Electromagnetic wave shield film
An electromagnetic wave shielding film with high bending resistance includes a protecting layer, a metal layer, and an adhesive layer stacked in this order. A ratio of Repulsion Y to Repulsion X ([Repulsion Y]/[Repulsion X]) is 0.77 or higher, where Repulsion X denotes a repulsion of a stack including the protecting layer and the metal layer measured in a defined test for measuring repulsion of stacks, and Repulsion Y denotes a repulsion of the adhesive layer measured in a defined test for measuring repulsion of adhesive layers.
1. An electromagnetic wave shielding film, comprising a protecting layer, a metal layer, and an adhesive layer stacked in this order,
wherein a ratio of Repulsion Y to Repulsion X ([Repulsion Y]/[Repulsion X]) is 0.77 or higher, where Repulsion X denotes a repulsion of a stack including the protecting layer and the metal layer measured in a test for measuring repulsion of stacks described below, and Repulsion Y denotes a repulsion of the adhesive layer measured in a test for measuring repulsion of adhesive layers described below,
Test for measuring repulsion of stacks;
Two pieces of a stack including a protecting layer and a metal layer are produced;
Next, a polyimide film with a thickness of 50 μm is prepared; One piece and the other piece of the stack are stacked on one face and the other face of the polyimide film, respectively, such that the pieces overlap with each other, while the metal layer is placed on the polyimide film via an epoxy resin-based adhesive with a thickness of 1 μm;
Subsequently, the resulting stack is heated and pressurized at 3 MPa and 170° C. for three minutes, further heated at atmospheric pressure at 150° C. for one hour, and then cut to have a 60-mm long side and a 10-mm short side to produce a sample of the stack;
One main face and the other main face of the obtained sample of the stack are defined as a first main face and a second main face, respectively;
Next, the sample of the stack is bent into a U shape centered on a longitudinal center of the sample of the stack such that the long side of the sample of the stack is bent and the first main face of the sample of the stack is on the inner side; Thereafter, the bent sample of the stack is placed on a pressure meter equipped with a lower jig and a pressing jig, and the distance between the lower jig and the pressing jig is adjusted to 0.5 mm;
After maintaining this state for three seconds, a repulsion of the sample of the stack is measured and defined as Repulsion X of the stack;
Test for measuring repulsion of adhesive layers;
Two pieces of an adhesive layer are produced;
Next, a polyimide film with a thickness of 50 μm is prepared, One piece and the other piece of the adhesive layer are stacked on one face and the other face of the polyimide film, respectively, such that the pieces overlap with each other;
Subsequently, the resulting stack is heated and pressurized at 3 MPa and 170° C. for three minutes, further heated at atmospheric pressure at 150° C. for one hour, and then cut to have a 60-mm long side and a 10-mm short side to produce a sample of the adhesive layer;
One main face and the other main face of the obtained sample of the adhesive layer are defined as a third main face and a fourth main face, respectively;
Next, the sample of the adhesive layer is bent into a U shape centered on a longitudinal center of the sample of the adhesive layer such that the long side of the sample of the adhesive layer is bent and the third main face of the sample of the adhesive layer is on the inner side; Thereafter, the bent sample of the adhesive layer is placed on a pressure meter equipped with a lower jig and a pressing jig, and the distance between the lower jig and the pressing jig is adjusted to 0.5 mm;
After maintaining this state for three seconds, a repulsion of the sample of the adhesive layer is measured and defined as Repulsion Y of the adhesive layer.
2. The electromagnetic wave shielding film according to claim 1 ,
wherein the ratio of the Repulsion Y to the Repulsion X ([Repulsion Y]/[Repulsion X]) is 0.82 or higher.
3. The electromagnetic wave shielding film according to claim 1 , wherein the adhesive layer comprises conductive particles.
4. The electromagnetic wave shielding film according to claim 3 , wherein the adhesive layer comprises the conductive particles in a weight ratio of 30 wt % or higher.
5. The electromagnetic wave shielding film according to claim 1 , wherein the Repulsion X is 1 to 10 N/cm.
6. The electromagnetic wave shielding film according to claim 1 , wherein the Repulsion Y is 0.77 to 15 N/cm.