Semiconductor device layout
Semiconductor devices and semiconductor cell arrays are provided herein. In some examples, a semiconductor device includes a multi-fin active region, a mono-fin active region, and an isolation feature between the multi-fin active region and the mono-fin active region. The multi-fin active region includes a first plurality of fins, a second plurality of fins parallel to the first plurality of fins, a first n-type field effect transistor (FET), and a first p-type FET. The mono-fin active region abuts the multi-fin active region. The mono-fin active region includes a first fin, a second fin different from the first fin, a second n-type FET, and a second p-type FET. The isolation feature is parallel to the first and second gate structures.
1. A semiconductor structure, comprising:
a first device comprising:
a first plurality of fins extending in parallel along a first direction and comprising a first channel region and a first source/drain region,
a first gate structure wrapping over each of the first plurality of fins, and
a first source/drain contact disposed over the first source/drain region; and
a second device comprising:
a first fin extending lengthwise along the first direction and aligned with one of the first plurality of fins along the first direction, the first fin comprising a second channel region and a second source/drain region,
a second gate structure wrapping over the first fin, and
a second source/drain contact disposed over the second source/drain region,
wherein the first source/drain contact comprises a first length along a second direction perpendicular to the first direction,
wherein the second source/drain contact comprises a second length along the second direction, and
wherein a ratio of the first length to the second length is between about 1.1 and about 2.0.
2. The semiconductor structure of claim 1 ,
wherein the first device and the second device are disposed over a semiconductor substrate, and
wherein the first plurality of fins and the first fin are disposed over a p-type well over the semiconductor substrate.
3. The semiconductor structure of claim 1 , wherein the first device and the second device are separated by an isolation feature extending lengthwise along the second direction.
4. The semiconductor structure of claim 3 , wherein the isolation feature comprises a dummy dielectric gate.
5. The semiconductor structure of claim 3 , wherein the isolation feature comprises a fin cutout region.
6. The semiconductor structure of claim 3 ,
wherein the isolation feature comprises an isolation p-type field effect transistor (FET) and an isolation n-type FET,
wherein the isolation p-Type FET includes a first isolation gate structure electrically connected to a high voltage line, and
wherein the isolation n-type FET includes a second isolation gate structure electrically connected to a low voltage line.
7. The semiconductor structure of claim 6 , wherein the first isolation gate structure is aligned with the second isolation gate structure along the first direction.
8. The semiconductor structure of claim 3 , further comprising:
a third device comprising:
a second plurality of fins extending in parallel along the first direction and comprising a third channel region, and
the first gate structure wrapping over each of the second plurality of fins; and
a fourth device comprising:
a second fin extending lengthwise along the first direction and aligned with one of the second plurality of fins along the first direction, and
the second gate structure wrapping over the second fin.
9. The semiconductor structure of claim 8 , wherein the third device and the fourth device are separated by the isolation feature.
10. The semiconductor structure of claim 8 ,
wherein the third device and the fourth device are disposed over a semiconductor substrate,
wherein the second plurality of fins and the second fin are disposed over an n-type well over the semiconductor substrate.
11. A semiconductor structure, comprising:
a semiconductor substrate having an n-type well and a p-type well;
a first device disposed over the p-type well and comprising:
a first plurality of fins extending in parallel along a first direction, and
a first gate structure wrapping over each of the first plurality of fins;
a second device disposed over the p-type well and comprising:
a first fin extending lengthwise along the first direction and aligned with one of the first plurality of fins along the first direction, and
a second gate structure wrapping over the first fin;
a third device disposed over the n-type well and comprising:
a second plurality of fins extending in parallel along the first direction, and
the first gate structure wrapping over each of the second plurality of fins;
a fourth device disposed over the n-type well and comprising:
a second fin extending lengthwise along the first direction and aligned with one of the second plurality of fins along the first direction, and
the second gate structure wrapping over the second fin; and
an isolation feature extending between the first device and the second device as well as between the third device and the fourth device.
12. The semiconductor structure of claim 11 ,
wherein the first plurality of fins comprise two fins, and
wherein the second plurality of fins comprises two fins.
13. The semiconductor structure of claim 11 ,
wherein the first plurality of fins comprise a first channel region and a first source/drain region adjacent the first channel region,
wherein the first gate structure is disposed over the first channel region,
wherein the first fin comprises a second channel region and a second source/drain region adjacent the second channel region, and
wherein the second gate structure is disposed over the second channel region.
14. The semiconductor structure of claim 13 ,
wherein the first device further comprises a first source/drain contact disposed over the first source/drain region,
wherein the second device further comprises a second source/drain contact disposed over the second source/drain region,
wherein the first source/drain contact comprises a first length along a second direction perpendicular to the first direction,
wherein the second source/drain contact comprises a second length along the second direction, and
wherein a ratio of the first length to the second length is between about 1.1 and about 2.0.
15. The semiconductor structure of claim 11 , wherein the isolation feature comprises a dummy dielectric gate.
16. The semiconductor structure of claim 11 , wherein the isolation feature comprises a fin cutout region.
17. The semiconductor structure of claim 11 ,
wherein the isolation feature comprises an isolation p-type field effect transistor (FET) and an isolation n-type FET,
wherein the isolation p-Type FET includes a first isolation gate structure electrically connected to a high voltage line, and
wherein the isolation n-type FET includes a second isolation gate structure electrically connected to a low voltage line.
18. The semiconductor structure of claim 17 , wherein the first isolation gate structure is aligned with the second isolation gate structure along the first direction.
19. A semiconductor structure, comprising:
a semiconductor substrate comprising a p-type well and an n-type well;
a first device disposed over the p-type well and comprising:
a first plurality of fins extending in parallel along a first direction and comprising a first channel region and a first source/drain region,
a first gate structure wrapping over each of the first plurality of fins, and
a first source/drain contact disposed over the first source/drain region; and
a second device disposed over the p-type well and comprising:
a first fin extending lengthwise along the first direction and aligned with one of the first plurality of fins along the first direction, the first fin comprising a second channel region and a second source/drain region,
a second gate structure wrapping over the first fin, and
a second source/drain contact disposed over the second source/drain region,
wherein the first source/drain contact comprises a first length along a second direction perpendicular to the first direction,
wherein the second source/drain contact comprises a second length along the second direction,
wherein a ratio of the first length to the second length is between about 1.1 and about 2.0.
20. The semiconductor structure of claim 19 , further comprising:
a third device disposed over the n-type well and comprising:
a second plurality of fins extending in parallel along the first direction and comprising a third channel region, and
the first gate structure wrapping over each of the second plurality of fins; and
a fourth device disposed over the n-type well and comprising:
a second fin extending lengthwise along the first direction and aligned with one of the second plurality of fins along the first direction, and
the second gate structure wrapping over the second fin.