Laser activated luminescence system
A laser activated luminescence system is provided. Another aspect pertains to a system employing a plasma assisted vapor deposition reactor which creates diamond layers on a substrate, in combination with a laser system to at least photoactivate and anneal the diamond layers. Yet another aspect of the present system uses a laser to assist with placement of color centers, such as nitrogen vacancy centers, in diamond. The present method uses lasers to manufacture more than two activated nitrogen vacancy center nodes in a diamond substrate, with nanometer spatial resolution and at a predetermined depth.
1. A method of manufacturing a diamond, the method comprising:
(a) epitaxially growing the diamond within a plasma assisted chemical vapor deposition reactor;
(b) etching the diamond to create a surface discontinuity located inwardly from a periphery of the diamond;
(c) forming color centers in the diamond in predetermined three-dimensional locations;
(d) emitting multiple ionization laser pulses, of different characteristics, to ionize the diamond;
(e) emitting at least one annealing laser pulse to anneal the diamond; and
(f) the locations of the color centers allowing communication between more than two of the color centers.
2. The method of claim 1 , further comprising:
doping the diamond with non-carbon atoms in at least one layer having a thickness less than 100 nm.
3. The method of claim 1 , further comprising:
pre-heating the diamond with at least one pre-heating laser pulse while limiting an amount of lattice damage therein to avoid graphitization, the pre-heating step occurring before the ionization emission step and the annealing emission step;
the different characteristic of the ionization laser pulses including different frequencies, and the ionizing laser pulses creating the color centers adjacent a corner of the surface discontinuity; and
the emitting of the at least one second laser pulse to anneal the diamond comprising emitting multiples of the annealing laser pulse to optimize characteristics of the color centers.
4. The method of claim 1 , further comprising:
pre-heating the diamond with at least one laser beam;
the at least one pre-heating laser beam having a peak intensity from 10 10 to 10 12 W/cm 2 , and a 520 to 540 nm wavelength;
the ionization pulses each having a 30 to 50 fs duration with 1 MHz repetition rates, and a 700-1,600 nm wavelength;
the at least one annealing pulse having a pulse intensity from 10 8 to 10 10 W/cm 2 for about 1 to 2 seconds, a 250 kHz repetition rate, and a 400 to 1,060 nm wavelength; and
monitoring fluorescence of the color centers with the same laser as emits the at least one annealing pulse.
5. The method of claim 1 , further comprising:
activating the color centers, which are nitrogen-vacancy centers, by tuning laser spot size and placement to open up the vacancies in the diamond within less than 100 nm-size areas and less than 100 nm-apart; and
causing the vacancies to diffuse and connect with nitrogen to form the nitrogen-vacancy centers within the laser annealed spots.
6. The method of claim 1 , further comprising using time-correlated single photon counting at two or more wavelengths to monitor a charge state of the color centers.
7. The method of claim 1 , further comprising using a stimulated emission depletion laser to characterize the color centers within 10-50 nm from each other to identify position and behavior of the color centers, and to determine if annealed points contain entangled color centers.
8. The method of claim 1 , further comprising:
integrating the color centers, which are nitrogen-vacancy centers, with: (a) microwave resonators or (b) superconducting qubits, to transfer information therebetween; and
the annealing increasing a local temperature of the diamond to allow vacancies to diffuse to sites next to nitrogen atoms.
9. A method of manufacturing a synthetic diamond, the method comprising:
(a) creating the synthetic diamond within a plasma assisted chemical vapor deposition reactor, with the diamond including a surface discontinuity located inwardly from a periphery of the diamond, the diamond being doped by non-carbon atoms in at least one layer having a thickness less than 100 nm;
(b) emitting at least one first laser pulse to photoactivate the diamond to create first nitrogen-vacancies adjacent a corner of the surface discontinuity;
(c) emitting at least one second laser pulse to anneal the diamond to optimize characteristics of the first nitrogen-vacancies or a first color center, the first and second laser pulses having at least one different characteristic; and
(d) creating a second nitrogen-vacancy or a second color center, in the diamond at a pre-determined depth.
10. The method of claim 9 , further comprising:
pre-heating the diamond with at least one pre-heating laser beam while limiting an amount of lattice damage therein to avoid graphitization, the pre-heating step occurring between the creating step and the photoactivation emission step; and
the at least one pre-heating laser beam having a peak intensity from 10 10 to 10 12 W/cm 2 , and a 520 to 540 nm wavelength.
11. The method of claim 10 , wherein the at least one photoactivation pulse includes multiple photoactivation laser pulses each having a 30 to 50 fs duration with 1 MHz repetition rates, and a 700-1,600 nm wavelength.
12. The method of claim 10 , wherein the at least one annealing pulse includes a pulse with an intensity from 10 8 to 10 10 W/cm 2 for about 1 to 2 seconds, a 250 kHz repetition rate, and a 400 to 1,060 nm wavelength.
13. The method of claim 9 , further comprising controlling the doping during diamond growth while forming three-dimensional arrays within the diamond by the doping being on multiple of the at least one layer, each having a thickness of 5-30 nm, with nitrogen and causing a surrounding crystal to be without nitrogen.
14. The method of claim 9 , further comprising:
activating nitrogen-vacancy centers by tuning laser spot size and placement to open up the vacancies in the diamond within less than 100 nm-size areas and less than 100 nm-apart;
causing the vacancies to diffuse and connect with nitrogen to form the nitrogen-vacancy centers within the laser annealed spots; and
monitoring fluorescence of the nitrogen-vacancy centers with the same laser which emits the at least one second annealing laser pulse.
15. The method of claim 9 , further comprising using time-correlated single photon counting at two or more wavelengths to monitor a charge state of the nitrogen-vacancy centers.
16. The method of claim 9 , further comprising using a stimulated emission depletion laser to characterize the nitrogen-vacancy centers within 10-50 nm from each other to identify position and behavior of the nitrogen-vacancy centers, and to determine if annealed points contain entanglement of the nitrogen-vacancy centers.
17. The method of claim 9 , further comprising integrating the nitrogen-vacancy centers with: (a) microwave resonators or (b) superconducting qubits, to transfer information therebetween.
18. The method of claim 9 , further comprising:
varying polarization of the laser pulses to align or change spins of the nitrogen-vacancy centers; and
creating multiples of the surface discontinuity on the diamond, at least a majority of which are longitudinally elongated, substantially parallel and laterally spaced apart, by etching in the reactor.
19. The method of claim 9 , further comprising using spatial interference between multiple of the laser pulses to create narrow, localized or different surface discontinuity features during the photoactivation step.
20. The method of claim 9 , further comprising:
creating the second nitrogen-vacancy or the second color center, in the diamond at a pre-determined lateral spacing from the first nitrogen-vacancy or the first color center; and
creating at least a third nitrogen-vacancy or a third color center, in the diamond at a pre-determined lateral spacing from: the first and the second nitrogen-vacancies, or the first and the second color centers.
21. A method of manufacturing a diamond, the method comprising:
(a) pre-heating the diamond with at least one laser beam;
(b) forming color centers in the diamond in predetermined three-dimensional locations;
(c) emitting multiple ionization laser pulses, of different characteristics, to ionize the diamond;
(d) emitting at least one annealing laser pulse to anneal the diamond; and
(e) the locations of the color centers allowing communication between more than two of the color centers.
22. The method of claim 21 , further comprising:
performing the pre-heating of the diamond with the at least one pre-heating laser beam while limiting an amount of lattice damage therein to avoid graphitization, the pre-heating step occurring before the ionization emission step and the annealing emission step;
the different characteristic of the ionization laser pulses including different frequencies, and the ionizing laser pulses creating the color centers adjacent a corner of a surface discontinuity; and
the emitting of the at least one second laser pulse to anneal the diamond comprising emitting multiples of the annealing laser pulse to optimize characteristics of the color centers.
23. The method of claim 21 , further comprising:
the at least one pre-heating laser beam having a peak intensity from 10 10 to 10 12 W/cm 2 , and a 520 to 540 nm wavelength;
the ionization pulses each having a 30 to 50 fs duration with 1 MHz repetition rates, and a 700-1,600 nm wavelength;
the at least one annealing pulse having a pulse intensity from 10 8 to 10 10 W/cm 2 for about 1 to 2 seconds, a 250 KHz repetition rate, and a 400 to 1,060 nm wavelength; and
monitoring fluorescence of the color centers with the same laser as emits the at least one annealing pulse.
24. The method of claim 21 , further comprising:
varying polarization of the laser beam, which include laser pulses, to align or change spins of the color centers, which include nitrogen-vacancy centers; and
creating multiple surface discontinuities on a substrate, at least a majority of which are longitudinally elongated, substantially parallel and laterally spaced apart, by etching in a plasma assisted chemical vapor deposition reactor.
25. The method of claim 21 , further comprising using spatial interference between multiple laser pulses of the laser beam to create narrow, localized or different surface discontinuity features during photoactivation.