IP Library Granted Patent US 12,411,368
Granted Patent B2
US 12,411,368 · App. 18/154,066 · Granted Sep 9, 2025

Optical phase shifter using KTN (KTaNbO3) and manufacturing method thereof

Inventors: Young Hyun Kim (Ansan-si, KR); Seong Ui An (Ansan-si, KR)
Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
G02F1/035G02B6/122G02F1/025G02F1/212G02F1/2257G02B2006/12061G02B2006/12097G02B2006/12142G02B2006/12176G02B6/136
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,411,368
App. No.
18/154,066
Granted
Sep 9, 2025
Kind
B2
Abstract

Provided is an optical phase shifter. The optical phase shifter includes: a silicon substrate; a cladding layer disposed on the silicon substrate; an intermediate film disposed on the cladding layer; a KTN (KTaNbO 3 ) waveguide disposed on the intermediate film; a protective layer disposed on the intermediate film to cover the KTN waveguide; and first and second electrodes disposed on the intermediate film while being spaced apart from each other with the KTN waveguide interposed between the first and second electrodes, wherein a silicon waveguide is disposed inside the cladding layer while being spaced apart from the KTN waveguide with the intermediate film interposed between the silicon waveguide and the KTN waveguide.

Claims (31)

1. An optical phase shifter comprising:

a silicon substrate;

a cladding layer disposed on the silicon substrate;

an intermediate film disposed on the cladding layer;

a KTN (KTaNbO 3 ) waveguide disposed on the intermediate film;

a protective layer disposed on the intermediate film to cover the KTN waveguide; and

first and second electrodes disposed on the intermediate film while being spaced apart from each other with the KTN waveguide interposed between the first and second electrodes;

a first transition region that is adjacent to an optical input of an optical modulator;

a second transition region that is adjacent to an optical output of the optical modulator; and

a KTN region disposed between the first transition region and the second transition region,

wherein a silicon waveguide is disposed inside the cladding layer while being spaced apart from the KTN waveguide with the intermediate film interposed between the silicon waveguide and the KTN waveguide,

wherein an area of the silicon waveguide in the first transition region and the second transition region is wider than an area of the silicon waveguide in the KTN region, and

wherein, in the KTN region, the silicon waveguide is not present inside the cladding layer.

2. The optical phase shifter of claim 1 , wherein, when a voltage is applied to the optical phase shifter,

an electric field is formed between the first electrode and the second electrode,

the electric field causes a change in a refractive index of the KTN waveguide, and

a phase of a light passing through the KTN waveguide is controlled by the change in the refractive index.

3. The optical phase shifter of claim 1 , wherein

all of the silicon substrate, the silicon waveguide, and the KTN waveguide extend in a first direction that extends from the optical input to the optical output.

4. The optical phase shifter of claim 3 , wherein an area of the silicon waveguide between the first transition region and the KTN region is changed so as to be gradually narrowed or gradually widened in the first direction.

5. The optical phase shifter of claim 1 , wherein

the first transition region includes a first-first transition region that is adjacent to the optical input and a first-second transition region that is adjacent to the KTN region, and

an area of the silicon waveguide in the first-first transition region is wider than an area of the silicon waveguide in the first-second transition region.

6. The optical phase shifter of claim 1 , wherein

the second transition region includes a second-first transition region that is adjacent to the optical output and a second-second transition region that is adjacent to the KTN region, and

an area of the silicon waveguide in the second-first transition region is wider than an area of the silicon waveguide in the second-second transition region.

7. The optical phase shifter of claim 1 , wherein

the first electrode and the second electrode pass through the protective layer in a thickness direction while being spaced apart from the KTN waveguide,

the first electrode is adjacent to one side of the KTN waveguide, and

the second electrode is adjacent to an opposite side of the KTN waveguide.

8. The optical phase shifter of claim 1 , wherein the optical phase shifter operates in a transverse electric (TE) mode among the transverse electric (TE) mode and a transverse magnetic (TM) mode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2023
From: KIM, YOUNG HYUN; AN, SEONG UI
To: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
Reel/Frame 062416/0475 →
Priority Claims (1)
KR 10-2022-0008677 · Jan 20, 2022 · national
Continuity (1)
Related Publication 20230229031A1 · Jul 20, 2023
References Cited (15)
US 6792189B2 · Sasaura · 2004 [cited by examiner]
US 7492975B2 · Toyoda et al. · 2009 [cited by applicant]
US 11009727B2 · Eltes · 2021 [cited by examiner]
US 11054675B2 · Fujikata et al. · 2021 [cited by applicant]
US 20060008223A1 · Gunn, III et al. · 2006 [cited by applicant]
US 20130126941A1 · Zhu et al. · 2013 [cited by applicant]
US 20180011347A1 · Ishikura · 2018 [cited by applicant]
US 20190011799A1 · Yu et al. · 2019 [cited by applicant]
US 20200257180A1 · Mahgerefteh et al. · 2020 [cited by applicant]
US 20210278708A1 · Kumar · 2021 [cited by examiner]
US 20210341766A1 · Chern · 2021 [cited by applicant]
US 20210373363A1 · Zhou et al. · 2021 [cited by applicant]
JP 2019049612A2 · 2019 [cited by applicant]
KR 1020050093764A · 2005 [cited by applicant]
U.S. Appl. No. 18/154,065, application filing date Jan. 13, 2023 (68 pages). [cited by applicant]