IP Library Granted Patent US 12,397,500
Granted Patent B2
US 12,397,500 · App. 17/887,337 · Granted Aug 26, 2025

System and method of low-waste multi-material resin printing

Inventor: Chunguang Xia (San Diego, CA)
Assignee: BMF Nano Material Technology Co., Ltd
B29C64/135B29C64/209B29C64/255B29C64/286B29C64/336B29C64/357B33Y10/00B33Y30/00B33Y40/00
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Quick Facts
Patent No.
US 12,397,500
App. No.
17/887,337
Granted
Aug 26, 2025
Kind
B2
Abstract

A multi-material 3-D printing system and method including at least two printing heads each with a transparent window circumscribed by an ejection nozzle. Each ejection nozzle is coupled to a respective pump that pumps resin from a respective vat onto a respective window. The resin is cured from below the window by exposure to a digital image displayed by a micro display chip. To switch resins, the sample is moved across a plurality of suction nozzles towards a second printing head. A respective one of the suction heads is coupled to a vacuum that effectuates the intake of residual resin from the underside of the sample.

Claims (15)

1. A 3-D printing system, comprising:

at least one micro display chip coupled to a light source and adapted to display a digital image received from a computer;

at least two printing heads, each disposed below a sample, above a respective one of at least two collection vats, and defining an upward-facing frustum comprising a flat, sealed, optically transparent, and gas-permeable window circumscribed by an ejection nozzle fluidically coupled to a respective collection vat;

at least two lenses, each disposed below a respective window and adapted to focus the digital image onto a layer of resin coating a top surface of the respective window;

at least two suction nozzles, each disposed below the sample, adjacent to a respective collection vat, fluidically coupled to the respective collection vat, and fluidically couplable to a vacuum source, wherein application of a vacuum to a respective suction nozzle effectuates a suction at an upward-facing opening thereof; and

three precision stages adapted to move the sample, affixed to a sample platform, laterally (X and/or Y) and vertically (Z) relative to the at least two printing heads and laterally (X and/or Y) relative to the at least two suction nozzles.

2. The system of claim 1 wherein the opening of each suction nozzle is circumscribed by a rim having a tall edge opposite a short edge, the tall edge being adjacent to an individual one of the at least two collection vats to which the suction nozzle is fluidically coupled.

3. The system of claim 1 further comprising at least two suction reservoirs, each fluidically coupled to a respective suction nozzle and to a manifold that is fluidically coupled to the vacuum source, wherein the manifold diverts the application of the vacuum to a respective suction reservoir one at a time.

4. The system of claim 3 further comprising at least two storage reservoirs and at least two fluid pumps adapted to pump resin from a respective storage reservoir to a respective printing head, wherein each storage reservoir is disposed below a respective collection vat and fluidically coupled thereto via an orifice, and each storage reservoir is disposed adjacent to a respective suction reservoir and fluidically coupled thereto via a valve.

5. The system of claim 1 further comprising:

at least two shutters, each adapted to selectively prohibit the digital image from reaching a respective lens;

a beam splitter adapted to partially reflect the digital image towards a first shutter and to partially transmit the digital image towards a mirror as a partially transmitted digital image; and

a mirror adapted to reflect the partially transmitted digital image towards a second shutter.

6. The system of claim 5 further comprising a charge coupled device (CCD) adapted to monitor the digital image focused by a respective one of the lenses, wherein the CCD is disposed on a side of the beam splitter opposite the respective lens.

7. The system of claim 1 wherein each collection vat is at least twice as long as the sample platform in a first lateral direction and at least twice as long as the sample platform in a second lateral direction.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 15, 2023
From: XIA, CHUNGUANG
To: BMF NANO MATERIAL TECHNOLOGY CO., LTD
Reel/Frame 063962/0166 →
Continuity (2)
Provisional Application 63233102 · Aug 13, 2021
Related Publication 20230045800A1 · Feb 16, 2023
References Cited (107)
US 4575330A · Hull · 1986 [cited by applicant]
US 5192559A · Hull · 1993 [cited by applicant]
US 5933278A · Plummer · 1999 [cited by applicant]
US 6011577A · Goodman · 2000 [cited by applicant]
US 6607689B1 · Farnworth · 2003 [cited by applicant]
US 7892474B2 · Shkolnik · 2011 [cited by applicant]
US 8487822B1 · Jennings · 2013 [cited by applicant]
US 9205601B2 · Desimone · 2015 [cited by applicant]
US 9211678B2 · Desimone · 2015 [cited by applicant]
US 9216546B2 · Desimone · 2015 [cited by applicant]
US 9360757B2 · Desimone · 2016 [cited by applicant]
US 9496675B1 · Plummer · 2016 [cited by applicant]
US 11654617B2 · Xia et al. · 2023 [cited by applicant]
US 11654619B2 · Xia · 2023 [cited by applicant]
US 20050219400A1 · Poulsen · 2005 [cited by applicant]
US 20050248061A1 · Shkolnik · 2005 [cited by applicant]
US 20080174050A1 · Kikuchi · 2008 [cited by applicant]
US 20090186306A1 · Haraldsson · 2009 [cited by applicant]
US 20090196946A1 · Kihara et al. · 2009 [cited by applicant]
US 20100291401A1 · Medina · 2010 [cited by applicant]
US 20110101569A1 · Yasukochi · 2011 [cited by applicant]
US 20110260365A1 · El-Siblani · 2011 [cited by applicant]
US 20110285060A1 · Yamamoto · 2011 [cited by examiner]
US 20130021217A1 · Tsai · 2013 [cited by applicant]
US 20130295212A1 · Chen · 2013 [cited by applicant]
US 20150001763A1 · Elsey · 2015 [cited by applicant]
US 20150247679A1 · Niimi · 2015 [cited by applicant]
US 20170274586A1 · Hakkaku · 2017 [cited by applicant]
US 20170334142A1 · Baldeck · 2017 [cited by applicant]
US 20170355132A1 · Moore · 2017 [cited by examiner]
US 20180056587A1 · Arai · 2018 [cited by applicant]
US 20180056590A1 · Costabeber · 2018 [cited by applicant]
US 20180194064A1 · Chen · 2018 [cited by applicant]
US 20180200964A1 · Rockstroh · 2018 [cited by applicant]
US 20190022947A1 · Ho et al. · 2019 [cited by applicant]
US 20190111622A1 · Khalip · 2019 [cited by applicant]
US 20200061917A1 · Osborn · 2020 [cited by examiner]
US 20200101665A1 · Beets · 2020 [cited by applicant]
US 20200108465A1 · Sweetland · 2020 [cited by applicant]
US 20210237345A1 · Xia et al. · 2021 [cited by applicant]
US 20210276249A1 · Xia · 2021 [cited by applicant]
US 20210331380A1 · Seo · 2021 [cited by applicant]
US 20220048254A1 · Xia · 2022 [cited by applicant]
US 20230398739A1 · Xia et al. · 2023 [cited by applicant]
US 20240157642A1 · Korten · 2024 [cited by examiner]
US 20240198587A1 · Xia · 2024 [cited by applicant]
CN 102928910 · 2013 [cited by applicant]
CN 104827667 · 2015 [cited by applicant]
CN 104991353 · 2015 [cited by applicant]
CN 105390056 · 2016 [cited by applicant]
CN 206718470 · 2017 [cited by applicant]
CN 107756814 · 2018 [cited by applicant]
CN 107756814A · 2018 [cited by applicant]
CN 108437448 · 2018 [cited by applicant]
CN 108437448A · 2018 [cited by applicant]
CN 109466061 · 2019 [cited by applicant]
CN 109483872 · 2019 [cited by applicant]
CN 109483872A · 2019 [cited by applicant]
CN 111873431 · 2020 [cited by applicant]
CN 111873433 · 2020 [cited by applicant]
CN 112549537 · 2021 [cited by applicant]
CN 113927897 · 2022 [cited by applicant]
EP 1732746B1 · 2011 [cited by applicant]
EP 3107703B1 · 2020 [cited by applicant]
EP 4232262A1 · 2023 [cited by applicant]
EP 3894184B1 · 2024 [cited by applicant]
EP 4326529A1 · 2024 [cited by applicant]
EP 4384379A1 · 2024 [cited by applicant]
JP H07329188A · 1995 [cited by applicant]
JP 2004314406 · 2004 [cited by applicant]
JP 2005219400A · 2005 [cited by applicant]
JP 2009083240 · 2009 [cited by applicant]
TW I568571B · 2017 [cited by applicant]
WO 2008069564 · 2008 [cited by applicant]
WO 2009042671 · 2009 [cited by applicant]
WO 2012051598 · 2012 [cited by applicant]
WO 2014042486 · 2014 [cited by applicant]
WO 2016115095 · 2016 [cited by applicant]
WO 2017157851 · 2017 [cited by applicant]
WO 2019014098A1 · 2019 [cited by applicant]
WO 2020181620 · 2020 [cited by applicant]
WO 2021056720 · 2021 [cited by applicant]
WO 2021103502 · 2021 [cited by applicant]
WO 2021165878A1 · 2021 [cited by applicant]
“Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography”, Seung Ah Lee, Su Eun Chung, Wook Park, Sung Hoon Lee and Sunghoon Kwon, Lab Chip, 20… [cited by applicant]
B. J. Lei, et al., “A wideband, pressure-driven, liquid-tunable frequency selective surface,” IEEE Microwave Wireless Components Letters, vol. 21, No. 9, pp. 465-467, 2011. [cited by applicant]
Jingi Wang et al., “Liquid metal-based plasmonics” Optics Express, vol. 20, No. 2, p. 2346-2353, Jan. 2012. [cited by applicant]
K. Ikuta and K. Hirowatari, “Real three dimensional micro fabrication using stereo lithography and metal molding,” 6th IEEE Workshop on Micro Electrical Mechanical Systems, 1993. [cited by applicant]
S. Maruo and K. Ikuta, “Three-dimensional microfabrication by use of single-photon-absorbed polymerization,” Appl. Phys. Lett., vol. 76, 2000. [cited by applicant]
S. Maruo and S. Kawata, “Two-Photon-Absorbed Near-Infrared Photopolymerization for Three dimensional Microfabrication,” J. MEMS, vol. 7, pp. 411, 1998. [cited by applicant]
S. Kawata, H. B. Sun, T. Tanaka and K. Takada, “Finer features for functional microdevices,” Nature, vol. 412, pp. 697, 2001. [cited by applicant]
Bertsch et al., “Microstereophotolithography using a liquid crystal display as dynamic mask-generator”, Microsystem Technologies, p. 42-47, 1997. [cited by applicant]
Beluze et al., “Microstereolithography: a new process to build complex 3D objects , Symposium on Design, Test and microfabrication of MEMs/MOEMSs”, Proceedings of SPIE, v3680, n2, p. 808-817, 1999. [cited by applicant]
Kowsari, et al., “High-efficiency high-resolution multimaterial fabrication for digital light processing-based three-dimensional printing,” 3D Printing and Additive Manufacturing 5(3):185-193, 2018. [cited by applicant]
Han et al., “Rapid multi-material 3D printing with projection micro-stereolithography using dynamic fluidic control,” Additive Manufacturing 27(11):606-615, 2019. [cited by applicant]
T. Takagi and N. Nakajima, 4th International Symposium on Micro Machine and Human Science, 1993. [cited by applicant]
S. Maruo, O. Nakamura and S. Kawata, “Three-dimensional microfabrication with two-photon-absorbed photopolymerization,” Optics Letters, vol. 22, pp. 132, 1997. [cited by applicant]
S. Maruo and K. Ikuta, “Movable microstructures made by two-photon three-dimensional microfabrication,” in Proceedings of 1999 International Symposium on Micromechatronics and Human Science, 1999, pp. 173-178. [cited by applicant]
Arnaud Bertsch, Sébastien Jiguet, Paul Bernhard and Philippe Renaud, “Microstereolithography: a Review,” Materials research society symposium proceedings, vol. 758, 2003, p. 3-15. [cited by applicant]
Notice of Allowance dated Jan. 31, 2025 for U.S. Appl. No. 17/312,173. [cited by applicant]
Panasonic (“Micro Laser Distance Sensor,” in public at least in Apr. 2014, available at https://www.farnell.com/datasheets/1863584.pdf). (Year: 2014). [cited by applicant]
International Search Report and Written Opinion for PCT Patent Application No. PCT/IB2023/051584, 10 pages. [cited by applicant]
International Search Report and Written Opinion for PCT Patent Application No. PCT/IB2021/059731 dated Feb. 28, 2022. [cited by applicant]
International Search Report and Written Opinion for PCT Patent Application No. PCT/IB2022/053395 dated Jun. 27, 2022, 12 pages. [cited by applicant]
International Search Report and Written Opinion for PCT Patent Application No. PCT/IB2021/059731 dated Feb. 28, 2022, 22 pages. [cited by applicant]
International Search Report and Written Opinion for PCT Patent Application No. PCT/IB2022/057569 dated Nov. 8, 2022, 16 pages. [cited by applicant]
Non-Final Office Action for U.S. Appl. No. 18/033,405 dated Jan. 3, 2025. [cited by applicant]