicant]
JP 2007218509 · 2007 [cited by applicant]
JP 2008045580 · 2008 [cited by applicant]
JP 2008249003 · 2008 [cited by applicant]
JP 2009078261A · 2009 [cited by applicant]
JP 2010008011 · 2010 [cited by applicant]
JP 2012087993 · 2012 [cited by applicant]
JP 2012255607 · 2012 [cited by applicant]
JP 2013119966A · 2013 [cited by applicant]
JP 2013195009 · 2013 [cited by applicant]
JP 2014037931 · 2014 [cited by applicant]
KR 1019920703942 · 1992 [cited by applicant]
KR 1020010073363 · 2001 [cited by applicant]
KR 100343719 · 2002 [cited by applicant]
KR 100411841 · 2003 [cited by applicant]
KR 1020050065088 · 2005 [cited by applicant]
KR 20070052156 · 2007 [cited by applicant]
KR 1020090111632 · 2009 [cited by applicant]
KR 1020100097410 · 2010 [cited by applicant]
KR 1020100099629 · 2010 [cited by applicant]
KR 1020100119937 · 2010 [cited by applicant]
KR 1020100136614 · 2010 [cited by applicant]
KR 1020110015322 · 2011 [cited by applicant]
KR 1020110015325 · 2011 [cited by applicant]
KR 1020110015327 · 2011 [cited by applicant]
KR 101041086 · 2011 [cited by applicant]
KR 1020110100440 · 2011 [cited by applicant]
KR 1020120044558 · 2012 [cited by applicant]
KR 1020120139648 · 2012 [cited by applicant]
KR 101227516 · 2013 [cited by applicant]
KR 1020130048528 · 2013 [cited by applicant]
KR 1020130048530 · 2013 [cited by applicant]
KR 1020130054213 · 2013 [cited by applicant]
KR 1020140129552 · 2014 [cited by applicant]
KR 1020150012712 · 2015 [cited by applicant]
KR 101506413 · 2015 [cited by applicant]
NL 1005962 · 1998 [cited by applicant]
RU 129188 · 2013 [cited by applicant]
WO WO9325843 · 1993 [cited by applicant]
WO WO2006003199 · 2006 [cited by applicant]
WO WO2012084874 · 2012 [cited by applicant]
WO WO2012176880 · 2012 [cited by applicant]
WO WO2013007568 · 2013 [cited by applicant]
WO WO2013007568A2 · 2013 [cited by examiner]
WO WO2014049969 · 2014 [cited by applicant]
WO WO2014175639 · 2014 [cited by applicant]
WO WO2016208193A1 · 2016 [cited by applicant]
WO WO2017023095 · 2017 [cited by applicant]
WO WO2017192121 · 2017 [cited by applicant]
WO WO2018044274 · 2018 [cited by applicant]
WO-2013007568-A2 Translation (Year: 2013). [cited by examiner]
European Search Report dated Nov. 3, 2022 issued in EP Application No. 22151005.0. [cited by applicant]
U.S. Office Action dated Apr. 27, 2023 issued in U.S. Appl. No. 17/072,231. [cited by applicant]
U.S. Notice of Allowance dated Mar. 23, 2023 issued in U.S. Appl. No. 16/953,846. [cited by applicant]
Korean Notice of Allowance dated Nov. 2, 2022 issued in KR Application No. 10-2015-0109720. [cited by applicant]
U.S. Office Action dated Mar. 20, 2023 issued in copending U.S. Appl. No. 17/030,806. [cited by applicant]
Machine translation of EP 2 952 839. [cited by applicant]
European Office Action dated Nov. 21, 2022 issued in EP Application No. 20168389.3. [cited by applicant]
United States Office Action dated Nov. 25, 2022 issued in co-pending related U.S. Appl. No. 17/411,659. [cited by applicant]
United States Office Action dated Oct. 6, 2022 issued in co-pending related U.S. Appl. No. 17/072,231. [cited by applicant]
International Search Report and Written Opinion dated Oct. 12, 2016 issued in Application No. PCT/KR2016/008465. [cited by applicant]
International Search Report and Written Opinion dated Oct. 12, 2016 issued in Application No. PCT/KR2016/008507. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008466. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008468. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008469. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008470. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008501. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008502. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008505. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008519. [cited by applicant]
International Search Report and Written Opinion dated Nov. 21, 2016 issued in Application No. PCT/KR2016/008523. [cited by applicant]
International Search Report and Written Opinion dated Dec. 7, 2016 issued in Application No. PCT/KR2016/008516. [cited by applicant]
International Search Report and Written Opinion dated Dec. 23, 2016 issued in Application No. PCT/KR2016/008512. [cited by applicant]
International Search Report and Written Opinion dated Dec. 23, 2016 issued in Application No. PCT/KR2016/008514. [cited by applicant]
Russian Office Action dated Sep. 25, 2018 issued in RU Application No. 2018107646. [cited by applicant]
European Search Report dated Dec. 21, 2018 issued in EP Application No. 16833330.0. [cited by applicant]
European Search Report dated Feb. 13, 2019 issued in EP Application No. 16833309.4. [cited by applicant]
European Search Report dated Feb. 13, 2019 issued in EP Application No. 16833311.0. [cited by applicant]
European Search Report dated Feb. 20, 2019 issued in EP Application No. 16833313.6. [cited by applicant]
European Search Report dated Feb. 22, 2019 issued in EP Application No. 16833312.8. [cited by applicant]
European Search Report dated Feb. 26, 2019 issued in EP Application No. 16833324.3. [cited by applicant]
European Search Report dated Feb. 26, 2019 issued in EP Application No. 16833336.7. [cited by applicant]
European Search Report dated Mar. 1, 2019 issued in EP Application No. 16833323.5. [cited by applicant]
European Search Report dated Mar. 1, 2019 issued in EP Application No. 16833338.3. [cited by applicant]
European Search Report dated Mar. 13, 2019 issued in EP Application No. 16833331.8. [cited by applicant]
European Search Report dated Mar. 15, 2019 issued in EP Application No. 16833326.8. [cited by applicant]
European Search Report dated Apr. 3, 2019 issued in EP Application No. 16833325.0. [cited by applicant]
U.S. Office Action dated Jun. 13, 2019 issued in related U.S. Appl. No. 15/749,139. [cited by applicant]
U.S. Office Action dated Jun. 13, 2019 issued in related U.S. Appl. No. 15/749,142. [cited by applicant]
U.S. Office Action dated Jun. 13, 2019 issued in related U.S. Appl. No. 15/749,136. [cited by applicant]
Chinese Office Action (with English translation) dated Jul. 15, 2019 issued in CN Application No. 201680045949.0. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680045869.5. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680045899.6. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680045908.1. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680045935.9. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680046042.6. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 5, 2019 issued in CN Application No. 201680046048.3. [cited by applicant]
Chinese Office Action (with English translation) dated Aug. 13, 2019 issued in CN Application No. 201680045950.3. [cited by applicant]
Chinese Office Action (with English translation) dated Sep. 19, 2019 issued in CN Application No. 201680045897. 7. [cited by applicant]
Chinese Office Action (with English translation) dated Sep. 19, 2019 issued in CN Application No. 201680045898.1. [cited by applicant]
Chinese Office Action (with English translation) dated Sep. 19, 2019 issued in CN Application No. 201680046047.9. [cited by applicant]
United States Office Action dated Sep. 20, 2019 issued in U.S. Appl. No. 15/749,149. [cited by applicant]
U.S. Office Action dated Oct. 4, 2019 issued in related U.S. Appl. No. 15/749,140. [cited by applicant]
U.S. Office Action dated Oct. 17, 2019 issued in U.S. Appl. No. 15/749,147. [cited by applicant]
U.S. Office Action dated Oct. 17, 2019 issued in U.S. Appl. No. 15/749,143. [cited by applicant]
U.S. Office Action dated Oct. 17, 2019 issued in U.S. Appl. No. 15/749,162. [cited by applicant]
United States Office Action dated Dec. 10, 2019 issued in U.S. Appl. No. 15/749,132. [cited by applicant]
United States Office Action dated Feb. 18, 2020 issued in U.S. Appl. No. 15/749,146. [cited by applicant]
United States Office Action dated Mar. 20, 2020 issued in U.S. Appl. No. 15/749,162. [cited by applicant]
United States Office Action dated Mar. 24, 2020 issued in U.S. Appl. No. 15/749,154. [cited by applicant]
United States Office Action dated Mar. 25, 2020 issued in U.S. Appl. No. 15/749,156. [cited by applicant]
United States Office Action dated Mar. 27, 2020 issued in U.S. Appl. No. 15/749,149. [cited by applicant]
United States Office Action dated Apr. 15, 2020 issued in U.S. Appl. No. 15/749,136. [cited by applicant]
United States Notice of Allowance dated Apr. 15, 2020 issued in U.S. Appl. No. 15/749,140. [cited by applicant]
Korean Office Action dated Jun. 5, 2020 issued in Application 10-2017-0093784. [cited by applicant]
Extended European Search Report dated Jul. 10, 2020 issued in Application 20168389.3. [cited by applicant]
United States Notice of Allowance dated Aug. 10, 2020 issued in U.S. Appl. No. 15/749,154. [cited by applicant]
U.S. Office Action dated Sep. 1, 2020 issued in U.S. Appl. No. 15/749,156. [cited by applicant]
United States Notice of Allowance dated Oct. 21, 2020 issued in U.S. Appl. No. 15/749,154. [cited by applicant]
European Office Action dated Jan. 11, 2021 issued in Application 16 833 313.6. [cited by applicant]
U.S. Office Action dated Mar. 31, 2021 issued in co-pending U.S. Appl. No. 15/749,132. [cited by applicant]
Chinese Office Action dated Apr. 6, 2021 issued in CN Application No. 202010248772.2. [cited by applicant]
Chinese Office Action dated Apr. 6, 2021 issued in CN Application No. 202010248789.8. [cited by applicant]
Chinese Office Action dated Apr. 6, 2021 issued in CN Application No. 202010248791.5. [cited by applicant]
Chinese Office Action dated Apr. 8, 2021 issued in CN Application No. 202010248891.8. [cited by applicant]
Chinese Office Action dated Jun. 2, 2021 issued in CN Application No. 202010634146.7. [cited by applicant]
Chinese Office Action dated Jun. 23, 2021 issued in CN Application No. 202010669915.7. [cited by applicant]
U.S. Office Action dated Jun. 28, 2021 issued in co-pending related U.S. Appl. No. 15/749,156. [cited by applicant]
Chinese Office Action and Search Report dated Jul. 20, 2021 issued in Application 20101067100.X. [cited by applicant]
Chinese Office Action dated Jun. 24, 2021 issued in CN Application No. 202010669926.5. [cited by applicant]
United States Office Action dated Oct. 5, 2021 issued in co-pending related U.S. Appl. No. 16/942,262. [cited by applicant]
United States Office Action dated Oct. 19, 2021 issued in co-pending related U.S. Appl. No. 17/021,582. [cited by applicant]
United States Office Action dated Oct. 26, 2021 issued in co-pending related U.S. Appl. No. 16/942,213. [cited by applicant]
Korean Office Action dated Aug. 1, 2021 issued in KR Application No. 10-2021-0085731. [cited by applicant]
Chinese Office Action dated Aug. 2, 2021 issued in CN Application No. 202010972409.5. [cited by applicant]
Chinese Office Action dated Aug. 3, 2021 issued in CN Application No. 202010972419.9. [cited by applicant]
Chinese Office Action dated Aug. 4, 2021 issued in CN Application No. 202010972442.8. [cited by applicant]
European Search Report dated Oct. 11, 2021 issued in EP Application No. 21185349.4. [cited by applicant]
European Search Report dated Oct. 11, 2021 issued in EP Application No. 21185362.7. [cited by applicant]
Chinese Office Action dated Dec. 3, 2021 issued in CN Application No. 202110032077.7. [cited by applicant]
European Search Report dated Feb. 8, 2022 issued in EP Application No. 21203498.7. [cited by applicant]
Chinese Office Action dated Feb. 15, 2022 issued in CN Application No. 202010671000.X. [cited by applicant]
Chinese Office Action dated Feb. 18, 2022 issued in CN Application No. 202010975466.9. [cited by applicant]
U.S. Office Action dated Mar. 31, 2022 issued in co-pending related U.S. Appl. No. 16/929,523. [cited by applicant]
U.S. Office Action dated Mar. 2, 2022 issued in co-pending related U.S. Appl. No. 17/170,005. [cited by applicant]
Chinese Office Action dated May 18, 2022 issued in CN Application No. 202110718315.X. [cited by applicant]
U.S. Office Action dated Jun. 10, 2022 issued in co-pending related U.S. Appl. No. 16/942,213. [cited by applicant]
U.S. Office Action dated Jul. 7, 2022 issued in co-pending related U.S. Appl. No. 16/710,720. [cited by applicant]
U.S. Office Action dated Jul. 13, 2022 issued in co-pending related U.S. Appl. No. 17/134,911. [cited by applicant]
U.S. Office Action dated Jul. 26, 2022 issued in co-pending related U.S. Appl. No. 17/030,806. [cited by applicant]
Chinese Notice of Allowance dated Jun. 1, 2022 issued in CN Application No. 202110032072.4. [cited by applicant]
Korean Office Action dated Aug. 8, 2022 issued in KR Application No. 10-2015-0109622. [cited by applicant]
Korean Notice of Allowance dated Jun. 1, 2022 issued in KR Application No. 10-2021-0085731. [cited by applicant]
United States Office Action dated Jan. 18, 2023 issued in co-pending related U.S. Appl. No. 16/942,213. [cited by applicant]
United States Office Action dated Dec. 22, 2022 issued in co-pending related U.S. Appl. No. 16/953,846. [cited by applicant]
Chinese Office Action dated Aug. 30, 2023 issued in Application No. 202110718284.8. [cited by applicant]
Korean Office Action dated Nov. 13, 2023 issued in Application No. 10-2023-0014241. [cited by applicant]
U.S. Notice of Allowance dated Oct. 23, 2023, issued in U.S. Appl. No. 17/072,231. [cited by applicant]
Korean Office Action dated Jul. 31, 2023 issued in Application 10-2023-0020717. [cited by applicant]
U.S. Appl. No. 18/091,203, filed Dec. 29, 2022. [cited by applicant]
U.S. Non-Final Office Action dated Feb. 27, 2024 issued in U.S. Appl. No. 17/980,088. [cited by applicant]
U.S. Appl. No. 16/710,720, filed Dec. 11, 2019. [cited by applicant]
U.S. Appl. No. 16/942,213, filed Jul. 29, 2020. [cited by applicant]
U.S. Appl. No. 17/030,806, filed Sep. 24, 2020. [cited by applicant]
U.S. Appl. No. 17/072,231, filed Oct. 16, 2020. [cited by applicant]
U.S. Appl. No. 17/155,430, filed Jan. 22, 2021. [cited by applicant]
U.S. Office Action dated Jan. 24, 2024 issued in U.S. Appl. No. 17/582,596. [cited by applicant]
Korean Office Action dated Apr. 4, 2024 issued in Application No. 10-2023-0036738. [cited by applicant]
U.S. Office Action dated Jul. 3, 2024 issued in U.S. Appl. No. 17/582,596. [cited by applicant]
U.S. Office Action dated Mar. 18, 2024, issued in U.S. Appl. No. 18/237,531. [cited by applicant]